• Journal of the Korean Crystal Growth and Crystal Technology
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• v.19 no.5
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• pp.215-222
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• 2009

Many concepts of external magnetic field applications in crystal growth processes have been developed to control melt convection, impurity content and growing interface shape. Especially, travelling magnetic fields (TMF) are of certain advantages. However, strong shielding effects appear when the TMF coils are placed outside the growth vessel. To achieve a solution of industrial relevance within the framework of the $KRISTMAG^{(R)}$ project inner heater-magnet modules(HMM) for simultaneous generation of temperature and magnetic field have been developed. At the same time, as the temperature is controlled as usual, e.g. by DC, the characteristics of the magnetic field can be adjusted via frequency, phase shift of the alternating current (AC) and by changing the amplitude via the AC/DC ratio. Global modelling and dummy measurements were used to optimize and validate the HMM configuration and process parameters. GaAs and Ge single crystals with improved parameters were grown in HMM-equipped industrial liquid encapsulated Czochralski (LEC) puller and commercial vertical gradient freeze (VGF) furnace, respectively. The vapour pressure controlled Czochralski (VCz) variant without boric oxide encapsulation was used to study the movement of floating particles by the TMF-driven vortices.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.06a
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• pp.29-33
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• 1998

Transport phenomena paly an inmportant role in bulk crystal growth processes. During crystal growth, the control of the growth front and the dopant concentration is crucial to crystal quality. The growth feasibility in thus determined by the heat transfer controlling the interface convexity and by the mass transfer controlling the constitutional supercooling. Through numerical modeling, a thorough understanding of the growth processes is possible, which in turn is a key to process improvenment. In this paper, we will summarize some work dine in my laboratory, both numerical and experimental, to illustrate the importance of understanding the transport phenomena during crystal growth processes.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.28 no.4
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• pp.148-151
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• 2018

A large single crystal of AlN was grown by PVT (Physical Vapor Transport) method. The AlN crystal shaped hexagonal of the diameter of about 46 mm and the thickness of 7.6 mm was grown using 33 mm seed crystal which was grown and made by ourselves. We tried to find out repeatable growth possibility for AlN crystal growth and then to evaluate the repeatability of the growth condition of the temperature of $1950{\sim}2100^{\circ}C$ and the ambient pressure of 0.1~1 atm.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1998.06a
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• pp.27-28
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• 1998

• Transactions of the Korean Society of Mechanical Engineers B
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• v.20 no.10
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• pp.3322-3333
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• 1996

A numerical analysis has been conducted to investigate a modified floating-zone crystal growth process in which most of the melt surface is covered with a heated ring. The crystal rod is not only pulled downward but rotated around its axisymmetric line during crystal growth process in order to produce the flat interface of crystal growth and the single crystal growth of NaNO3 is considered in 6mm diameter. The present study is made from a full-equation-based analysis considering a pulling velocity in all of solid and liquid domains and both of solid-liquid interfaces are tracked simultaneously with a governing equation in each domain. Numerical results are mainly presented for the comparison of the surface shape of rotational crystal rod with that of no-rotational crystal rod and the effects of revolution speeds of the crystal rod. Results show that the rotation of crystal rod produces more its flat surface. In addition, the shape of crystal growth near the centerline is more concaved with the increase in the revolution speed of crystal rod. The flow pattern and temperature distribution is analyzed and presented in each case. As the pulling velocity of crystal rod is increasing, the free surface of the melt below the heated ring is enlarged due to the crystal interface migrating downward.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.10 no.1
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• pp.13-16
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• 2000

Progress in Si crystal and wafer technologies is discussed on single crystal growth, wafer fabrication, epitaxial growth, gettering, 300 mm and SOI. As for bulk crystal growth, the mechanism of grown-in defects (voids) formation, the succes of grown-in defect free crystal growth technology and nitrogen doped crystal are shown. New wafer fabrication technologies such as both-side mirror polishing and etchingless process have been developed. The epitaxial growth of SiGe/Si heterostructure for high speed bipolar device is treated. Gettering technology under low temperature process such as RTP is important, and also it is shown that IG effect for Ni could be predicted using computer simulation of precipitate density and size. The development of 300 mm wafer and SOI has made progress steadily.

• Current Photovoltaic Research
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• v.8 no.1
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• pp.17-26
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• 2020

It is clear that monocrystalline Silicon (Si) ingots are the key raw material for semiconductors devices. In the present industries markets, most of monocrystalline Silicon (Si) ingots are made by Czochralski Process due to their advantages with low production cost and the big crystal diameters in comparison with other manufacturing process such as Float-Zone technique. However, the disadvantage of Czochralski Process is the presence of impurities such as oxygen or carbon from the quartz and graphite crucible which later will resulted in defects and then lowering the efficiency of Si wafer. The heat transfer plays an important role in the formation of Si ingots. However, the heat transfer generates convection in Si molten state which induces the defects in Si crystal. In this study, a crystal growth simulation software was used to optimize the Si crystal growth process. The furnace and system design were modified. The results showed the melt-crystal interface shape can affect the Si crystal growth rate and defect points. In this study, the defect points and desired interface shape were controlled by specific crystal growth rate condition.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.26 no.2
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• pp.53-57
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• 2016

6H-SiC single crystals were grown by using a resistance heating system. It was recognized that the growth behavior was different according to the different growth temperatures. It was revealed that the temperatures at the source feeding and at the crystal growth position had to be controlled independently. In this report, the effect of growth temperature on the SiC crystal growth was discussed.

• Proceedings of the Korea Association of Crystal Growth Conference
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• 1996.06a
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• pp.449-461
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• 1996

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.13 no.2
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• pp.51-55
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• 2003

The interrelation into nucleation and thermodynamic parameters of solutions has been established by plotting of various dependencies: the enthalpy of dissolution, solubility product and super-solubility on ionic salt radii and also the extent of deviation from an ideal Debye -Huckel model of electrolyte solution on solubility product. The possible methods of perfect crystal growth from aqueous solution have been found a priori by separating of known set of pair values of solubility and super-solubility into no less than six-nine characteristic and distinctive sub-sets.