• 연구논문집
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• s.30
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• pp.147-157
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• 2000

The filtered vacuum arc source (FVAS), which is adopted by magnetic filtering methode to remove the macro-particle in vacuum arc plasma, was composed of a torus structure with bending angle of 60 degree. The radius of torus was 266 mm, the radius of plasma duct was 80 mm and the total length was 600 mm. The magnet parts were consisted of one permanent magnet, one magnetic yoke and five solenoid magnets. The plasma duct was electrically isolated from the ground so that a bias voltage could be applied. The baffles inside plasma duct were installed in order to prevent the recoil effect of macro-particles. Graphite was used as the cathode material to coat the amorphic diamond film and its diameter was 80 mm. The amorphic diamond film attracts much attention due to its excellent mechanical, optical and tribological properties suitable for wide range of applications. The effects of solenoid magnet in plasma extraction were studied by computer simulation and experiment using Taguchi's method. The source and extraction magnet affected the arc stabilization. The extraction beam current was maximized with low value of the source magnet current and high value of the filtering magnet current. Optimum deposition condition was obtained when the currents of arc discharge, source, extraction, bending, deflection and outlet magnet were 30 A, 1 A, 3 A, 5 A, and 5 A, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.157-157
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• 2011

Graphene has generated significant interest in the recent years as a functional material for electronics, sensing, and energy applications due to its unique electrical, optical, and mechanical properties. Much of the considerable interest in graphene stems from results obtained for samples mechanically exfoliated from graphite. Practical applications, however, require reliable and well-controlled methods for fabrication of large area graphene films. Recently high quality graphene layers were fabricated using chemical vapor deposition (CVD) on nickel and copper with methane as the source of the carbon atoms. Here, we report a simple and efficient method to synthesize graphene layers using solid carbon source. Few-layer graphene films are grown using filtered vacuum arc source (FVAS) technique by evaporation of carbon atom on Ni catalytic metal and subsequent annealing of the samples at 800$^{\circ}$C. In our system, carbon atoms diffuse into the Ni metal layer at elevated temperatures followed by their segregation as graphene on the free surface during the cooling down step as the solubility of carbon in the metal decrease. For a given annealing condition and cooling rate, the number of graphene layers is easily controlled by changing the thickness of the initially evaporated amorphous carbon film. Based on the Raman analysis, the quality of graphene is comparable to other synthesis methods found in the literature, such as CVD and chemical methods.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.170.2-170.2
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• 2016

DLC(Diamond like Carbon)는 Diamond와 유사한 물리화학적 특성을 보유한 막으로 고경도 및 우수한 내마모성, 화학적 안정성의 특성을 가지고 있다. DLC는 크게 카본의 막 형성 공정에서 카본 소스에 따라 수소가 포함된 DLC와 무수소DLC로 구분된다. Tetrahedral amorphous carbon (ta-C) 박막은 DLC 박막 중에서 가장 다이아몬드와 유사한 특성을 가지는 박막으로, a:C-H에 비해 높은 열적안정성, 경도(50~60 GPa) 및 내마모 특성이 우수하여, 현재 다양한 응용분야에 적용하고 있다. 본 연구에서는 무수소 DLC 형성을 위해 자장필터가 장착된 Filtered Vacuum Arc Source(FVAS)를 자체적으로 개발하여 연구를 진행하였다. FVAS 장비는 카본 이온 발생부와 Plasma Duct 부위, 전자석부위 구성되어 있으며, 본 연구에서는 Plasma Duct 부위의 Bias 제어를 통해 음극에서 기판으로 이동하는 카본이온의 에너지와 flux 변화를 통한 박막 증착 거동 및 물성 연구를 진행하였다. Plasma Duct Bias 변화는 각 0, 5, 10, 15, 20 V 조건으로 진행하였으며, 물성 평가는 경도(Hardness), 마찰계수, 응력(Stress), 전기전도 특성에 대한 분석을 진행하였다. 박막의 증착 거동에서는 Plasma Duct bias 변화에 따라10 V에서 가장 높은 증착 거동을 가지다 감소하는 경향을 확인 하였으며, 박막의 물성 특성 평가 시에도 이와 유사하게 특성의 차이를 관찰하였다. 이는 음극부위에서 형성된 카본이온이 기판에 도달 시에 Plasma Duct Bias 변화에 따라 이온의 Flux 및 에너지 변화로 인해 박막의 밀도 및 ta-C 막의 물성 변화로 예상되며, 이를 분석하기 위해 라만분석 및 기판 도달 에너지 분석을 진행하였다

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.138-138
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• 1999

자장 여과 진공 아크법(Filtered Vacuum Arc :FVA)에 의해 증착된 비정질 다이아몬드 박막은 기계적, 광학적 특성이 매우 우수하여 많은 연구자들의 관심의 대상이 되어 왔다. 그러나 아크의 불안정성은 자장 여과 아크 소스의 연속적인 운전을 제한하고, 결과적으로 낮은 생산성을 가져왔다. 본 연구에서는 음극의 형태 및 음극 부근에서의 자기장의 구조를 음극 부식 거동의 관점에서 수치모사 및 실험을 통해서 조사하였다. 소스 전자석과 인출 전자석의 자극 방향이 평행하게 된 구조에서 (magnetic mirror configuration), 음극 후면에 반대 방향의 자극을 가지는 영구자석을 돔으로서 아크 불안정성을 억제할 수 있었다. 또한 소스 전자석에 진동하는 전류를 인가함으로써 아크 스팟의 운동 면적을 효과적으로 확장할 수 있었다. 시간 변화에 따른 빔 전류의 변화로부터 테이프형 음극이 우물형 음극에 비하여 더 안정하다는 것을 확인하였다. 진동하는 소스 전자석의 전류와 직경 80mm의 테이퍼형 음극을 사용하여, 아크 전류 60A에서 약 2000분 동안 사용하였으며, 이때 부식된 부피는 사용 가능한 음극 부피의 약 90%였다. 그리고 약 350mA의 안정한 빔 전류를 현재의 조건에서 얻었다.

• Journal of Korean Vacuum Science & Technology
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• v.6 no.2
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• pp.55-57
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• 2002

Metal-vapor-vacuum-arc ion source is an ideal source for both high current metal ion implanter and high current plasma thin-film deposition systems. It uses the direct evaporation of metal from surface of cathode by vacuum arc to produce a very high flux of ion plasmas. The MEVVA ion source, the high-current metal-ion implanter and high-current magnetic-field-filtered plasma thin-film deposition systems developed in Beijing Normal University are introduced in this paper.

• Proceedings of the Korean Vacuum Society Conference
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• 2008.08a
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• pp.194-194
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• 2008

• Journal of the Korean Vacuum Society
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• v.10 no.4
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• pp.431-439
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• 2001

In this paper, the a-Diamond films were synthesized using filtered vacuum arc source (FVAS), FVAS was composed of a torus structure with bending angle of 60 degree. The radius of torus was 266 mm, the radius of plasma duct was 80 mm and the total length was 600 mm. The magnet parts were composed of one permanent magnet and five solenoid magnets. The plasma duct was electrically isolated from the ground so that a bias voltage could be applied. The baffles inside plasma duct were installed in order to prevent the recoil effect of macro-particles. Cathode was made of graphite with 80 mm in diameter. The effects of solenoid magnet on plasma extraction were investigated by computer simulation and experiment using Taguchi's methode. The source and extraction magnet affected the arc stabilization. The extraction beam current was maximized with low value of the source magnet current and high value of the filtering magnet current. The beam current density was 3.2 mA/$\textrm{cm}^2$ and average deposition rate was 5 $\AA$/sec when the currents of arc discharge, source, extraction, bending, deflection and outlet magnet were 30 A, 1 A, 3 A, 5 A, 5 A, and 5 A, respectively. The beam current density and the efficiency of beam transportation were increased with the positive bias voltage of the plasma duct.

• Journal of the Korean Vacuum Society
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• v.11 no.1
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• pp.8-15
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• 2002

Tetrahedral amorphous carbon(ta-C) films were deposited by the filtered vacuum arc(FVA) process. The FVA process has many advantages such as high ionization ratio and the ion energy, which is suitable for dense amorphous carbon film deposition. However, the energy of the carbon ion cannot be readily controlled by manipulating the arc source parameters. In order to control the film properties in wide range, we investigated the dependence of the film properties on the substrate bias voltage. The mechanical properties and the density of the film exhibit the maximum values at about -100 V of the bias voltage. The maximum values of hardness and density were respectively 54$\pm$3 GPa and 3.6$\pm$0.4 g/㎤, which are 3 to 5 times higher than those of the films deposited by RF PACVD or ion beam process. The details of the atomic bond structure were analysed by Raman and NEXAFS spectroscopy. The change in the film properties for various bias voltages could be understood in the view of the $sp^2$ and $sp^3$ bond fraction in the deposited films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.34 no.1
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• pp.16-20
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• 2021

In this study, we tried finding new materials to improve the stain resistance properties of polymer insulating materials. Using the filtered vacuum arc source (FVAS) with a graphite target source, DLC thin films were deposited on silicon and polymer insulator substrates depending on their thickness to confirm the surface properties, physical properties, and structural properties of the thin films. Subsequently, the possibility of using a DLC thin film as a protective coating material for polymer insulators was confirmed. DLC thin films manufactured in accordance with the thickness of various thin films exhibited a very smooth and uniform surface. As the thin film thickness increased, the surface roughness value decreased and the contact angle value increased. In addition, the elastic modulus and hardness of the DLC thin film slightly increased, and the maximum values of elastic modulus and hardness were 214.5 GPa and 19.8 GPa, respectively. In addition, the DLC thin film showed a very low leakage current value, thereby exhibiting electrical insulation properties.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.10
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• pp.812-816
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• 2011

An optical lens is usually produced in the manner of high temperature compression molding with tungsten carbide alloy molding cores, it is necessary to develop and study technology for super-precision processing of molding cores and coating the core surface. As main methods used in surface improvement technologies using thin film, DLC present high hardness, chemical stability, and outstanding durability of abrasion to be extensively applied in various industrial fields. In this study, the effect of DLC coating of a thin film by means of the FVAS (filtered vacuum arc source) analyzed the characteristics of thin film. Surface roughness before and after DLC coating was measured and the result showed that the surface roughness was improved after coating as compared to before coating. In conclusion, it was observed that DLC coating of the ultra hard alloy core surface for molding had an effect on improving the surface roughness and shape of the core surface. It is considered that this will have an effect on improving abrasion resistance and the service life of the core surface.