A Study on the Development of Mist-CVD Equipment Using the ADRIGE Algorithm of the Problem-Solving Method TRIZ

문제해결기법 TRIZ의 ADRIGE 알고리즘을 이용한 초음파분무화학기상증착 장비 개발에 관한 연구

  • Joohwan Ha (Advanced Electronic Materials Laboratory, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Seokyoon Shin (Advanced Electronic Materials Laboratory, Advanced Institute of Convergence Technology, Seoul National University) ;
  • Changwoo Byun (Advanced Electronic Materials Laboratory, Advanced Institute of Convergence Technology, Seoul National University)
  • 하주환 (서울대학교 차세대융합기술연구원 차세대전자재료연구실) ;
  • 신석윤 (서울대학교 차세대융합기술연구원 차세대전자재료연구실) ;
  • 변창우 (서울대학교 차세대융합기술연구원 차세대전자재료연구실)
  • Received : 2023.06.16
  • Accepted : 2023.06.20
  • Published : 2023.06.30

Abstract

This study the problem of deposition uniformity observed during Mist-CVD deposition experiments. The TRIZ's ADRIGE algorithm, a problem-solving technique, is utilized to systematically analyze the issue and propose solutions. Through problem and resource analysis, technical contradictions are identified regarding the precursor's volume and its path when it encounters the substrate. To resolve these contradictions, the concept of applying the principle of dimensional change to transform the precursor's three-dimensional path into a one-dimensional path is suggested. The chosen solution involves the design of an enhanced Mist-CVD system, which is evaluated for feasibility and analyzed using computational fluid dynamics. The analysis confirms that the deposition uniformity consistently follows a pattern and demonstrates an improvement in uniformity. The improved Mist-CVD equipment is validated through analysis, providing evidence of its feasibility and yielding satisfactory results.

Keywords

References

  1. Seok, Ogyun, "Power semiconductor technology trends for electric vehicles." The Korean Institute of Electrical Engineers 71(12), 9-15, 2022.
  2. Chun H W and Yang I S, "Market and Technology Development Trends of Power IC." Electronics and Telecommunications Trends, pp. 206-216, 2013.
  3. Choe Hyo-Sang and Jeong In-Seong. " Electric vehicle (EV) technology development status and trend." The Korean Institute of Electrical Engineer 66.9, pp. 35-40. 2017.
  4. Hyunwoo Kim and Hyungjun Kim. "Epitaxial Growth of Silicon Carbide (SiC) Using Chemical Vapor Deposition (CVD)." the Korean institute of electrical and electronic material engineers, Vol. 30, No. 6, pp. 29-39, 2017.
  5. Ey Goo Kang. "Ga2O3 Epi Growth by HVPE for Application of Power Semiconductor." Journal of IKEEE, Vol. 22, No. 2, pp. 427-431, 2018 https://doi.org/10.7471/IKEEE.2018.22.2.427
  6. Minhtan Ha, et al., "Leidenfrost Motion of Water Microdroplets on Surface Substrate: Epitaxy of Gallium Oxide via Mist Chemical Vapor Deposition." Advanced Materials Interfaces, Vol 8, No. 6, pp. 2001895, 2021.
  7. Kyoungho Kim, et al., "Growth of 2-inch α-Ga2O3 epilayers via rear-flow-controlled mist chemical vapor deposition." ECS Journal of Solid State Science and Technology 8.7, pp. Q3165-Q3170, 2019. https://doi.org/10.1149/2.0301907jss
  8. Minhtan Ha, et al., "Understanding Thickness Uniformity of Ga2O3 Thin Films Grown by Mist Chemical Vapor Deposition." ECS Journal of Solid State Science and Technology 8.7, pp. Q3106-Q3212, 2019. https://doi.org/10.1149/2.0381907jss
  9. Giang T. Dang et al. "Electronic devices fabricated on mist-CVD-grown oxide semiconductors and their applications." Japanese Journal of Applied Physics 58, pp. 090606, 2019.
  10. Yuya Matamura, et al. " Mist CVD of vanadium dioxide thin films with excellent thermochromic properties using a water-based precursor solution." Solar Energy Materials and Solar Cells 230, pp. 111287, 2021.
  11. Joohwan Ha, et al., "Uniformity Prediction of Mist-CVD Ga2O3 Thin Film using Particle Tracking Methodology." Journal of the Semiconductor & Display Technology, Vol. 21, No. 3, pp. 101-104, 2022.
  12. Joohwan Ha, et al., "Computational Fluid Dynamics for Enhanced Uniformity of Mist-CVD Ga2O3 Thin Film." Journal of the Semiconductor & Display Technology, Vol. 21, No. 4, pp. 81-85, 2022.
  13. Joohwan Ha, et al., "A Study on CFD Result Analysis of Mist-CVD using Artificial Intelligence Method." Journal of the Semiconductor & Display Technology, Vol. 22, No. 1, pp. 134-138, 2023.
  14. Songyeon Lee, et al., "A Study on Problem Solving of PLGA Scaffold Warpage Using 5 Step Practical TRIZ." Journal of the Semiconductor & Display Technology, Vol. 16, No. 4, pp. 25-29, 2017.
  15. Songyeon Lee, et al., "A Study on Manufacturing Condition of PLGA Scaffold Using 3SC Practical TRIZ and Design of Experiments." Journal of the Semiconductor & Display Technology, Vol. 17, No. 4, pp. 70-75, 2018.
  16. Songyeon Lee, et al., "A Study on Problem Solving of 3D Printing Production of Scaffold Using ADRIGE TRIZ Algorithm and DOE." Journal of the Semiconductor & Display Technology, Vol. 18, No. 2, pp. 92-97, 2019.
  17. Songyeon Lee, et al., "A Study on Manufacturing Problem Solving of Scaffold with Pore Using 3SC Practical TRIZ and Machine Learning." Journal of the Semiconductor & Display Technology, Vol. 18, No. 3, pp. 25-30, 2019.