Korean Journal of Materials Research (한국재료학회지)

Materials Research Society of Korea (한국재료학회)
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Growth of Copper Oxide Thin Films Deposited by Ultrasonic-Assisted Spray Pyrolysis Deposition Method

초음파 분무 열분해법을 이용한 구리산화물 박막 성장

  • Han, In Sub (Department of Materials Science and Engineering, Seoul National University of Science and Technology) ;
  • Park, Il-Kyu (Department of Materials Science and Engineering, Seoul National University of Science and Technology)
  • 한인섭 (서울과학기술대학교 신소재공학과) ;
  • 박일규 (서울과학기술대학교 신소재공학과)
  • Received : 2018.08.17
  • Accepted : 2018.09.03
  • Published : 2018.09.27
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Abstract

Copper oxide thin films are deposited using an ultrasonic-assisted spray pyrolysis deposition (SPD) system. To investigate the effect of substrate temperature and incorporation of a chelating agent on the growth of copper oxide thin films, the structural and optical properites of the copper oxide thin films are analyzed by X-ray diffraction (XRD), field-emssion scanning electron microscopy (FE-SEM), and UV-Vis spectrophotometry. At a temperature of less than $350^{\circ}C$, three-dimensional structures consisting of cube-shaped $Cu_2O$ are formed, while spherical small particles of the CuO phase are formed at a temperature higher than $400^{\circ}C$ due to a Volmer-Weber growth mode on the silicon substrate. As a chelating agent was added to the source solutions, two-dimensional $Cu_2O$ thin films are preferentially deposited at a temperature less than $300^{\circ}C$, and the CuO thin film is formed even at a temperature less than $350^{\circ}C$. Therefore the structure and crystalline phase of the copper oxide is shown to be controllable.

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References

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