• Title/Summary/Keyword: Field-induced tunneling

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Resonance tunneling phenomena by periodic potential in type-II superconductor

  • Lee, Yeong Seon;Kang, Byeongwon
    • Progress in Superconductivity and Cryogenics
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    • v.16 no.1
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    • pp.1-5
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    • 2014
  • We calculated the resonance tunneling energy band in the BCS gap for Type-II superconductor in which periodic potential is generated by external magnetic flux. In this model, penetrating magnetic flux was assumed to be in a fixed lattice state which is not moving by an external force. We observed the existence of two subbands when we used the same parameters as for the $Nd_{1.85}Ce_{0.15}CuO_X$ thin film experiment. The voltages at which the regions of negative differential resistivity (NDR) started after the resonant tunneling ended were in a good agreement with the experimental data in the field region of 1 T - 2.2 T, but not in the high field regions. Discrepancy occurred in the high field region is considered to be caused by that the potential barrier could not be maintained because the current induced by resonant tunneling exceeds the superconducting critical current. In order to have better agreement in the low field region, more concrete designing of the potential rather than a simple square well used in the calculation might be needed. Based on this result, we can predict an occurrence of the electromagnetic radiation of as much difference of energy caused by the 2nd order resonant tunneling in which electrons transit from the 2nd band to the 1st band in the potential wells.

Thermally Assisted Carrier Transfer and Field-induced Tunneling in a Mg-doped GaN Thin Film (Mg가 첨가된 GaN 박막에서 캐리어 전이의 열적도움과 전계유도된 터러링 현상)

  • Chung, Sang-Geun;Kim, Yoon-Kyeom;Shin, Hyun-Gil
    • Korean Journal of Materials Research
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    • v.12 no.6
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    • pp.431-435
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    • 2002
  • The dark current and photocurrent(PC) spectrum of Mg-doped GaN thin film were investigated with various bias voltages and temperatures. At high temperature and small bias, the dark current is dominated by holes thermally activated from an acceptor level Al located at about 0.16 eV above the valence band maximum $(E_v)$, The PC peak originates from the electron transition from deep level A2 located at about 0.34 eV above the $E_v$ to the conduction band minimum $(E_ C)$. However, at a large bias voltage, holes thermally activated from A2 to Al experience the field-in-duces tunneling to form one-dimensional defect band at Al, which determines the dark current. The PC peak associated with the transition from Al to $E_ C$ is also observed at large bias voltages owing to the extended recombination lifetime of holes by the tunneling. In the near infrared region, a strong PC peak at 1.20 eV appears due to the hole transition from deep donor/acceptor level to the valence band.

Gate-Induced-Drain-Leakage (GIDL) Current of MOSFETs with Channel Doping and Width Dependence

  • Choi, Byoung-Seon;Choi, Pyung-Ho;Choi, Byoung-Deog
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.344-345
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    • 2012
  • The Gate-Induced-Drain-Leakage (GIDL) current with channel doping and width dependence are characterized. The GIDL currents are found to increase in MOSFETs with higher channel doping levels and the observed GIDL current is generated by the band-to-band-tunneling (BTBT) of electron through the reverse-biased channel-to-drain p-n junction. A BTBT model is used to fit the measured GIDL currents under different channel-doping levels. Good agreement is obtained between the modeled results and experimental data. The increase of the GIDL current at narrower widths in mainly caused by the stronger gate field at the edge of the shallow trench isolation (STI). As channel width decreases, a larger portion of the GIDL current is generated at the channel-isolation edge. Therefore, the stronger gate field at the channel-isolation edge causes the total unit-width GIDL current to increases for narrow-width devices.

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Random Dopant Fluctuation Effects of Tunneling Field-Effect Transistors (TFETs) (터널링 전계효과 트랜지스터의 불순물 분포 변동 효과)

  • Jang, Jung-Shik;Lee, Hyun Kook;Choi, Woo Young
    • Journal of the Institute of Electronics and Information Engineers
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    • v.49 no.12
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    • pp.179-183
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    • 2012
  • The random dopant fluctuation (RDF) effects of tunneling field-effect transistors (TFETs) have been observed by using atomistic 3-D device simulation. Due to extremely low body doping concentration, the RDF effects of TFETs have not been seriously investigated. However, in this paper, it has been found that the randomly generated and distributed source dopants increase the variation of threshold voltage ($V_{th}$), drain induced current enhancement (DICE) and subthreshold slope (SS) of TFETs. Also, some ways of relieving the RDF effects of TFETs have been presented.

Electrical Characteristics of Tunneling Field-effect Transistors using Vertical Tunneling Operation Based on AlGaSb/InGaAs

  • Kim, Bo Gyeong;Kwon, Ra Hee;Seo, Jae Hwa;Yoon, Young Jun;Jang, Young In;Cho, Min Su;Lee, Jung-Hee;Cho, Seongjae;Kang, In Man
    • Journal of Electrical Engineering and Technology
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    • v.12 no.6
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    • pp.2324-2332
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    • 2017
  • This paper presents the electrical performances of novel AlGaSb/InGaAs heterojunction-based vertical-tunneling field-effect transistor (VTFET). The device performance was investigated in views of the on-state current ($I_{on}$), drain-induced barrier thinning (DIBT), and subthreshold swing (SS) as the gate length ($L_G$) was scaled down. The proposed TFET with a $L_G$ of 5 nm operated with an $I_{on}$ of $1.3mA/{\mu}m$, a DIBT of 40 mV/V, and an SS of 23 mV/dec at a drain voltage ($V_{DS}$) of 0.23 V. The proposed TFET provided approximately 25 times lower DIBT and 12 times smaller SS compared with the conventional $L_G$ of 5 nm TFET. The AlGaSb/InGaAs VTFET showed extremely high scalability and strong immunity against short-channel effects.

Sub-10 nm Ge/GaAs Heterojunction-Based Tunneling Field-Effect Transistor with Vertical Tunneling Operation for Ultra-Low-Power Applications

  • Yoon, Young Jun;Seo, Jae Hwa;Cho, Seongjae;Kwon, Hyuck-In;Lee, Jung-Hee;Kang, In Man
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.2
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    • pp.172-178
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    • 2016
  • In this paper, we propose a sub-10 nm Ge/GaAs heterojunction-based tunneling field-effect transistor (TFET) with vertical band-to-band tunneling (BBT) operation for ultra-low-power (LP) applications. We design a stack structure that is based on the Ge/GaAs heterojunction to realize the vertical BBT operation. The use of vertical BBT operations in devices results in excellent subthreshold characteristics with a reduction in the drain-induced barrier thinning (DIBT) phenomenon. The proposed device with a channel length ($L_{ch}$) of 5 nm exhibits outstanding LP performance with a subthreshold swing (S) of 29.1 mV/dec and an off-state current ($I_{off}$) of $1.12{\times}10^{-11}A/{\mu}m$. In addition, the use of the highk spacer dielectric $HfO_2$ improves the on-state current ($I_{on}$) with an intrinsic delay time (${\tau}$) because of a higher fringing field. We demonstrate a sub-10 nm LP switching device that realizes a good S and lower $I_{off}$ at a lower supply voltage ($V_{DD}$) of 0.2 V.

Critical face pressure and backfill pressure in shield TBM tunneling on soft ground

  • Kim, Kiseok;Oh, Juyoung;Lee, Hyobum;Kim, Dongku;Choi, Hangseok
    • Geomechanics and Engineering
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    • v.15 no.3
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    • pp.823-831
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    • 2018
  • The most important issue during shield TBM tunneling in soft ground formations is to appropriately control ground surface settlement. Among various operational conditions in shield TBM tunneling, the face pressure and backfill pressure should be the most important and immediate measure to restrain surface settlement during excavation. In this paper, a 3-D hydro-mechanical coupled FE model is developed to numerically simulate the entire process of shield TBM tunneling, which is verified by comparing with real field measurements of ground surface settlement. The effect of permeability and stiffness of ground formations on tunneling-induced surface settlement was discussed in the parametric study. An increase in the face pressure and backfill pressure does not always lead to a decrease in surface settlement, but there are the critical face pressure and backfill pressure. In addition, considering the relatively low permeability of ground formations, the surface settlement consists of two parts, i.e., immediate settlement and consolidation settlement, which shows a distinct settlement behavior to each other.

Single Carrier Spectroscopy of Bisolitons on Si(001) Surfaces

  • Lyo, In-Whan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.13-13
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    • 2010
  • Switching an elementary excitation by injecting a single carrier would offer the exciting opportunity for the ultra-high data storage technologies. However, there has been no methodology available to investigate the interaction of low energy discrete carriers with nano-structures. In order to map out the spatial dependency of such single carrier level interactions, we developed a pulse-and-probe algorithm, combining with low temperature scanning tunneling microscopy. The new tool, which we call single carrier spectroscopy, allows us to track the interaction with the target macrostructure with tunneling carriers on a single carrier basis. Using this tool, we demonstrate that it is possible not only to locally write and erase individual bi-solitons, reliably and reversibly, but also to track of creation yields of single and multiple bi-solitons. Bi-solitons are pairs of solitons that are elementary out-of-phase excitations on anti-ferromagnetically ordered pseudo-spin system of Si dimers on Si(001)-c(42) surfaces. We found that at low energy tunneling the single bisoliton creation mechanism is not correlated with the number of carriers tunneling, but with the production of a potential hole under the tip. An electric field at the surface determines the density of the local charge density under the tip, and band-bending. However a rapid, dynamic change of a field produces a potential hole that can be filled by energetic carriers, and the amount of energy released during filling process is responsible for the creation of bi-solitons. Our model based on the field-induced local hole gives excellent explanation for bi-soliton yield behaviors. Scanning tunneling spectroscopy data supports the existence of such a potential hole. The mechanism also explains the site-dependency of bi-soliton yields, which is highest at the trough, not on the dimer rows. Our study demonstrates that we can manipulate not just single atoms and molecules, but also single pseudo-spin excitations as well.

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A Study on the Leakage Current Voltage of Hybrid Type Thin Films Using a Dilute OTS Solution

  • Kim Hong-Bae;Oh Teresa
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.1 s.14
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    • pp.21-25
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    • 2006
  • To improve the performance of organic thin film transistor, we investigated the properties of gate insulator's surface according to the leakage current by I-V measurement. The surface was treated by the dilute n-octadecyltrichlorosilane solution. The alkyl group of n-octadecyltrichlorosilane induced the electron tunneling and the electron tunneling current caused the breakdown at high electric field, consequently shifting the breakdown voltage. The 0.5% sample with an electron-rich group was found to have a large leakage current and a low barrier height because of the effect of an energy barrier lowered by, thermionic current, which is called the Schottky contact. The surface properties of the insulator were analyzed by I-V measurement using the effect of Poole-Frankel emission.

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EPB tunneling in cohesionless soils: A study on Tabriz Metro settlements

  • Rezaei, Amir H.;Shirzehhagh, Mojtaba;Golpasand, Mohammad R. Baghban
    • Geomechanics and Engineering
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    • v.19 no.2
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    • pp.153-165
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    • 2019
  • A case study of monitoring and analysis of surface settlement induced by tunneling of Tabriz metro line 2 (TML2) is presented in this paper. The TML2 single tunnel has been excavated using earth pressure balanced TBM with a cutting-wheel diameter of 9.49 m since 2015. Presented measurements of surface settlements, were collected during the construction of western part of the project (between west depot and S02 station) where the tunnel was being excavated in sand and silt, below the water table and at an average axis depth of about 16 m. Settlement readings were back-analyzed using Gaussian formula, both in longitudinal and transversal directions, in order to estimate volume loss and settlement trough width factor. In addition to settlements, face support and tail grouting pressures were monitored, providing a comprehensive description of the EPB performance. Using the gap model, volume loss prediction was carried out. Also, COB empirical method for determination of the face pressure was employed in order to compare with field monitored data. Likewise, FE simulation was used in various sections employing the code Simulia ABAQUS, to investigate the efficiency of numerical modelling for the estimating of the tunneling induced-surface settlements under such a geotechnical condition. In this regard, the main aspects of a mechanized excavation were simulated. For the studied sections, numerical simulation is not capable of reproducing the high values of in-situ-measured surface settlements, applying Mohr-Coulomb constitutive law for soil. Based on results, for the mentioned case study, the range of estimated volume loss mostly varies from 0.2% to 0.7%, having an average value of 0.45%.