• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07a
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• pp.18-21
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• 2002

As the mask design rules get smaller, the probability of the process failure becomes higher due to the narrow overlay margin between the contact and metal interconnect layers. To obtain the minimum process margin, a tabbing and cutting method is applied with the rule based optical proximity correction to the metal layer, so that the protection to bridge problems caused by the insufficient space margin between the metal layers can be accomplished. The side-lobe phenomenon from the attenuated phase shift mask with the tight design nile is analyzed through the aerial image simulation for test patterns with variation of the process parameters such as numerical aperture, transmission rate, and partial coherence. The corrected patterns are finally generated by the rules extracted from the side-lobe simulation.

• Proceedings of the KAIS Fall Conference
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• 2002.11a
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• pp.201-204
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• 2002

Overlay margin 확보를 위한 oversizing과, design rule checking, jog filtering를 통하여 side-lobe를 추출하였다. 이렇게 추출한 side-lobe를 extent하고, Cr pattern을 정의하여 side-lobe 현상을 해결할 수 있었다. 하지만 이 방법은 mask제조 공정이 복잡하므로 Cr shield방식의 단점인 복잡한 mask제작공정과 구조를 단순화하기 위하여 scattering bar를 이용하였다. 따라서, scattering bar를 삽입하기 위한 rule을 생성하여 metal layer에 적용하고 aerial image simulation을 통해 side-lobe 현상이 억제되었음을 확인하였다. 그리고 앞에서와는 반대로 background clear의 경우에 발생하는 side-lobe에 scattering bar를 적용하여 억제됨을 확인하였다.

• Transactions on Electrical and Electronic Materials
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• v.5 no.3
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• pp.104-108
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• 2004

Problems of overlap errors and side-lobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

• Journal of Technology Innovation
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• v.19 no.1
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• pp.29-53
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• 2011

This paper analyzes the effects of government-sponsored R&D on firm's employment and management performance, using the panel data of manufacturing firms in the area of Busan, Ulsan and Gyungnam. The paper applies PSM to estimate the treatment effects(ATT) without sample selection bias. The findings show that government-sponsored R&D in the area has positive effects on the participating firms' employment and R&D for several years after completing R&D projects.

• Proceedings of the KAIS Fall Conference
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• 2002.05a
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• pp.106-108
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• 2002

반도체 physical layout design rule이 작아짐에 따라 Proximity effect와 overlay가 Pattern 구현에 크게 영향을 미치고 있다. Metal layer와 contact의 부족한 overlay margin으로 overlay 불량이 발생하고, 감소한 space margin으로 인해 bridge와 같은 문제가 나타난다. 따라서, resolution을 향상시키고, 최소한의 overlay margin을 확보함으로써 미세 pattern의 구현을 가능하게 한다. 이를 위해 OPC와 attPSM 같은 분해능향상기술이 사용된다. 그러나 attPSM의 사용은 원하지 않는 pattern이 생성되는 sidelobe와 같은 문제가 발생한다. 따라서 serial image simulation올 통해 추출한 rule을 rule-based correction에 적용하여 sidelobe현상을 방지한다. 그리고 overlay margin 부족으로 나타나는 문제는 metal layer와 contact overlap되는 영역의 line edge를 확장하고, rule checking을 통해 최소한의 space margin을 확보하여 해결한다 따라서 overlay error를 rule-based correction을 사용하여 효과적으로 방지한다.

• Proceedings of the IEEK Conference
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• 2002.06b
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• pp.209-212
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• 2002

As the mask design rules get smaller, the probability of the process failure becomes higher doc to the narrow overlay margin between the contact and metal interconnect layers. To obtain the minimum process margin, a tabbing and cutting method Is applied with the rule based optical\ulcorner proximity correction to the metal layer, so that the protection to bridge problems caused by the insufficient space margin between the metal layers can be accomplished. The side-lobe phenomenon from the attenuated phase shift mask with the tight design rule is analyzed through the aerial image simulation for test patterns with variation of the process parameters such as numerical aperture, transmission rate, and partial coherence. The corrected patterns are finally generated by the rules extracted from the side-lobe simulation.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2004.05a
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• pp.159-162
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• 2004

Problems of overlap errors and sidelobe printing by the design rule reduction in the lithography process using attenuated phase-shifting masks(attPSM) have been serious. Overlap errors and sidelobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the sidelobes and to get additional pattern fidelity at the same time.

• Proceedings of the IEEK Conference
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• 2004.08c
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• pp.784-786
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• 2004

Overlap errors and side-lobes can be simultaneously solved by the rule-based correction using scattering bars with the rules extracted from test patterns. Process parameters affecting the attPSM lithography simulation have been determined by the fitting method to the process data. Overlap errors have been solved applying the correction rules to the metal patterns overlapped with contact/via. Moreover, the optimal insertion rule of the scattering bars has made it possible to suppress the side-lobes and to get additional pattern fidelity at the same time.

• Proceedings of the KAIS Fall Conference
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• 2003.06a
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• pp.239-242
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• 2003

Scale down으로 인해 부족해진 overlay margin을 통해 충분히 확보해주고, 이와 동시에 attPSM(attenuated phase shift)의 사용으로 발생하는 side-lobe 현상을 억제하기 위한 방법으로 rule-based OPC(optical proximity correction)룰 사용하여 side-lobe만을 효과적으로 추출한 후, 그 자리에 scattering bar를 삽입하였다. 그리고 ORC(optical rule checking)를 통해 original layout과 aerial image의 EPEs(edge placement errors)를 검사하여 검증에 걸리는 시간을 감소시켰다.

• Journal of Labour Economics
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• v.43 no.3
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• pp.33-61
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• 2020

The purpose of this study is to analyze the disparity in on-the-job training between regular and non-regular workers and to compare the wage effects of on-the-job training. Using the Korean micro data from the Programme for the International Assessment of Adult Competencies(PIAAC) published by OECD, Propensity Score Method(PSM) is applied to overcome the endogeneity problem. The average treatment effect(ATT) on the training participation is analyzed, using non-regular workers as treatment group and regular workers as comparison group. Odds ratios of non-regular employees' training participation compared to regular employees shows 0.67 times after constructing matching sample and this means that non-regular workers are facing a disadvantageous training opportunity compared to regular workers. In order to estimate the wage effect of on-the-job training, the average treatment effect(ATT) of on-the-job training on average wages for regular workers and non-regular workers is estimated respectively. I find insignificant wage effect from on-the-job training among regular workers and significant positive effect on non-regular worker's wage from on-the-job training.