Preparation of photoresist-derived carbon micropatterns by proton ion beam lithography and pyrolysis

  • Nam, Hui-Gyun (Department of Polymer Science and Engineering, Chungnam National University) ;
  • Jung, Jin-Mook (Department of Polymer Science and Engineering, Chungnam National University) ;
  • Hwang, In-Tae (Research Division for Industry and Environment, Korea Atomic Energy Research Institute) ;
  • Shin, Junhwa (Research Division for Industry and Environment, Korea Atomic Energy Research Institute) ;
  • Jung, Chang-Hee (Research Division for Industry and Environment, Korea Atomic Energy Research Institute) ;
  • Choi, Jae-Hak (Department of Polymer Science and Engineering, Chungnam National University)
  • Received : 2017.04.18
  • Accepted : 2017.06.07
  • Published : 2017.10.31


Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of $1{\times}10^{15}ions\;cm^{-2}$ and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of $1.58{\times}10^2S\;cm^{-1}$ and a very low surface roughness.


Supported by : Korea Institute of Energy Technology Evaluation and Planning (KETEP), Ministry of Trade, Industry & Energy (MOTIE), National Research Foundation of Korea (NRF)


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