Reactive ion Etching Characterization of SiC Film Deposited by Thermal CVD Method for MEMS Application (MEMS 적용을 위한 Thermal CVD 방법에 의해 증착한 SiC막의 반응성 이온 Etching 특성 평가)
-
- Journal of the Korean Institute of Electrical and Electronic Material Engineers
- /
- v.17 no.3
- /
- pp.299-304
- /
- 2004