• Title/Summary/Keyword: Dielectric function

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Optical dielectric function of impurity doped Quantum dots in presence of noise

  • Ghosh, Anuja;Bera, Aindrila;Ghosh, Manas
    • Advances in nano research
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    • v.5 no.1
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    • pp.13-25
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    • 2017
  • We examine the total optical dielectric function (TODF) of impurity doped GaAs quantum dot (QD) from the viewpoint of anisotropy, position-dependent effective mass (PDEM) and position dependent dielectric screening function (PDDSF), both in presence and absence of noise. The dopant impurity potential is Gaussian in nature and noise employed is Gaussian white noise that has been applied to the doped system via two different modes; additive and multiplicative. A change from fixed effective mass and fixed dielectric constant to those which depend on the dopant coordinate manifestly affects TODF. Presence of noise and also its mode of application bring about more rich subtlety in the observed TODF profiles. The findings indicate promising scope of harnessing the TODF of doped QD systems through expedient control of site of dopant incorporation and application of noise in desired mode.

A Study on the Electrical Properties of Ethylene Propylene Rubber by Thermal Treatment and Irradiation (방사선 및 열처리에 의한 에틸렌프로필렌 고무의 전기적 특성에 관한 연구)

  • 이성일
    • Journal of the Korea Safety Management & Science
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    • v.4 no.4
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    • pp.137-146
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    • 2002
  • In order to investigate the effect of irradiation by $^{60}Co-\gamma$rays as well as the e thermal treatment on the dielectric deterioration in ethylene propylene rubber, insulating material for electric cables used in atomic power plants, charging discharging current, residual built- up voltage and dielectric properties are measu discussed in this study. Variance in the characteristic of relative dielectric constant as a function of tem was observed in relatively high dose of irradiation. Since glass transition tem appeared at tens of degree Celsius below zero, the characteristic is attributed orientation polarization. Dielectric loss is generally increased, with increasing d irradiation in the characteristic of dielectric loss as a function of temperature, No d loss by thermal treatment was observed. Dielectric resistance decreases with increa of irradiation in the characteristic of charging current as a function of temperature be considered that dielectric resistance seems to be recovered by thermal treatm characteristic of discharging current as a function of time in the specimen less ir become similar to that of the unirradiated, when thermal treated. A peak is shown residual built- up voltage as a function of time, and the corresponding time of the shorten as increasing dose of irradiation. It is also observed that the corresponding the peak is lengthened by thermal treatment.

Viscosity Prediction of Synthetic Lubricants from Temperature and Pressure Dependence of Dielectric Relaxation Time

  • Suzuki, A.;Masuko, M.
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2002.10b
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    • pp.355-356
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    • 2002
  • The dielectric permittance and the dielectric loss factor of several lubricating oils were measured at frequencies from 100 Hz to 1.5 MHz. The measurements were carried out under atmospheric pressure as a function of temperature and under fixed temperature as a function of pressure. Temperature and pressure dependence of dielectric relaxation time were investigated. The temperature dependence of relaxation time obeyed the Vogel-Fulcher-Tammann (VFT) law. We modified the VFT equation in order to express the dielectric relaxation time as a function of temperature and pressure. Furthermore. by taking into consideration the similarity of the temperature and pressure dependence between dielectric relaxation and mechanical relaxation. the prediction of high-pressure viscosity were conducted. The predicted results were compared with the viscosity data obtained from the falling-sphere type viscometer.

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Analysis of a Dipole Antenna Attached on a Dielectric Slab Using a Spectral-Domain Green's Function and the Method of Moments (주파수 영역 Green 함수와 모멘트법을 이용한 유전체 평판 부착 다이폴 안테나의 특성해석)

  • 오이석
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.21 no.10
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    • pp.2703-2709
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    • 1996
  • This paper proposes an exact numerical method for analyzing a dipole antenna attached on a dielectric slab. A Green's function for an infinitesimal current filament on a dielectric slab is derived and a field integral equation is formulated using a boundary condition. The moment Method is used to solve the field integral equation to otain current distribution on the antenna. Since an asymptotic function is used to compute the impedance matrix elements, the computataion time is significantly reduced. Using the computed current distributions, the input impedances, the resonance lengths and the resonant resistances of the antennas for various values of the thichnessandthe dielectric constant of the slab are obtained. It was found that the resonant length and the resonant resistance are decrease monotonically as the dielectric constant increases, however, those are changed up-and-down as the substrate thickness increases.

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Parametric modeling for the dielectric function of $Cd_{0.77}Mg_{0.23}Te$ alloy film

  • Ihn, Yong-Sub;Kim, Tae-Jung;Kim, Young-Dong
    • Journal of Korean Vacuum Science & Technology
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    • v.6 no.4
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    • pp.149-152
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    • 2002
  • We performed the modeling of the dielectric functions of C $d_{0.77}$M $g_{0.23}$Te by using parametric semiconductor model. Parametric model describes the analytic dielectric function as the summation of several energy-bounded Gaussian-broadened polynomials and provides a reasonably well parameterized function which can accurately reproduce the optical constants of semiconductor materials. We obtained the values of fitting parameters of the Mg composition 0.23 in the parametric model. From these parameters we could remove interference oscillations to obtain the dielectric function of C $d_{0.77}$M $g_{0.23}$Te alloy film for full 0.5-6.0 eV energy range.y range.

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Parametric model for the dielectric function of InGaAs alloy films (Parametric model을 이용한 InGaAs 박막의 유전함수 연구)

  • 인용섭;김태중;최재규;김영동
    • Journal of the Korean Vacuum Society
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    • v.12 no.1
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    • pp.20-24
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    • 2003
  • We Performed the modeling of the dielectric functions of InGaAs by using the parametric semiconductor model. Parametric model describes the analytic dielectric function as the summation of several energy-bounded Gaussian-broadened polynomials and provides a reasonably well parameterized function which can accurately reproduce the optical constants of InGaAs materials. We obtained the values of fitting parameters of an arbitrary composition $\chi$ through the parametric model. And then, from these parameters we could obtain the unknown dielectric functions of InGaAs alloy films ($0\leq\chi\leq1$).

Stability of Ta-Mo alloy on thin gate dielectric (박막 게이트 절연체 위에서 Ta-Mo 합금의 안정성)

  • Lee, Chung-Keun;Kang, Young-Sub;Seo, Hyun-Sang;Hong, Shin-Nam
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.04b
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    • pp.9-12
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    • 2004
  • This paper investigated the stability of Ta-Mo alloy on thin gate dielectric. Ta-Mo alloy was deposited by using co-sputtering process after thermal growing of 3.4nm and 4.2nm silicon dioxide. When the sputtering power of Ta and Mo were 100W and 70W, respectively, the suitable work function for NMOS gate electrode, 4.2eV, could obtain. To prove interface thermal stability of thin film gate dielectric and Ta-Mo alloy, rapid thermal annealing was performed at $600^{\circ}C$ and $700^{\circ}C$ for 10sec in Ar ambient. The results of interface reaction were surveyed by change of silicon dioxide thickness and work function after annealing process. Also, the reliability of alloy gate and gate dielectric could be confirmed by quantity of leakage current. Ta-Mo alloy was showed low sheet resistance and thermal stability, namely, little change of gate dielectric and work function, after $700^{\circ}C$ annealing process.

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Transparent dielectric layer having color-filter function for PDP

  • Lee, Sung-Wook;Kwon, Tae-In;Lee, Yoon-Kwan;Ryu, Byung-Gil;Yoo, Eun-Ho;Park, Myung-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.632-634
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    • 2002
  • Transparent dielectric layer having color-filter function in front panel for PDP(Plasma Display Panel) was successfully fabricated and characterized. Transparent dielectric layer in front panel was made of glass based on $PbO-SiO_2-B_2O_3$ ternary system. The change of properties with content variation of oxide colorants in transparent dielectric layer having color-filter function was systematically accessed. It was demonstrated that the optimized content of oxide colorants to parent glass could greatly increase up contrast ratio and color temperature without significantly degrading luminance.

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Above bandgap optical properties of ZnS grown by hot-wall epitaxy

  • Lee, M.S.;Koo, M.S.;Kim, T.J.;Kim, Y.D.;Yoo, Y.M.;O, B.;Choi, Y.D.
    • Journal of Korean Vacuum Science & Technology
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    • v.3 no.2
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    • pp.112-115
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    • 1999
  • The real ($\varepsilon$1) and imaginary ($\varepsilon$2) parts of the dielectric function of ZnS have been measured by spectroscopic ellipsometry (SE) in the 3.7-6.0 eV photon-energy range at room temperature. The obtained dielectric function spectra reveal distinct structures at energies E0/(E0+$\Delta$0) and E1 critical points. The spectrum after chemical treatment to remove surface oxide overlayer showed that these data seem to be the best representation of the dielectric function of ZnS, having the largest $\varepsilon$2 value at E1 peak region reported so far by SE. Dielectric-related optical constants of ZnS, such as the complex refractive indices (n+n=ik), absorption coefficient, and reflectance, are also presented.

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Influence of the Metallization During the Manufacturing of the Ceramic Capacitor on the Dielectric Properties (콘덴사 제어에 있어서 금속화과정이 유도특성에 미치는 영향)

  • Ho-Gi Kim
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.33 no.2
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    • pp.83-87
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    • 1984
  • Influence of the metallization during the manufacturing of the ceramic multilayer capacitor on the dielectric properties was studied as a change of the capacity and the dissipation factor. Due to the change of the relative dielectric constant as a function of the measuring temperature the influence of the metallization could be obtained and the change of the dissipation factor as a function of the measuring frequency was anaysed. In order to investigate the boundary effect between the metallization and the dielectric a kind of microstructure model at the internal Grain and Grain Boundary was constructed and tried to analyse the change of the dielectric properties.

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