• Journal of the Korean Society for Precision Engineering
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• v.23 no.11 s.188
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• pp.116-125
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• 2006

MEMS and LIGA technologies have been used for fabricating microstructures, but their shape is not 3D because of difficulty for preparation of many masks. To fabricate 3D microstructures, microstereolithography technology based on Digital Micromirror Device($DMD^{TM}$) was introduced. It has no need of masks and is capable of fabricating high aspect ratio microstructures. In this technology, STL file is the standard format as the same of conventional rapid prototyping system, and 3D parts are fabricated by layer-by-layer according to 2D section sliced from STL file. The UV light source is illuminated to DMD which makes bitmap images of 2D section, and they are transferred and focused on resin surface. In this paper, we addressed optical design of microstereolithography system in consideration of light path according to DMD operation and image-forming on the resin surface using optical design program. To verify the performance of implemented microstereolithography system, 3D microstructures with complexity and high aspect ratio were fabricated.

• Journal of the Optical Society of Korea
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• v.16 no.1
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• pp.42-46
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• 2012

We have developed a fluorescence optical detection system using a digital micromirror device (DMD) for monitoring 3D cell culture matrices in situ. Full 3D imaging with fast scanning speed was implemented by the combined action of a DMD and a motorized stage. Imaging results with fluorescent microbeads measure the minimum axial resolution of the system as $6.3{\mu}m$, while full 1-mm scanning through 3D alginate-based matrix was demonstrated. For cell imaging, improved images were obtained by removing background fluorescence although the scanning distance was reduced because of low intracellular fluorescence efficiency. The system is expected to be useful to study various dynamics and behaviors of 3-dimensionally cultured cells in microfluidic systems.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.7 s.184
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• pp.146-151
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• 2006

In order to increase the productivity of conventional microstereolithography, a new method using a digital micromirror device ($DMD^{TM}$) as the dynamic patter generator is proposed. The deviation from the level of clear optical images to the level of photopolymer surface is a key for the fabrication of an accurate 3D structure, so this deviation is minimized by controlling the viscosity of FA 1260T with organic solvents. After finding the appropriate process variables, the feasibility of microstructure fabrication such as a microgear and a microsphere is demonstrated. Microstereolithography with $DMD^{TM}$ showed the potential to replace the existing focused beam microstereolithography.

• Laser Solutions
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• v.9 no.1
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• pp.1-7
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• 2006

In order to increase the productivity of conventional microstereolithography (MSL), digital micromirror device($DMD^{TM}$) based MSL is proposed and the feasibility of 3D rnicrocomponents fabrication is demonstrated in two ways; free surface and constrained surface techniques. The clearness of optical images at the exposure plane was confirmed for the fabrication of an accurate 3D structure by controlling the dynamic viscosity of FA1260T and the shape accuracy of a structure fabricated with epoxy-based resin ($Somos^{\circledR}$ 10120) was analyzed to determine the optimum curing conditions. After finding the appropriate process variables, the feasibility of multiple microstructures is then demonstrated. Due to the high productivity, MSL using $DMD^{TM}$ showed the potential to replace the existing focused laser beam MSL.

• Journal of the Optical Society of Korea
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• v.16 no.2
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• pp.127-132
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• 2012

This study discusses photoresist forming using a composite grayscale to fabricate a Fresnel lens. Grayscale lithography is a common production method used to facilitate the forming of lenses with different curvatures and depths. However, this approach is time consuming and expensive. This study proposes a method for overcoming these obstacles by integrating a digital micromirror device and microscope to supplant the traditional physical grayscale mask. This approach provides a simple and practical maskless optical lithography system. According to the results, the two adjacent grayscales displayed substantial differences between the high grayscale and influence the low grayscale that ultimately affected photoresist formation. Furthermore, we show that change of up to 150% in the slope can be achieved by changing the grayscale gradient in the central zone and the ring profile. The results of the optical experiment show a focus change with different gray gradients.

• Journal of the Optical Society of Korea
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• v.16 no.3
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• pp.221-227
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• 2012

We propose optical proximity corrections (OPCs) for digital micromirror device (DMD)-based maskless lithography. A pattern writing scheme is analyzed and a theoretical model for obtaining the dose distribution profile and resulting structure is derived. By using simulation based on this model we were able to reduce the edge placement error (EPE) between the design width and the critical dimension (CD) of a fabricated photoresist, which enables improvement of the CD. Moreover, by experiments carried out with the parameter derived from the writing scheme, we minimized the corner-rounding effect by controlling light transmission to the corners of a feature by modulating a DMD.

• 제어로봇시스템학회:학술대회논문집
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• 2005.06a
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• pp.389-392
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• 2005

In the maskless photolithography based on the Digital Micromirror Device (DMD) by Texas Instruments Inc. (TI), the micromirror array works as a virtual photomask to write patterns directly onto Flat Panel Display (FPD) at high speed with low cost. However, it is neither simple to generate region-based patterns for the micromirror array nor easy to deliver sequences of patterns for the micromirror controller. Moreover, the quality of lithography yields the precise synchronization between generating sequence of patterns and irradiation rate off micromirrors. In this study, the region-based pattern generating system for maskless photolithography is devised. To verify salient features of devised functionalities, the prototype system is implemented and the system is evaluated with actual DMD based photolithography. The results show that proposed pattern generating method is proper and reliable. Moreover, the devised region-based pattern generating system is robust and precise enough to handle any possible user specified mandate and to achieve the quality of photolithography required by FPD manufacturer.

• Journal of the Optical Society of Korea
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• v.17 no.6
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• pp.513-517
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• 2013

Recently, maskless lithography (ML) systems have become popular in digital manufacturing technologies. To achieve high-throughput manufacturing processes, digital micromirror devices (DMD) in ML systems must be driven to their operational limits, often in harsh conditions. We propose an instrument and algorithm to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. DMD malfunctions are caused by either bad DMD pixels or data transfer errors. We detect bad DMD pixels with $20{\times}20$ pixel by white and black image tests. To analyze data transfer errors at high frame rates, we monitor changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28000 frames per second (fps). For our data transfer error detection method, we verified that there are no data transfer errors in the test by confirming the agreement between the input frame rate and the output frame rate within the measurement accuracy of 1 fps.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.509-513
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• 2005

In order to increase productivity in conventional stereolithography. Microstereolithography using a digital micramirror device $(DMD^{TM})$ as a dynamic patter generator is proposed The deviation from a level of clear optical images to a level of a photopolymer surface is a key for the fabrication of an accurate 3D structure. so this deviation is minimized by controlling the viscosity of FA1260T with organic solvents. After finding the appropriate process valuables (exposure time of optical images. layer thickness of each layer). the feasibility of microstructures such as a microgear and a microsphere is then demonstrated. Microstereolithography wi th $DMD^{TM}$ might eventually replace conventional laser induced microstereolithography market such as in the manufacturing of jewels and medical parts.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.525-526
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• 2012