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비정질 탄소박막의 광발열 특성 연구

Photothermal characteristics of amorphous carbon thin films

  • Oh, Hyungon (Dept of Electrical Engineering, Korea University) ;
  • Cho, Kyoungah (Dept of Electrical Engineering, Korea University) ;
  • Kim, Sangsig (Dept of Electrical Engineering, Korea University)
  • 투고 : 2018.02.23
  • 심사 : 2018.03.14
  • 발행 : 2018.03.31

초록

본 연구에서는 실리콘 기판 위에 DC 스퍼터링 방법을 이용하여 비정질 탄소박막을 제작하고, 흡광특성과 광발열 특성을 조사하였다. 비정질 탄소박막은 1000 nm 파장에서 97%의 흡광도를 보였으며, 백색광이 조사됨에 따라 비정질 탄소박막의 온도는 $21.1^{\circ}C$에서 $24.1^{\circ}C$로 상승하여 약 $3^{\circ}C$의 온도가 증가하였다. 또한, 백색광이 50초 동안 조사되는 동안 비정질 탄소박막에서는 기판에 비해 4배 빠른 온도상승속도로 온도가 증가하였다.

In this study, we fabricate amorphous carbon thin films on silicon substrates by DC sputtering method and investigate the optical property and photothermal characteristics. A representative amorphous carbon thin film has a absorption value of 97% at a wavelength of 1000 nm and shows a temperature increase of $3^{\circ}C$ from $21.1^{\circ}C$ to $24.1^{\circ}C$ during white light irradiation. In addition, the amorphous carbon film has a heating rate four times higher than that of the substrate during light irradiation for 50 sec.

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참고문헌

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