반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

Bi2O3-Al2O3-SiO2 유리의 열물성과 내플라즈마 특성 연구

A Study on the Thermal Properties and Plasma Resistance of Bi2O3-Al2O3-SiO2 Glass

  • Young Min Byun (Engineering Materials Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Jae Ho Choi (Engineering Materials Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Won Bin Im (Division of Materials Science and Engineering Hanyang University) ;
  • Hyeong Jun Kim (Engineering Materials Center, Korea Institute of Ceramic Engineering and Technology)
  • 투고 : 2023.03.03
  • 심사 : 2023.03.22
  • 발행 : 2023.03.31
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

초록

In this study, we investigated the effects of BiAlSiO glass composition on its glass forming range, thermal properties, and plasma resistance. The results showed that increasing the Al2O3 content suppressed the tendency for crystallization and hindered glass formation beyond a certain threshold. Bi2O3 was found to increase the content of non-bridging oxygen, resulting in a decrease in glass transition temperature and an increase in thermal expansion coefficient. Furthermore, the etching rate was found to improve with increasing Al2O3 content but decrease with increasing SiO2 content. It was concluded that the boiling point of fluorinated compounds should be considered to 900℃. Therefore, this study is expected to contribute to the understanding of the properties of BiAlSiO glass and its application to low temperature melting PRG compositions.

키워드

과제정보

이 논문은 한국연구재단 (NRF)[NRF-2020M3H4 A3106001]으로부터 지원을 받아 연구되었습니다.

참고문헌

  1. KIM, Dae-Min, et al. Relative sputtering rates of oxides and fluorides of aluminum and yttrium. Sur-face and Coatings Technology, 2017, 309: 694-697. https://doi.org/10.1016/j.surfcoat.2016.11.007
  2. SHIH, Hong. A systematic study and characterization of advanced corrosion resistance materials and their applications for plasma etching processes in semiconductor silicon wafer fabrication. In: Corrosion Resistance. IntechOpen, 2012.
  3. MORIYA, T., et al. Reduction of particle contami-nation in an actual plasma etching process. In: ISSM 2005, IEEE International Symposium on Semi-conductor Manufacturing, 2005. IEEE, 2005. p. 229-232.
  4. ITO, Natsuko, et al. Reduction of particle contamination in plasma-etching equipment by dehydration of chamber wall. Japanese journal of applied physics, 2008, 47.5R: 3630.
  5. KIM, Kyeong-Beom, et al. Erosion behavior of YAG ceramics under fluorine plasma and their XPS analysis. Journal of the Korean Ceramic Society, 2009, 46.5: 456-461. https://doi.org/10.4191/KCERS.2009.46.5.456
  6. LIN, Tzu-Ken, et al. Comparison of erosion behavior and particle contamination in mass production CF4/O2 plasma chambers using Y2O3 and YF3 protective coatings. Nanomaterials, 2017, 7.7: 183.
  7. CHOI, Jae Ho; IM, Won Bin; KIM, Hyeong-Jun. Plasma resistant glass (PRG) for reducing particulate contamination during plasma etching in semicon-ductor manufacturing: A review. Materials Today Communications, 2023, 105267.
  8. CHOI, Jae Ho, et al. Plasma corrosion resistance of RO-Al2O3-SiO2 (R: Alkaline earth) under fluoro-carbon plasma with Ar+: II. Plasma resistant gla-ss. Corrosion Science, 2019, 146: 247-253. https://doi.org/10.1016/j.corsci.2018.10.015
  9. CHOI, Jae Ho, et al. Analysis of plasma etching resistance for commercial quartz glasses used in semiconductor apparatus in fluorocarbon plasma. Materials Chemistry and Physics, 2021, 272: 125015.
  10. CHOI, Jae Ho, et al. Plasma corrosion resistance of aluminosilicate glasses containing Ca, Y and B under fluorocarbon plasma with Ar+. Journal of Non-Crystalline Solids, 2019, 521: 119498.
  11. BEREGOVSKY, M., et al. Protection of Silicon Wafers from Alkali Contamination during High-Temperature Processing Using Electric Field. Journal of The Electrochemical Society, 2000, 147.10: 3892.
  12. KHAZAALAH, Thair Hussein, et al. The effect of Wo3-doped soda lime silica sls waste glass to develop lead-free glass as a shielding material against radiation. Sustainability, 2022, 14.4: 2413.
  13. LAN, Sung-Hung, et al. The relationship between the structure and thermal properties of Bi2O3-ZnO-B2O3 glass system. Advances in Condensed Matter Physics, 2021, 2021: 1-12. https://doi.org/10.1155/2021/2321558
  14. MAEDER*, Thomas. Review of Bi2O3 based glasses for electronics and related applications. International Materials Reviews, 2013, 58.1: 3-40. https://doi.org/10.1179/1743280412Y.0000000010
  15. WANG, Chen-Yang, et al. Preparation and characterization of Bi2O3-SiO2-Al2O3 based glasses of good transparency with high Bi2O3 content. Journal of noncrystalline solids, 2013, 363: 84-88. https://doi.org/10.1016/j.jnoncrysol.2012.12.014
  16. Cormier, Laurent. "Glasses: aluminosilicates.", 2021: 496-518.
  17. LU, Haojie, et al. A high-performance Bi2O3/Bi2SiO5 pn heterojunction photocatalyst induced by phase transition of Bi2O3. Applied Catalysis B: Environmental, 2018, 237: 59-67. https://doi.org/10.1016/j.apcatb.2018.05.069
  18. SANZ, O., et al. Influence of the melting conditions of heavy metal oxide glasses containing bismuth oxide on their optical absorption. Journal of non-crystalline solids, 2006, 352.8: 761-768. https://doi.org/10.1016/j.jnoncrysol.2006.02.002
  19. YITING, Fei, et al. Study on phase diagram of Bi2O3-SiO2 system for Bridgman growth of Bi4Si3O12 single crystal. Progress in crystal growth and characteri-zation of materials, 2000, 40.1-4: 183-188. https://doi.org/10.1016/S0960-8974(00)00003-6
  20. SEN, S. Atomic environment of high-field strength Nd and Al cations as dopants and major components in silicate glasses: a Nd LIII-edge and Al K-edge X-ray absorption spectroscopic study. Journal of noncrystalline solids, 2000, 261.1-3: 226-236. https://doi.org/10.1016/S0022-3093(99)00564-5
  21. HATTA, B.; TOMOZAWA, M. Effect of Al2O3 on phase separation of SiO2-Nd2O3 glasses. Journal of noncrystalline solids, 2008, 354.27: 3184-3193. https://doi.org/10.1016/j.jnoncrysol.2008.01.005
  22. YOON, Ji Sob, et al. Study on Thermal Properties and Plasma Resistance of MgO-Al2O3-SiO2 Gla-ss. Journal of the Semiconductor & Display Tech-nology, 2021, 20.2: 61-66.
  23. NA, Hyein, et al. The effect of composition of plasma resistance of CaO-Al2O3-SiO2 glasses under fluorocarbon plasma with Ar+. Applied Surface Science, 2019, 476: 663-667. https://doi.org/10.1016/j.apsusc.2019.01.133
  24. PARK, Jewon, et al. Effect of CaF2 on fluorocarbon plasma resistance and thermal properties of CaO-Al2O3-SiO2 glasses. Journal of Asian Ceramic Societies, 2021, 9.1: 334-340. https://doi.org/10.1080/21870764.2020.1868079
  25. JUNG, Yoon Sung, et al. Plasma resistant characteristics according to sintering conditions of CaO-Al2O3-SiO2 glass coating layer. Journal of the Korean Ceramic Society, 2022, 59.1: 86-93. https://doi.org/10.1007/s43207-021-00149-x
  26. Kyung Won Min, et al. CF4/O2/Ar Plasma Resistance of Al2O3 Free Multi-components Glasses. Journal of the Semiconductor & Display Technology, 2022, 21.3: 57-62