Textile Science and Engineering (한국섬유공학회지)

The Korean Fiber Society (한국섬유공학회)
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Study on the Atomic Layer Deposition of Al2O3 Thin Film as Moisture Barrier Layer for High Efficiency Flexible Organic Solar Cell

유연한 유기태양전지의 수분 투습 방지를 위해 원자층 증착법으로 제조된 Al2O3 박막에 대한 연구

  • Lee, Bom (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Lim, Joo Hyun (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Kwon, Do Yun (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Oh, Young Taek (Department of Smart Wearables Engineering, Soongsil University) ;
  • Kim, Simon (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Shin, Jin Yong (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Lim, Heo Yeon (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Lee, Su Eon (Department of Smart Wearables Engineering, Soongsil University) ;
  • Kim, Seung Hee (Department of Organic Materials and Fiber Engineering, Soongsil University) ;
  • Kim, Bong Hoon (Department of Organic Materials and Fiber Engineering, Soongsil University)
  • 이봄 (숭실대학교 유기신소재파이버공학과) ;
  • 임주현 (숭실대학교 유기신소재파이버공학과) ;
  • 권도윤 (숭실대학교 유기신소재파이버공학과) ;
  • 오영택 (숭실대학교 스마트웨어러블공학과) ;
  • 김시몬 (숭실대학교 유기신소재파이버공학과) ;
  • 신진용 (숭실대학교 유기신소재파이버공학과) ;
  • 임회연 (숭실대학교 유기신소재파이버공학과) ;
  • 이수언 (숭실대학교 스마트웨어러블공학과) ;
  • 김승희 (숭실대학교 유기신소재파이버공학과) ;
  • 김봉훈 (숭실대학교 유기신소재파이버공학과)
  • Received : 2020.11.30
  • Accepted : 2020.12.23
  • Published : 2020.12.31
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Abstract

A moisture barrier layer with high density and uniformity is essential for increasing the lifespan of optoelectronic devices such as flexible organic solar cells, LEDs, and photodetectors. In this study, various surface pre-treatments (O2 plasma, UVO treatment, Al seed layer, and thermal annealing process) were performed on a polyethylene naphthalate (PEN) film to form a functional group of chemical adsorption with the atomic layer deposition (ALD) precursor. We investigated the effect of the surface pre-treatment of a PEN substrate for a deposition of Al2O3 thin film in terms of the deposition uniformity and water vapor transmittance rate (WVTR). For example, the root mean square roughness of the bare PEN film/Al2O3 was RRMS=3.26 nm, whereas the O2 plasma treated PEN film/Al2O3 had RRMS=0.99 nm because of the presence of a functional group. As a result, WVTR of bare PEN film/Al2O3 was 0.83 g/㎡/day, whereas that of O2 plasma treated PEN film/Al2O3 decreased to 0.38 g/㎡/day.

Keywords

Acknowledgement

본 연구는 2020년도 정부(과학기술정보통신부)의 재원으로 한국연구재단의 지원을 받아 수행된 연구임(No.2020R1C1C1014980).

References

  1. S. Lee, Y. S. Song, H. Kim, and S. O. Ryu, "Characterization of ALD Processed Al2O3/TiO2/Al2O3 Multilayer Films for Encapsulation and Barrier of OLEDs", Semicond. Display Technol., 2017, 16, 1-5.
  2. E. Langereis, M. Creatore, S. B. S. Heil, M. C. M. van de Sanden, and W. M. M. Kessels, "Plasma-assisted Atomic Layer Deposition of Al2O3 Moisture Permeation Barriers on Polymers", Appl. Phys. Lett., 2006, 89, 081915. https://doi.org/10.1063/1.2338776
  3. C. Y. Chang, C. T. Chou, Y. J. Lee, M. J. Chen, and F. Y. Tsai, "Thin-film Encapsulation of Polymer-based Bulk-heterojunction Photovoltaic Cells by Atomic Layer Deposition", Org. Electron., 2009, 10, 1300-1306. https://doi.org/10.1016/j.orgel.2009.07.008
  4. L. H. Kim, J. H. Jang, Y. J. Jeong, K. Kim, Y. Baek, H. Kwon, T. K. An, S. Nam, S. H. Kim, J. Jang, and C. E. Park, "Highly-Impermeable Al2O3/HfO2 Moisture Barrier Films Grown by Low Temperature Plasma-enhanced Atomic Layer Deposition", Org. Electron., 2017, 50, 296-303. https://doi.org/10.1016/j.orgel.2017.07.051
  5. C. A. Wilson, R. K. Grubbs, and S. M. George, "Nucleation and Growth during Al2O3 Atomic Layer Deposition on Polymers", Chem. Mater., 2005, 17, 5625-5634. https://doi.org/10.1021/cm050704d
  6. T. Nam, Y. J. Park, H. Lee, I. K. Oh, J. H. Ahn, S. M. Cho, H. Kim, and H. B. R. Lee, "A Composite Layer of Atomic-layer-Deposited Al2O3 and Graphene for Flexible Moisture Barrier", Carbon, 2017, 116, 553-561. https://doi.org/10.1016/j.carbon.2017.02.023
  7. Y. Duan, F. Sun, Y. Yang, P. Chen, D. Yang, Y. Duan, and X. Wang, "Thin-Film Barrier Performance of Zirconium Oxide Using the Low Temperature Atomic Layer Deposition Method", Appl. Mater. Interfaces, 2014, 6, 3799-3804. https://doi.org/10.1021/am500288q
  8. R. W. Johnson, A. Hultqvist, and S. F. Bent, "A Brief Review of Atomic Layer Deposition: from Fundamentals to Applications" Materials Today, 2014, 17, 236-246. https://doi.org/10.1016/j.mattod.2014.04.026
  9. H. C. Guo, E. Ye, Z. Li, M. Y. Han, and X. J. Loh, "Recent Progress of Atomic Layer Deposition on Polymeric Materials", Mater. Sci. Eng., 2017, 70, 1182-1191. https://doi.org/10.1016/j.msec.2016.01.093
  10. Y. Liu, S. Welzel, S. A. Starostin, M. C. M. van de Sanden, R. Engeln, and H. W. de Vries, "Infrared Gas Phase Study on Plasma-polymer Interactions in High-current Diffuse Dielectric Barrier Discharge", Appl. Phys., 2017, 121, 243301. https://doi.org/10.1063/1.4985619
  11. Y. J. Jang and J. Jang, "Surface Treatment and Dyeability of Poly(phenylene sulfide) Films by UV/O3 Irradiation", Text. Coloration Finish., 2011, 23, 284-289. https://doi.org/10.5764/TCF.2011.23.4.284
  12. J. W. Joo and J. Jang, "Photooxidation of Poly(butylene succinate) Films by UV/Ozone Irradiation", Text. Coloration Finish., 2014, 26, 159-164. https://doi.org/10.5764/TCF.2014.26.3.159
  13. G. H. Kim, H. N. Hwang, Y. K. Kim, and H. J. Kang, "Effect of Surface Treatment of Polycarbonate Film on the Adhesion Characteristic of Deposited SiOx Barrier Layer", Polymer(Korea), 2013, 37, 373-378.
  14. K. B. Lim and D. C. Lee, "Effects of Plasma Surface Treatment on Electrical and Mechanical Properties of Poly(ethylene terephthalate) Films", Kiis, 2001, 16, 61-67.
  15. S. J. Jeong, Y. Gu, J. Heo, J. Yang, C. S. Lee, M. H. Lee, Y. Lee, H. Kim, S. Park, and S. Hwang, "Thickness Scaling of Atomic Layer Deposited HfO2 Films and Their Application to Wafer-scale Graphene Tunnelling Transistors", Scientific Reports, 2016, 6, 20907. https://doi.org/10.1038/srep20907
  16. T. Tamai, M. Watanabe, Y. Kobayashi, Y. Nakahara, and S. Yajima, "Surface Modification of PEN and PET Substrates by Plasma Treatment and Layer-by-layer Assembly of Polyelectrolyte Multilayer Thin Films and Their Application in Electroless Deposition", RSC Adv., 2017, 7, 33155-33161. https://doi.org/10.1039/C7RA04880G
  17. L. Wang, C. Ruan, M. Li, J. Zou, H. Tao, J. Peng, and M. Xu, "Enhanced Moisture Barrier Performance for ALD-Encapsulated OLEDs by Introducing an Organic Protective Layer", J. Mater. Chem. C, 2017, 5, 4017-4024. https://doi.org/10.1039/C7TC00903H
  18. S. J. Kim, S. H. Yong, Y. J. Choi, H. Hwangbo, W. Y. Yang, and H. Chae, "Flexible Al2O3/plasma Polymer Multilayer Moisture Barrier Films Deposited by a Spatial Atomic Layer Deposition Process", J. Vac. Sci. Technol., 2020, 38, 022418. https://doi.org/10.1116/1.5130727