Applied Chemistry for Engineering (공업화학)

The Korean Society of Industrial and Engineering Chemistry (한국공업화학회)
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Study of Methane CVD Process for Improving Conductivity and Controlling Functional Groups on Activated Carbon

활성탄의 전도성 향상 및 표면작용기 제어를 위한 메탄 CVD 공정 연구

  • Tae Ung Yoo (Hydrogen & C1 Gas Research Center, Korea Research Institute of Chemical Technology) ;
  • Hye In Hwang (Department Advanced Research and Development Team, VINA Tech) ;
  • Myoung Joon Hwang (Department Advanced Research and Development Team, VINA Tech) ;
  • Ji Sun Im (Hydrogen & C1 Gas Research Center, Korea Research Institute of Chemical Technology)
  • 유태웅 (한국화학연구원(KRICT) 수소C1가스연구센터) ;
  • 황혜인 (비나텍 R&D부문 선행개발팀) ;
  • 황명준 (비나텍 R&D부문 선행개발팀) ;
  • 임지선 (한국화학연구원(KRICT) 수소C1가스연구센터)
  • Received : 2024.09.06
  • Accepted : 2024.09.29
  • Published : 2024.12.10
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Abstract

Methane chemical vapor deposition (CVD) was conducted to enhance the conductivity of activated carbon (AC) and control its surface functional groups. The effect of methane decomposition on the conductivity and surface functional groups of AC was investigated. Methane decomposition was treated on 5 g AC into a tubular reactor at 900 ℃, with reaction times ranging from 5 to 30 min. The conductivity of the AC after methane decomposition increased by 117%, and surface functional groups were controlled up to 85%. As the reaction time increased, the conductivity of AC increased and the surface functional group content decreased. ACs in the section where conductivity significantly increased after the reaction were selected and named according to reaction temperature and time, and changes in characteristics of AC were examined. As a result, the activated carbon surface carbon was converted from sp3 to sp2 structure by methane CVD, and the effects of improved conductivity and reduced surface functional groups were confirmed. In this study, we confirmed that the effects of the methane CVD reaction on improving the conductivity of AC and controlling surface functional groups. Moreover, the mechanism of AC surface treatment by methane decomposition was analyzed and discussed.

활성탄의 전도성 향상 및 표면작용기 제어를 위해 메탄 CVD를 실시하고, 메탄 분해가 활성탄의 전도성 및 표면작용기에 미치는 영향에 대해서 고찰하였다. 메탄 분해는 관형 반응기에 활성탄 5 g을 투입하고, 900 ℃에서 반응시간을 5~30 min으로 달리해 실시하였다. 메탄 분해 활성탄은 전도도가 117% 향상되었고, 표면작용기는 85%까지 제어되었다. 반응시간이 증가할수록 활성탄의 전도도가 증가하고, 표면작용기 함량은 감소하였다. 반응 후 전도도가 크게 증가하는 구간의 활성탄을 선정하여 반응온도-반응시간에 따라 명명하고 특성 변화에 대해 고찰하였다. 결과적으로 메탄 CVD에 의해 활성탄 표면 탄소가 sp3에서 sp2 구조로 전환되었고, 전도성 향상 및 표면작용기 감소 효과를 확인하였다. 본 연구에서는 메탄 CVD 반응이 활성탄의 전도성 향상 및 표면작용기 제어에 미치는 영향을 확인하고, 메탄 분해에 의한 활성탄 표면처리 메커니즘에 대해 분석 및 고찰하였다.

Keywords

Acknowledgement

본 연구는 (주)비나텍의 수탁연구과제(수퍼커패시터의 내구성 향상을 위한 활성탄 표면 처리 기술 개발)와 산업통상자원부의 민·군경용기술개발사업(민·군경용기술개발사업 : 24-CM-EE-01)의 지원을 받아 수행하였으며 이에 감사드립니다.

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