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Development of Highly Conductive and Corrosion-Resistant Cr-Diamond-like Carbon Films

  • Ko, Minjung (Department of Materials and Chemical Engineering, Hanyang University) ;
  • Jun, Yee Sle (Department of Materials and Chemical Engineering, Hanyang University) ;
  • Lee, Na Rae (Department of Materials and Chemical Engineering, Hanyang University) ;
  • Kang, Suhee (Department of Materials and Chemical Engineering, Hanyang University) ;
  • Moon, Kyoung Il (Heat Treatment Group, Korea Institute of Industrial Technology) ;
  • Lee, Caroline Sunyong (Department of Materials and Chemical Engineering, Hanyang University)
  • Received : 2019.05.03
  • Accepted : 2019.05.08
  • Published : 2019.05.31

Abstract

Cr-diamond-like carbon (Cr-DLC) films were deposited using a hybrid method involving both physical vapor deposition and plasma-enhanced chemical vapor deposition. DLC sputtering was carried out using argon and acetylene gases. With an increase in the DC power, the Cr content increased from 14.7 to 29.7 at%. The Cr-C bond appeared when the Cr content was 17.6 at% or more. At a Cr content of 17.6 at%, the films showed an electrical conductivity of > 363 S/cm. The current density was 9.12 × 10-2 ㎂/㎠, and the corrosion potential was 0.240 V. Therefore, a Cr content of 17.6 at% was found to be optimum for the deposition of the Cr-DLC thin films. The Cr-DLC thin films developed in this study showed high conductivity and corrosion resistance, and hence, are suitable for applications in separators.

Keywords

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