A new analytical expression for the saturated I-V characteristics of hydrogenerated amorphous silicon thin film transistors(a-si:H TFT) is presented and experimentally verified. The results show that the experimental transfer and output characteristics at several temperatures are easily modeled. The model is based on three functions obtained from the experimental data of $I_D$ versus $V_G$. Theoretical results confirm the simple form of the model in terms of the device geometry. It was determined that the saturated drain current increased at a fixed gate voltage and the device saturated at increasingly larger drain voltages while the threshold voltages decreased.

CoNiCr/Cr and CoCrTa/Cr for longitudinal magnetic recording media were. prepared on Coming 7059 glass by RF magnetron sputtering. The thickness of Cr underlayer was varied from 500 to $3000{\AA}$ and. that of magnetic layer was $700{\AA}$. Coercivity and squareness were measured using V.S.M.(vibrating sample magnetometer). The coercivity of films increased with increasing Cr thickness when the films were unannealed. The coercivity of the films annealed in a 10 mtorr vacuum increased initially with annealing time and then saturated with further increase in annealing time. The coercivity value difference between the unannealed and annealed films increased with increasing the thickness of Cr underlayer No significant change was found in squareness after anneal, regardless of Cr underlayer thickness.

The dielectric reliability of the Thin $SiO_2$ films of wet oxidation on n-type Si substrates has been studied by using self-healing method of breakdown and according to injection time high frequence C-V tests. These experiments have been performed to investigate the dielectric breakdown mechanism of a thin film in which positive charge generation during high-field Fowler-Nordheim tunneling are considered. In addition, The weak spots and robust areas are distinguished so that the localized dielectric breakdown could be described.

To analyze Nonvolatile SNOSFET(polySilicon-Nitride-Oxide-Semiconductor Field Effect Transistor) memory device, two dimensional numerical computer simulation program was developed. The equation discretization was performed by the Finite difference method and the solution was derived by the Iteration method. The doping profile of n-channel device which was fabricated by 1Mbit CMOS process was observed. The electrical potential and the carrier concentration distribution to applied bias condition were observed in the inner of a device. As a result of the write and the erase to memory charge quantity, the threshold voltage shift is expected. Therefore, without device fabrication, the operating characteristics of the device was observed under various the processing and the operating condition.

Phosphorus doped hydrogenated microcrystalline silicon (${\mu}c$-Si:H) thin films were deposited by PECVD (Plasma Enhanced Chemical Vapour Deposition) method using 10.2% $SiH_4$ gas (diluted in Ar) and 308ppm $PH_3$ gas (diluted in Ar). The structural, optical and electrical properties of the films were investigated as a function of substrate temperature(15 to $400^{\circ}C$) and RF power(10 to 120W). The thin film deposited by varing substrate temperature had columnar structure and microcrystalline phase. The volume fraction of microcrystalline phase in the films deposited at RF power of 80W, increased with increasing substrate temperature up to $200^{\circ}C$, and then decreased with further increasing substrate temperature. Volume fraction of microcrystalline phase increased monotonously with increasing RF power at substrate temperature of $250^{\circ}C$. With increasing volume fraction of microcrystalline, electrical resistivity of films decreased to 0.274 ${\Omega}cm$.

Long incubation period of W nucleation on the TiN glue layer is a serious problem in blanket W process. In this study we investigated the dependence of W nucleation and growth rate on the preparation method of the TiN film, deposition temperature, chemistry, $SiH_4/WF_6$ ratio and sputter etching, ion implantation, and $SiH_4$ flushing pre-treatments. Incubation periods of W nucleation and deposition rates of W growth on three different TiNs are in the order of TiN>RTP-TiN> annealed TiN and TiN${\leq}$RTP-TiN${\leq}$ annealed TiN, respectively. $\beta$-W is not found on TiN substrate even for high $SiH_4/WF_6$ ratio. Sputter etching pre-treatment increases incubation period of W nucleation, while it decreases deposition rate. $SiH_4$ flushing pre-treatment decreases incubation period, but it slightly decreases deposition rate.

This paper is studies the addition effects of $La_2O_3$ on the magnetic properties of Sr ferrite. Compositions were chosen according to the formula $[SrO{\cdot}nFe_2O_3]_{100-x}(La_2O_3)_x$. where n was varied between 5.8~6.1 and x between 0~3. The composition of the best value $(BH)_{max}$=1.48MGOe was n=6(stoichiometric composition) and x=2 at $La_2O_3$ addition. This value was higher than that of ordinary isotropic strontium ferrite.

In this paper, the $(SrPb)(CaMg)TiO_3$-xBi_2O_3{\cdot}3TiO_2$ ceramics with paraelectric properties were fabricated by the mixed oxide method. In order to investigate the behavior of charged particles, the characteristics of electrical conduction and thermally stimulated current were measured respectively. As a result on characteristics of the electrical conduction, the leakage current was increased as measuring temperature was increased. At room temperature, the conduction current was divided into the three steps as a function of DC electric field. The first step was Ohmic region due to ionic conduction, below 15[kV/cm]. The second step was showed a saturation which seems to be related to a depolarizing field occuring in field-enforced ferroelectric phase, between 15[kV/cm] and 40[kV/cm]. The third step was attributed to Child's law related to spare charge which injected from electrode, above 40[kV/cm]. Thermally stimulated currents(TSC) spectra with various biasing fields exhibited three distinguished peaks that were denoted as ${\alpha}$, ${\alpha}'$ and ${\beta}$ peak, each of which appeared at nearby -30, 20 and 95[$^{\circ}C$] respectively. It is confirmed that the a peak was due to trap electron trapped in the grainboundary, and ${\alpha}'$ peak that was observed above only 1.5[kV/mm] was attributed to field-enforced ferroelectric polarization. The origin of ${\beta}$ peak was identified as ion migration which caused the degradation.

Pb(Zr,Ti)$O_3$ powders were synthesized by the partial oxalate method and the modified partial oxalate method, where the difference between the two is the use of pre-reacted (Zr,Ti)$O_2$ in the former method. When compared with conventional mixed oxide method, calcination temperature can be reduced to less than $700^{\circ}C$ by both partial oxalate methods, and the resulting particle size was finer and more uniform. Using partial oxalate-derived PZT powders, sintering temperatures can also be reduced as low as $950^{\circ}C$ without sacrificing desired dielectric and piezoelectric properties, such as relative permittivity, electromechanical coupling factor, and piezoelectric coefficient. Two partial oxalate methods yield ceramics with almost the same physical and electrical properties, so that the step of producing ZTO powder does not seem to be necessary.

In this study, the structural, dielectric and electrical properties of $0.85Pb(Zn_{1/3}Nb_{2/3})O_3-0.1BaTiO_3-0.05PbTiO_3$ ceramics were investigated with respect to the variations of $La_2O_3$ addition amount. The specimen with 0.2 [wt%] $La_2O_3$ addition amount, which has the coupling constants with the value of $k_p$=44.8[%]. $k_{31}$=25.4[%] and the piezoelectric constant with $d_{31}=100{\times}10^{-12}$[C/N] respectively, exhibits the relatively good values in the applications of electrostriction actuators.

Devices of ITO/CdS/CdTe/Te/Al were prepared by Electron-Beam deposition under a vacuum of $7{\times}10^{-6}$[torr]. Optical, Electrical, Structural and Photovoltaic properties of thin film CdS/CdTe at substrate. temperature 300~500[$^{\circ}C$] were also investigated, The structure of CdTe films deposited was of the zincblende type a preferential orientation of the (111) plane parallel to the substrate, the CdTe dark resistivity was about $10^6[{\Omega}cm]$. The conversion, efficiency of the cell increased with increasing substrate temperature. The best-fabricated Cell was a conversion efficiency of 9.1[%].

It was attempted to investigate the reaction of LB biological membrane in the gas surrounding by the use of LB method. The performance of the experiment was based on the idea that the adhesion of gas molecular on the surface of LB membrane, which induces the change of electrical properties, may make it possible to develop various sensor system modified from the sensor organs. The experimental results showed that for the acetone gas, the frequency changes in the proportional to the concentration of the gas. The reappearance of the gas reaction vs. frequency change was also able to be obtained properly.

In this study, $TiO_2$ thin films are fabricated by Sol-Gel method and dielectric, electric and humidity sensing properties have been investigated. The structure of Sol can be changed by controlling for hydrolysis reaction condition. The uniformity of the surface on $TiO_2$ thin films is confirmed by SEM. The permittivity of $TiO_2$ thin films increases according to heat treatment temperature, whereas the conductivity of $TiO_2$ thin films decreases according to heat treatment temperature, As the results of measuring humidity sensing properties of $TiO_2$ thin films fabricated as humidity sensor, it is confirmed to have good humidity sensing properties in high humidity and low frequency.

Using an aromatic system, we made a ultra thin insulator through LB-method. We measured and wrote down afternating currant characteristics of ultraviolet rays extincting-spectrum and I.R extincting-spectrum. We surveyed the thickness of a film through X-ray diffracting method and certified about $4{\AA}$ by the layer. Measuring the characteristics of direct current voltage and electric current with this sample, we produced its conductivity and discovered that this sample had a god insulating performance. Addition to this, we measured the characteristics of voltage and electric current, and the temperature dependency of conductivity in a high voltage system and with these results tried to interpret a mechanism of conduction.

In this paper, We prepared the thin film Cu-doped CdS Photovoltaic Cell, varying deposition condition by E-beam process and investigated its properties. After the Cu/CdS films were deposited on transparent ITO glass. We heat-treated to diffuse Cu atoms to CdS fi1m at 350[$^{\circ}C$]. With deposited Cu-doped CdS film. We investigated the electrical. optical. X-ray diffraction and junction property. We studied how to prepare the High conversion efficiency Solar cell window layer.

The amorphous phase of bulk and thin film in the As-Se-S-Ge system was observed by X-ray diffraction. Thermal analysis using DSC, DTA and TGA method has been used for the determination of the glass transition temperature, Tg. The glass transition temperature, Tg for the composition were $238^{\circ}C$ in $As_{40}Se_{15}S_{35}Ge_{10}$ and $231^{\circ}C$ in $AS_{40}Se_{25}S_{25}Ge_{10}$ and $As_{40}Se_{50}Ge_{10}$. The phase seperation of continuous phase and dispersive phase was observed by the optical texture of the polarizing microscope. Also, the glass transition temperature of the thin film was near $200^{\circ}C$. As the results of SEM-EDS analysis, the phase transition of the films by thermal treatment and light illumination was the amorphous to amorphous.

The purpose of this research was th evaluate conductivity of electricity of Ge-Se-Bi system Chalcogenide glass as a amorphous semiconductor by observing its dissolution and crystallization. In this experiment. Ge-Se-Bi metal powder in the rage of $Ge_{12-25}$, $Se_{65-85}$, $Bi_{2.5-15}$ was used as the sample ore. The ore was. put into a vaccous quartz tube and then melted. The condition of heat treatment was to dispose it to $1000^{\circ}C$ heat for 10 hours and then rapidly quenched it at $3834^{\circ}C$/see. The crystallization of the fused sample ripened as the change of temperature and time, after the crystal core was formell. At that time it was possible to observe the state that $Bi_2Se_3$ and $GeSe_2$ were crystallized. In the experiment of making memberance, the memberance was produced by using the previously experimented bulk sample. And decrystalization was well progressed when Ge was over 15 at %, Se was over 70 at %, and Bi was under 10 at%. As for bulk. when Ge was fixed to 20 at %, the conducting of electricity was increased as Bi gained at %. In the case of memberance, the conductivity was much more increased than that of bulk sample as the increase of at the increase of at % of Bi. In the experiment on $Ge_{20}$, $Se_{77.5}$ and $Bi_{2.5}$, the crystallization sswas most vigorous when they were kept at $330^{\circ}C$ for 4 hours.

The superconducting thin films deposited on $SiO_x$ substrate by R.F magnetron sputter using $YBa_2Cu_3O_x$ single target have been made and annealed at $940^{\circ}C$ for 30 min. The thickness of films were 1000-2000${\AA}$ with a rate of 20-25${\AA}/min$ and superconducting properties of thin films depended on the compositions of pre-annealed the thin films. It has been analyzed by SEM photo-analysis and X-ray diffraction patterns of these samples obtained under the various conditions of this sputtering methods. and recognized the supperconducting thin films by electric properties.

The polycrystalline $CuInS_2$ thin films are prepared by vacuum heat treatment of layer, which is deposited by vaccum evaporation in order. The electrical and optical properties of the films are investigated at various sulfur deposition mole rate, substrate temperature, heat treatment temperature and time. From data, n type-$CuInS_2$ exhibits resistivity, transmittance and energy band gap with 142[${\Omega}{\cdot}cm$], 73[%], and 1.5[eV] respectively at optimum fabrication condition. Finally, the films are fabricated with chalcoprite structure.

In this paper, MOS characteristics of gate dielectrics prepared by furnace oxidation of Si in an $N_2O$ ambient have been studied. Compared with the oxides grown in $O_2$, $N_2O$ oxides show significantly improved breakdown field and low flat band voltage. Also, $N_2O$ oxide is more controllable for ultrathin film growth than $O_2$ oxide. This improvement is caused by nitrogen incorporation into the $N_2O$ oxide. Therefore, the nitrogen-rich-layer at the Si/$SiO_2$ interface formed during $N_2O$ oxidation not only strengthen $N_2O$ oxide structure at the interface and improves the gate dielectric quality, it also acts as a oxidant diffusion barrier that reduces the oxidation rate significantly.

Cordierite glass ceramic has become an electronic substrate material for electronic circuits and the use of whiskers for improving strength and toughness is evident. Green sheets of mixtures containing 15% silicon nitride were sintered to greater than 99 % density. The microstructure was analysed using optical microscopy, scanning electron microscopy (SEM), and X-ray diffraction (XRD). The toughness and hardness were improved with increasing the whisker vol. % and sintering temperature. Especially, it is assumed that toughening increasing at the more high sintering temperature relevants to the glass phase increasing, as showned in the roughness of the fracture surfaces. It was directionally dependent of whisker direction during processing.

Using RF plasma CVD the diamond particles and films were deposited on Si and quartz substrate from $CH_4$-$H_2$ mixed gas. The temperature of substrate was uniformly maintained by inserting matal plate between substrate and substrate holder. As a result, the deposited diamond particles were mainly twins. The deposited diamond films were identified by SEM, XRD and Raman spectroscopy.

In this study, a single optical modulator which is fabricated on X-cut $LiNbO_3$ substrate by using proton exchange method is described. It is well-known that the proton exchange method is characterized by index change of the single optical modulator. As a results, it is found that the single optical waveguide varied widely with controlling diffusion process. The diffusion process was used to optimize the fabrication of the single optical modulator. On the other hand, the process was used to provide another performance improvement and it reduced the fabrication process.

This paper presents the results on experiments of relative dielectric constant dielectric loss, conductivity change and breakdown voltage of the L.D.P.E. mixed with Dodecyl Alcohol. The frequency range is 0.1 - 20 MHz and temperature, 20 - 80 $^{\circ}C$. Dielectric properties were similar to those of nonpolar polymers. Until $60^{\circ}C$ the conductivity value of compound was decreased with temperature increasment. And, its breakdown voltage was measured higher, about 3-4KV, than that of the pure L.D.P.E.. Also the amount of remnants of DA in the compounds were considered.

본 논문에서는 자기적분형 자계센서의 설계방법과 교정방법을 제안하고, 파도대전류에 의하여 형성되는 자계에 대한 거리-응답 특성시험과 주파수 변화에 대한 응답도의 측정을 수행하였다. 자기적분형 센서는 적분저항의 증가와 더불어 감지전압은 상승하였으나 감쇠시간은 줄어드는 특성을 나타내었다. 또한 전기적 등가회로를 구성하여 이론적으로 해석 한 바 실험결과와 잘 일치하였다.

In this paper, the properties of Thermally Stimulated Current was studied to understand carrier's behavior of $PVF_2$ film, to be regarded as the excellent piezo and pyroelectricity. The complex relaxation curve of Thermally Stimulated Current was divided into single relaxation style using Thermal Cleaning method. As a result of Applying the numerical method of asymtotic estimation to the divided single relaxation peak, we could calculated the physical factors related to charged particles of the specimen, more accurately.

MOS 커패시터가 이온화 방사선에 노출되었을 경우, MOS 커패시터의 방사선 조사 효과는 소자의 전기적 특성 및 동작 수명에 심각한 영향을 일으킬 수 있다. MOS 커패시터는 (100) 방향의 P-type Si wafer 위에 산화막층을 $O^2$+T.C.E. 분위기에서 성장하였으며, 그 두께는 40~80 nm로 만들었다. MOS 커패시터에 대한 방사선 조사는 $Co^{60}-{\gamma}$선을 사용하였고, 조사선량은 $10^4{\sim}10^8$으로 조사하였다. MOS 커패시터에서 전기적 전도 특성의 방사선 조사효과는 산화막 두께와 조사선량을 변화하면서 측정된 P-type MOS 커패시터는 조사선량에 의해서 강하게 영향을 받는다는 것과 저전계 영역에서의 Ohmic 전류가 전체 선량에 의존한다는 것을 알았다. 이 결과는 방사선 조사에 의해 산화막 트랩전하와 산화막-반도체($SiO_2$-Si)계면 트랩전하에 의해서 설명 할 수 있다.

In this paper, the skewness properties of partial discharge at interface layer in mica-epoxy composite material were investigated and studied on interface specimens which has internal electrodes. As a result, it has been confirmed that the interface exists as abnormal resin layer and the contact condition at the interface is depended upon the density of si lane aqueous solution. The Pulse frequency of discharge at abnormal interface has been shown a linear increasing with enlargement of discharge quantity according to rising of the applied voltage. Whereas, in case of normal interface, pulse frequency represented exponential increasing at the saturating point of discharge quantity. The aging model can be represented from the variable characteristics of skewness.

Diamond thin films by MWPECVD in methane-hydrogen mixed gas were studied, with emphasis on the investigation of the effect of discharge power and pressure. As a result, the growth rate of diamond thin films was affected by discharge power and the surface morphology of diamond thin films was affected by pressure. The growth rate of diamond films was about 1.65 ${\mu}m$/hr under the condition of MW power: 900W, pressure: 60torr, $H_2$ flow rate: 60sccm, $CH_4$ concentration: 1 % and deposition time: 5hr. The deposited diamond films were identified by SEM, XRD and Raman spectrophotometer.

The purpose of this research is to develop the lithium secondary battery. This paper describes the preparation, electrochemical properties of nontstoichiometric(NS)-$V_6O_{13}$ and characteristics of Li/$V_6O_{13}$ secondary battery. NS-$V_6O_{13}$ was prepared by thermal decomposition of $NH_4VO_3$ under Ar stream of 140ml/min~180ml/min flow rate. And then, this NS-$V_6O_{13}$ was used for cathode active material. Cathode sheet was prepared by compressing the composite of NS-$V_6O_{13}$, acetylene black(A.B) and teflon emulsion (T.E). Characteristics of the test cell are summarised as follows. Oxidation capacity of NS-$V_6O_{13}$ was about 20% less than its reduction capacity. A part of NS-$V_6O_{13}$ cathode active material showed irreversible reaction in early charge-discharge cycle. This phenomena seems to be caused by irreversible incoporation/discoporation of lithium cation to/from NS-$V_6O_{13}$ host. Discharge characteristics curve of Li/$V_6O_{13}$ cell showed 4 potential plateaus. Charge-discharge capacity was declined in the beginning of cycling and slowly increased in company with increasing of coulombic efficiency. Energy density per weight of $V_6O_{13}$ cathode material was as high as 522Wh/kg~765Wh/kg.