Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Cu Ions Removal Using Graphene Oxide and in-situ Spectroscopic Monitoring Method of Residual Cu Ions

산화 그래핀을 이용한 구리이온 흡착과 투과도 특성을 이용한 구리이온 농도 실시간 측정

  • Kim, Seungdu (Department of Materials Science and Engineering, Korea Aerospace University) ;
  • Ryou, Heejoong (Department of Materials Science and Engineering, Korea Aerospace University) ;
  • Oh, Hoon-Jung (BIT Micro Fab Research Center, Yonsei University) ;
  • Hwang, Wan Sik (Department of Materials Science and Engineering, Korea Aerospace University)
  • 김승두 (한국항공대학교 신소재공학과) ;
  • 류희중 (한국항공대학교 신소재공학과) ;
  • 오훈정 (연세대학교 비아이티마이크로팹연구소) ;
  • 황완식 (한국항공대학교 신소재공학과)
  • Received : 2021.06.08
  • Accepted : 2021.06.21
  • Published : 2021.06.30
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Abstract

Various Cu ions are discharged into water from various industries, which results in a severe trouble for groundwater, soil, air, and eventually animals and humans. In this work, graphene oxide (GO) is introduced as a Cu removal absorber and the real-time monitoring method is demonstrated. The results show that GO is a very effective material to absorb Cu ions in the solution. In addition, the residual Cu ions in the solution is monitored via optical transmittance method, which well match with Inductively Coupled Plasma Mass Spectrometer (ICP-MS) analysis.

Keywords

Acknowledgement

이 연구는 한국연구재단의 기초연구사업(과제번호 NRF- 2017R1A 2B2004986)의 지원을 받아 출간되었다.

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