• Title/Summary/Keyword: C-axis oriented growth

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Nucleation and Growth of b-Axis Oriented $PrBa_2Cu_3O_{7-x}$ Thin Films on $LaSrGaO_4$ (100) Substrates

  • Sung, Gun-Yong;Suh, Jeong-Dae
    • ETRI Journal
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    • v.18 no.4
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    • pp.339-346
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    • 1997
  • Good quality a-axis oriented thin films of $YBa_2Cu_3O_{7-x}$ may be grown by the use of a $PrBa_2Cu_3O_{7-x}$ (PBCO) layer as a template. Here we present a detailed study of the nucleation of the PBCO layer, explaining the orientations observed. It is determined that the wavy surface of a $LaSrGaO_4$ (LSGO) (100) substrate consists of the {101} planes by observing cross-sectional transmission electron microscopy images of the interface between the PBCO film and the substrate. The images and selected area diffraction patterns show that a mixed c-and b-axis oriented PBCO layer was initially grown on the substrate, followed by pure b-axis oriented PBCO growth. We explain that the c-axis oriented growth is the result of the growth of the PBCO (019) planes on the LSGO (101) planes. We conclude that the nucleation and growth of the PBCO films at the initial stages depends on the crystallographic plane of the substrate surfaces, however, as the film grows further, the kinetics of the deposition process favors b-axis oriented growth.

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The Effect of Bi Content on the C-axis Oriented Growth of $SrBi_2$$Ta_2$$O_9$ Thin Films Fabricateed by R.F. Magnetron Sputtering (R.F. 마그네트론 스퍼터링에 의한 제조된 $SrBi_2$$Ta_2$$O_9$ 박막의 C축 배향성장에 미치는 Bi양의 영향)

  • 배철휘;이전국;이시형;정형진
    • Journal of the Korean Ceramic Society
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    • v.35 no.10
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    • pp.1107-1112
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    • 1998
  • We could obtan c-axis oriented $SrBi_2$$Ta_2$$O_9$ thin films on usual Pt(111)/Ti/$SiO_2$/Si(100) substrate using a r. f. magnetron sputtering technique. According to the increase of sputtering pressure from 250 to 300 mTorr the Bi content and degree of the c-a xis preferred orientation of $SrBi_2$$Ta_2$$O_9$ thin films were increased. By controlling Bi(or $Bi_2O_3$) loss from $SrBi_2$$Ta_2$$O_9$ thin films during post annealing and by inserting $Bi_2O_3$ layer in $SrBi_2$$Ta_2$$O_9$ thin films the effect of Bi content on the c-axis oriented growth of $SrBi_2$$Ta_2$$O_9$ thin films could be investigated without the effect of sputtering pressure. The degree of the c-axis preferred orientation of $SrBi_2$$Ta_2$$O_9$ thin films was increased with increasing with increasing Bi content by control of Bi(or $Bi_2O_3$) loss of $SrBi_2$$Ta_2$$O_9$ thin films. But the c-axis oriented growth of $SrBi_2$$Ta_2$$O_9$ thin films disappeared by the inserting of $Bi_2O_3$ lay-er in $SrBi_2$$Ta_2$$O_9$ thin films.

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TEM study on a-axis outgrowth formation in c-axis oriented YBa$_2$Cu$_3$O$_{7-{\delta}}$ thin films

  • Hahn, T.S.;Hong, K.S.;Kim, C.H.
    • 한국초전도학회:학술대회논문집
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    • v.10
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    • pp.51-55
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    • 2000
  • Using modified melt-textured grown targets, YBa$_2$Cu$_3$O$_{7-{\delta}}$ thin films were prepared by pulsed laser deposition technique at the laser energy density from 1 J/cm$_2$ to 4 J/cm$_2$. All the films showed c-axis preferred orientations, however, a-axis outgrowths on the film surface were considerably increased with an increase of the laser energy density. To examine the origin of the a-axis outgrowth formation, the microstructures of films deposited at 2 J/cm$_2$ and 4 J/cm$_2$ were investigated using X-ray diffraction, transmission electron microscopy, and high-resolution electron microscopy. It was shown that a significant number of Y$_2$O$_3$ inclusions were formed during the growth of c-axis oriented films at 4 J/cm$_2$. These inclusions formed nucleation sites for the a-axis outgrowths. It is considered that, due to the unstable growth conditions with a high flux density of incident vapor species and the strain induced by the surrounding c-axis films, the Y$_2$O$_3$ inclusions would prefer the nucleation of α-axis grains.

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Orientation Control of $SrBi_2Ta_2O_9$ Thin Films on Pt (111) Substrates

  • Lee, Si-Hyung;Lee, Jeon-Kook;Choelhwyi Bae;Jung, Hyung-Jin;Yoon, Ki-Hyun
    • The Korean Journal of Ceramics
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    • v.6 no.2
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    • pp.116-119
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    • 2000
  • The a-axis and c-axis prefer oriented SBT thin films could be deposited on Pt(111)/Ti/$SiO_2$$650^{\circ}C$). The c-axis preferred orientation of SBT film can be obtained by Sr deficiency and high compressive stress. However, the a-axis-oriented grains can be formed under stoichiometric Sr content and nearly stress-free state.

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Phase Stability of Laser-ablated $SmBa_2Cu_3O_{7-y}$ thin Films Investigated by Raman Scattering Spectroscopy

  • Kim, G.;Jeong, A.R.;Jo, W.;Park, D.Y.;Cheong, H.;Tsukada, A.;Hammond, R.H.;Beasley, M.R.
    • Progress in Superconductivity
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    • v.11 no.2
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    • pp.141-146
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    • 2010
  • Phase stability diagram and boundary of a- and c-axis orientation of $SmBa_2Cu_3O_{7-y}$ (SmBCO) thin films grown by pulsed laser deposition (PLD) were reported with studies based on x-ray diffraction [1]. Four different samples are systematically analyzed: normal c-axis oriented orthorhombic $SmBa_2Cu_3O_{7-y}$, a-axis oriented $SmBa_2Cu_3O_{7-y}$, c-axis oriented orthorhombic $SmBa_2Cu_3O_{7-y}$ with $Sm_2BaCuO_5$ phase, and a mixture with c-axis oriented orthorhombic $SmBa_2Cu_3O_{7-y}$ and anomalously long-c tetragonal $SmBa_2Cu_3O_x$. Raman scattering spectroscopy equipped with polarization analysis elucidates the crystal orientation and the origin of the growth of the materials. It indicates that the technique can be used for quality control of conductor manufacturing processes as well as for enhancement of the materials properties.

Effect of Depositon Variables and Heat-treatment on the Growth Charateristics and Electrical Resistivity of ZnO Thin Film by Sputtering (증착변수 및 열처리 효과가 스퍼터링된 ZnO 박막의 성장 특성 및 전기비저항에 미치는 영향)

  • 하재수;김광호
    • Journal of the Korean Ceramic Society
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    • v.35 no.7
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    • pp.733-739
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    • 1998
  • C-axis oriented zinc oxide thin films were deposited on Cornign 1737 glass substrate by an rf magnetron sputtering technique. The effects of deposition parameters and post heat-treatment on the crystallinity and electical properties of ZnO films were investigaed. As-deposited ZnO films showed the strong c-axis growth and excellent crystallinity under the deposition conditions as follows: substrate temperature 350$^{\circ}C$ ; growth and excellent crystallinity under the deposition conditions as follows ; substrate temperature 350$^{\circ}C$ rf power 75W ; gas pressure 6m Torr; percentage of oxygen 50% The higher heat-treating temperatue was the stronger c-axis growth and the better crystallinity of the deposited ZnO films were. The resistivity of ZnO films was significantly affected by deposition parameters and post heat-treatment. With increasing increased. After post heat-treating at 400$^{\circ}C$ in air the resistivity of ZnO films increased but post heat-treat-ing temperature 500$^{\circ}C$ rather diminished the film resistivity.

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Epitaxial Growth of ZnO Thin Films on (100) $LaAlO_3$ Substrate by Pulsed Laser Deposition (PLD를 이용한 (100) $LaAlO_3$ 기판위의 ZnO 에피택셜 박막 성장)

  • Cho, Dae-Hyung;Kim, Ji-Hong;Moon, Byung-Moo;Jo, Yeong-Deuk;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.256-256
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    • 2008
  • We report epitaxial growth of ZnO thin films on (100) single-crystalline $LaAlO_3$ (LAO) substrates using pulsed laser deposition (PLD) at different substrate temperatures (400~$800^{\circ}C$). The structural and electrical properties of the films have been investigated by means of X-ray diffraction (XRD), atomic force microscope (AFM), transmission line method (TLM). The poly-crystalline of $\alpha$- and c-axis oriented ZnO film was formed at lower deposition temperature ($T_s$) of $400^{\circ}C$. At higher $T_s$, however, the films exhibit single-crystalline of $\alpha$-axis orientation represented by ZnO[$\bar{1}11$ || LAO <001>. The electrical properties of ZnO thin films depend upon their crystalline orientation, showing lower electrical resistivity values for $\alpha$-axis oriented ZnO films.

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C-axis Orientation and Growth Structure of AIN Thin Films on $SiO_2$/Si Substrates Deposited by Reactive RF Magnetron Sputtering

  • Joo, Han-Yong;Lee, Jae-Bin;Kim, Hyeong-Joon
    • The Korean Journal of Ceramics
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    • v.3 no.4
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    • pp.257-262
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    • 1997
  • Aluminum nitride(AIN) thin films were deposited on SiO$_2$/Si substrates by reactive sputtering for the application of SAW devices. The major deposition parameters such as pressure, nitrogen fraction, rf power, substrate distance were changed to find out the optimal condition for c-axis oriented thin films on an amorphous substrate. The effects of deposition parameters on the crystal structure, residual stress, and growth morphology of thin films were characterized by XRD, SEM, and TEM. The FWHM of (002) rocking curve of the films deposited at the proper condition was lower than 2.2$^{\circ}$(C=0.93$^{\circ}$). Cross-sectional TEM showed that self-aligned structure was developed just after slightly random growth at the initial stage. The frequency characteristics of test device fabricated from AIN thin films confirmed their piezoelectric property and applicability for SAW devices.

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Preparation and Pervaporative Alcohol Dehydration of Crystallographically b/c-axis Oriented Mordenite Zeolite Membranes (결정학적으로 b/c-축 방향으로 배향된 모데나이트 제올라이트 분리막의 제조 및 투과증발 알코올 탈수 거동)

  • Kim, Young-Mu;Lee, Du-Hyoung;Kim, Min-Zy;Cho, Churl-Hee
    • Membrane Journal
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    • v.28 no.5
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    • pp.340-350
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    • 2018
  • In the present study, crystallographically b- and c-axis oriented mordenite zeolite membranes were prepared and their pervaporative ethanol dehydration was investigated. The seed layer with a high coverage grew to be c-axis oriented dense layer, while the seed layer with a low coverage grew to be b-axis oriented layer. This phenomenon could be explained by the evolutionary selection growth mechanism. The b-axis grown membrane with 8-membered rings showed a high separation factor of above 1000 and a considerable total flux of around $0.2kg/m^2h$. The c-axis grown, columnar structured membrane with 8- and 12-membered rings showed a low separation factor of less than 200 and a relatively high total flux of around $0.25kg/m^2h$. The high performance of b-axis grown membrane was due to the relatively small opening of 8-membered rings. Water molecules can freely permeate through the openings, but ethanol molecules, difficultly. Therefore, in the present study, we introduced a new method to control crystallographic orientation of mordenite membrane by changing seeding amount of needle-like crystals, and elucidated that b-axis oriented mordenite membrane showed better performance than c-axis grown mordenite membrane.

Low Temperature Processing of $SrBi_2Ta_2O_9$ Thin Films

  • Choelhwyi Bae;Lee, Jeon-Kook;Park, Dongkyun;Jung, Hyung-Jin
    • The Korean Journal of Ceramics
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    • v.6 no.2
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    • pp.110-115
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    • 2000
  • $SrBi_2Ta_2O_9$ thin films were deposited at room temperature on the usual (111) oriented Pt bottom electrodes using r.f. magnetron sputtering, and then post-annealed at 650-$800^{\circ}C$ for 30min in oxygen flow. Low temperature processing which shows the preferred oriented SBT thin films was obtained by controlling the sputtering pressure and/or Sr content in target. The orientation and grain growth behavior of SBT thin films were dependent on Sr contents in films. With increasing the excess Bi content up to 50% in SBT thin films, it was possible to lower the onset temperature of grain growth. The c-axis preferred oriented SBT thin films were well-grown under the condition of low post-annealing($650^{\circ}C$) by lowering post-annealing pressure. After $10^{11}$ switching cycles, no polarization degradation was observed in both preferred oriented SBT capacitors.

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