DOI QR코드

DOI QR Code

Thermal-annealing behavior of in-core neutron-irradiated epitaxial 4H-SiC

  • 투고 : 2022.08.08
  • 심사 : 2022.09.09
  • 발행 : 2023.01.25

초록

The effect of thermal annealing on defect recovery of in-core neutron-irradiated 4H-SiC was investigated. Au/SiC Schottky diodes were manufactured using a 4H-SiC epitaxial wafer that was neutron-irradiated at the HANARO research reactor. The electrical characteristics of their epitaxial layers were analyzed under various conditions, including different neutron fluences (1.3 × 1017 and 2.7 × 1017 neutrons/cm2) and annealing times (up to 2 h at 1700 ℃). Capacity-voltage measurements showed high carrier compensation in the neutron-irradiated samples and a recovery tendency that increased with annealing time. The carrier density could be recovered up to 77% of the bare sample. Deep-level-transient spectroscopy revealed intrinsic defects of 4H-SiC with energy levels 0.47 and 0.68 eV below the conduction-band edge, which were significantly increased by in-core neutron irradiation. A previously unknown defect with a high electron-capture cross-section was discovered at 0.36 eV below the conduction-band edge. All defect concentrations decreased with 1700 ℃ annealing; the decrease was faster when the defect level was shallow.

키워드

과제정보

This work was supported by the National Research Council of Science & Technology (NST) grant by the Korea government (MSIT) (No. CAP22011-200) and research fund of Hanyang University (HY-2019).

참고문헌

  1. G.L. Harris, Properties of Silicon Carbide, INSPEC, London, 1995, pp. 235-237. 
  2. E.M. Handy, et al., Al, B, and Ga ion-implantation doping of SiC, J. Electron. Mater. 29 (11) (2000) 1340-1345.  https://doi.org/10.1007/s11664-000-0135-z
  3. M.A. Capano, R. Santhakumar, R. Venugopal, M.R. Melloch, J.A. Cooper Jr., Phosphorus implantation into 4H-silicon carbide, J. Electron. Mater. 29 (2) (2000) 210-214.  https://doi.org/10.1007/s11664-000-0144-y
  4. J. Senzaki, K. Fukuda, K. Arai, Effects of annealing conditions on resistance lowering of high-phosphorus-implanted 4H-SiC, Mater. Sci. Forum 457-460 (2004) 901-905.  https://doi.org/10.4028/www.scientific.net/MSF.457-460.901
  5. Y. Negoro, et al., Electrical activation of high-concentration aluminum implanted in 4H-SiC, J. Appl. Phys. 96 (2004) 4916-4922.  https://doi.org/10.1063/1.1796518
  6. F. Roccaforte, et al., Selective doping in silicon carbide power devices, Materials 14 (2021) 3923-3946.  https://doi.org/10.3390/ma14143923
  7. H. Heissenstein, H. Sadowski, C. Peppermuller, R. Helbig, Radiation defects and doping of SiC with phosphorus by nuclear transmutation doping (NTD), Mater. Sci. Forum 338-342 (2000) 853-856.  https://doi.org/10.4028/www.scientific.net/MSF.338-342.853
  8. Byung-Gun Park, Gi-Doo Kang, Junesic Park, Test of neutron transmutation doping of SiC by implantation of phosphorous, Transactions of the Korean Nuclear Society Spring Meeting (Jeju, Korea, May 19-20, 2022) 
  9. Yong-Sam Chung, Sun-Ha Kim, , Jong-Hwa Moon, Sung-Yeol Baek, Hark-Rho Kim, Characteristics of a new pneumatic transfer system for a neutron activation analysis at the hanaro research reactor, Nucl. Eng. Technol. 41 (6) (2009) 813-820.  https://doi.org/10.5516/NET.2009.41.6.813
  10. S.M. Sze, K.K. Ng, Physics of Semiconductor Devices, third ed., 47, John Wiley & Sons, Hoboken, 2007, p. 138. 
  11. A. Itoh, T. Kimoto, H. Matsunami, High performance of high-voltage 4H-Sic Schottky barrier diodes, IEEE Electron. Device Lett. 16 (6) (1995) 280-282.  https://doi.org/10.1109/55.790735
  12. T. Kimoto, J.A. Cooper, Fundamentals of Silicon Carbide Technology, 103, John Wiley & Sons Singapore Pte. Ltd., Singapore, 2014, pp. 250-251. 
  13. D.V. Lang, Deep-level transient spectroscopy: a new method to characterize traps in semiconductors, J. Appl. Phys. 45 (1974) 3023-3032.  https://doi.org/10.1063/1.1663719
  14. L. Gelczuk, M. Da˛browska-Szata, M. Sochacki, J. Szmidt, Characterization of deep electron traps in 4H-SiC junction barrier Schottky rectifiers, Solid State Electron 94 (2014) 56-60.  https://doi.org/10.1016/j.sse.2014.02.008
  15. C. Hemmingsson, N.T. Son, O. Kordina, J.P. Bergman, E. Janzen, J.L. Lindstrom, S. Savage, N. Nordell, Deep level defects in electron-irradiated 4H SiC epitaxial layers, J. Appl. Phys. 81 (9) (1997) 6155-6159.  https://doi.org/10.1063/1.364397
  16. A.A. Lebedev, Deep level centers in silicon carbide: a review, Semiconductors 33 (2) (1999) 107-130.  https://doi.org/10.1134/1.1187657
  17. L. Storasta, J.P. Bergman, E. Janzen, A. Henry, J. Lu, Deep levels created by low energy electron irradiation in 4H-SiC, J. Appl. Phys. 96 (2004) 4909-4915. https://doi.org/10.1063/1.1778819