DOI QR코드

DOI QR Code

Spray Pyrolysis Deposition of Zinc Oxide Thin Films by ZnO Buffer Layer

ZnO buffer 층을 이용한 초음파 분무열분해 ZnO 박막 증착

  • Han, In Sub (Department of Materials Science and Engineering, Seoul National University of Science and Technology) ;
  • Park, Il-Kyu (Department of Materials Science and Engineering, Seoul National University of Science and Technology)
  • 한인섭 (서울과학기술대학교 신소재공학과) ;
  • 박일규 (서울과학기술대학교 신소재공학과)
  • Received : 2017.06.28
  • Accepted : 2017.07.11
  • Published : 2017.08.27

Abstract

We investigated the effect of ZnO buffer layer on the formation of ZnO thin film by ultrasonic assisted spray pyrolysis deposition. ZnO buffer layer was formed by wet solution method, which was repeated several times. Structural and optical properties of the ZnO thin films deposited on the ZnO buffer layers with various cycles and at various temperatures were investigated by field-emission scanning electron microscopy, X-ray diffraction, and photoluminescence spectrum analysis. The structural investigations showed that three-dimensional island shaped ZnO was formed on the bare Si substrate without buffer layers, while two-dimensional ZnO thin film was deposited on the ZnO buffer layers. In addition, structural and optical investigations showed that the crystalline quality of ZnO thin film was improved by introducing the buffer layers. This improvement was attributed to the modulation of the surface energy of the Si surface by the ZnO buffer layer, which finally resulted in a modification of the growth mode from three to two-dimensional.

Keywords

References

  1. H. R. An, S. H. Baek, I. K. Park and H. J. Ahn, Korean J. Mater. Res., 23, 469 (2013). https://doi.org/10.3740/MRSK.2013.23.8.469
  2. M. Ardyanian and N. Sedigh, Bull. Mater. Sci., 37, 1309 (2014). https://doi.org/10.1007/s12034-014-0076-4
  3. M. B. Rahman and S. H. Keshmirl, Sens. Lett., 7, 1 (2009). https://doi.org/10.1166/sl.2009.1001
  4. S. Yun, J. Lee, J. Yang and S. Lim., Physica B, 405, 413 (2010). https://doi.org/10.1016/j.physb.2009.08.297
  5. R. Jaramillo and S. Ramanathan, Sol. Energy Mater. Sol. Cells, 95, 602 (2011). https://doi.org/10.1016/j.solmat.2010.09.025
  6. H. Agura, A. Suzuki, T. Matsushita, T. Aoki and M. Okuda, Thin Solid Films, 445, 263 (2003). https://doi.org/10.1016/S0040-6090(03)01158-1
  7. S. Y. Kuo, W. C. Chen, F. I. Lai, C. P. Cheng, H. C. Kuo, S. C. Wang and W. F. Hsieh, J. Cryst. Growth, 287, 78 (2006). https://doi.org/10.1016/j.jcrysgro.2005.10.047
  8. N. S. Portillo-Velez and M. Bizarro, J. Nanomater. 2016, 5981562 (2016).
  9. S. E. Na, S. G. Jeong, G. S. Jeong, S. Y. Kim and C. S. Ju, Korean Chem. Eng. Res., 49, 752 (2011). https://doi.org/10.9713/kcer.2011.49.6.752
  10. B. Meyer and D. Marx, Phys. Rev. B, 67, 035403 (2003). https://doi.org/10.1103/PhysRevB.67.035403
  11. R. J. Jaccodine, J. Electrochem. Soc., 110, 6 (1963).
  12. S. Nakamura, T. Mukal and M. Senoh, Jpn. J. Appl. Phys., 31, 2883 (1991).
  13. E. Kaber, T. Raadik, T. Dedova, J. Krustok, A. Mere, V. Mikil and M. Krunks, Nanoscale. Res. Lett., 6, 359 (2011). https://doi.org/10.1186/1556-276X-6-359