Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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A brief review on the effect of impurities on the atomic layer deposited fluorite-structure ferroelectrics

원자층증착법으로 증착된 강유전성 플루오라이트 구조 강유전체 박막의 불순물 효과

  • Lee, Dong Hyun (Department of Materials Science and Engineering, Pusan National University) ;
  • Yang, Kun (Department of Materials Science and Engineering, Pusan National University) ;
  • Park, Ju Yong (Department of Materials Science and Engineering, Pusan National University) ;
  • Park, Min Hyuk (Department of Materials Science and Engineering, Pusan National University)
  • 이동현 (부산대학교 재료공학부) ;
  • 양건 (부산대학교 재료공학부) ;
  • 박주용 (부산대학교 재료공학부) ;
  • 박민혁 (부산대학교 재료공학부)
  • Received : 2020.07.04
  • Accepted : 2020.08.24
  • Published : 2020.08.31
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Abstract

The ferroelectricity in emerging fluorite-structure oxides such as HfO2 and ZrO2 has attracted increasing interest since 2011. Different from conventional ferroelectrics, the fluorite-structure ferroelectrics could be reliably scaled down below 10 nm thickness with established atomic layer deposition technique. However, defects such as carbon, hydrogen, and nitrogen atoms in fluorite-structure ferroelectrics are reported to strongly affect the nanoscale polymorphism and resulting ferroelectricity. The characteristic nanoscale polymorphism and resulting ferroelectricity in fluorite-structure oxides have been reported to be influenced by defect concentration. Moreover, the conduction of charge carriers through fluorite-structure ferroelectrics is affected by impurities. In this review, the origin and effects of various kinds of defects are reviewed based on existing literature.

Keywords

References

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