• Title/Summary/Keyword: GaSb crystal

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Study on the Intrinsic Defects in Undoped GaSb Bulk and MBE-grown GaSb/SI-GaAs Epitaxial Layers for Infrared Photodetectors (적외선검출소자를 위한 GaSb 결정 및 MBE로 성장한 Gasb/SI-GaAs 박막의 진성결함에 관한 연구)

  • Kim, J.O.;Shin, H.W.;Choe, J.W.;Lee, S.J.;Noh, S.K.
    • Journal of the Korean Vacuum Society
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    • v.18 no.2
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    • pp.127-132
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    • 2009
  • We have investigated the intrinsic defects remaining in epitaxial GaSb layers grown on SI-GaAs substrates compared to those in bulk GaSb crystal substrate, which is a basic material of Sb-based strained-layer superlattice infrared photodetectors. From the functional dependence of the band-to-band transition energy of the photomuminescence (PL) spectra observing up to near room-temperature (250 K), the temperature parameters of [$E_o$, $\alpha$, $\beta$] of undoped GaSb crystal are determined by using the Varshni empirical equation describing the temperature variation of the bandgap energy. Additionally to the antisite-Ga ([$Ga_{Sb}$]) with an ionization energy of 29 meV that is well known to a major intrinsic defect in GaSb, epitaxial GaSb layers show a pair of deep states at the emission energy of 732/711 meV that may be related with a complex of two antisite-Ga and antisite-Sb ([$Ga_{Sb}-Sb_{Ga}$]). Based on the analysis of the temperature and the excitation-power dependences of PL, it suggests that excess-Sb substitutes Ga-site by self-diffusion and two anti sites of [$Ga_{Sb}$] and [$Sb_{Ga}$] could form as a complex of [$Ga_{Sb}-Sb_{Ga}$] in GaSb epilayers grown under Sb-rich condition.

Band alignments in Al-doped GaInAsSb/GaSb heterojunctions (Al이 도핑된 GaInAsSb/GaSb의 경계면에서의 밴드정렬)

  • Shim, Kyurhee
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.26 no.6
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    • pp.225-231
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    • 2016
  • The valence band maximum (VBM) and conduction band minimum (CBM) of Al-doped GaInAsSb alloys substrated on GaSb are calculated by using an analytic approximation based on the tight binding method. The relative positions of the VBM and CBM between Al-GaInASSb and GaSb determine band alignement type, valence band offset (VBO) and conductin band offset (CBO) for the heterojunctions. In this study, aluminium doping is assumed to be substituted in the cation site and limited up to 20 % because it can easily oxidize and degrade materials. It is found that the Al-doped alloys exhibit type-II band alignments over the entire composition range and make the band gaps increase, whereas the VBO and CBO decrease. The decreasing rate of VBO is higher than that of CBO, which implies the Al components play a decisive role in controlling electrons at the interface. The Al-dopled GaInAsSb alloy has a direct band gap induced by $E({\Gamma})$ with a considerable distance from the E(L) and E(X), however, $E({\Gamma})$ approaches to E(L) and E(X) in the high Sb concentration (Sb > 0.7-0.8) which might affect the electron mobility and degrade the optical quality.

Effects of antimony addition on growth of InGaN nano-structures by mixed-source HVPE (혼합소스 HVPE 방법에 의한 InGaN 나노구조의 성장에 있어서 Sb 첨가의 영향)

  • Ok, Jin-Eun;Jo, Dong-Wan;Jeon, Hun-Soo;Lee, Ah-Reum;Lee, Gang-Suok;Cho, Young-Ji;Kim, Kyung-Hwa;Chang, Ji-Ho;Ahn, Hyung-Soo;Yang, Min
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.20 no.3
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    • pp.113-116
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    • 2010
  • We report on the growth and characteristics of the structural and optical properties of InGaN nano-structures doped with antimony (Sb) as a catalyst. The use of catalyst has been explored to modify the growth and defect generation during strained layer heteroepitaxial growth. We performed the growth of the InGaN nano-structures on c-sapphire substrates using mixed-source hydride vapor phase epitaxy (HVPE). The characteristic of samples was measured by scanning electron microscope (SEM) and photoluminescence (PL). The aligning direction of c-axis of the InGaN nano-structures was changed from vertical to parallel or inclined to the surface of substrates when the Sb was added as a catalyst. The indium composition was estimated about 3.2% in both cases of with or without the addition of Sb in the InxGal-xN structures. From the results of InGaN nano-structures formed with the addition of Sb, we can expect the performance of optical devices would be more improved by reduced piezo-electric field if we use the InGaN nano-structures of which c-axes are aligned parallel to the substrates as an active layer.

A study on the characteristics and crystal growth of GaSb (GaSb결정 성장과 특성에 관한 연구)

  • 이재구;오장섭;정성훈;송복식;문동찬;김선태
    • Electrical & Electronic Materials
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    • v.9 no.9
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    • pp.885-890
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    • 1996
  • Undoped p-type and Te doped n-type GaSb crystals were grown by the vertical Bridgman method. The lattice constant of the GaSb crystals was 6.096.+-.000373.angs.. The carrier concentration, the resistivity, and the carrier mobility measured by the van der Pauw method were p.iden.8*10$^{16}$ c $m^{-3}$ , .rho..iden.0.20 .ohm.-cm, .mu.$_{p}$ .iden.400c $m^{2}$ $V^{-1}$ se $c^{-1}$ for p-type, n.iden.1*10$^{17}$ c $m^{-3}$ , .rho..iden.0.15 .ohm.-cm, .mu.$_{n}$ .iden.500c $m^{2}$ $V^{-1}$ se $c^{-1}$ for n-type at 300K. In case of treatment with metal ion of R $u^{+3}$, P $t^{+4}$, the carrier concentration, resistivity and carrier mobility of the GaSb crystals were p.iden.2*10$^{17}$ c $m^{-3}$ , .rho..iden.0.08.ohm.-cm, .mu.$_{p}$ .iden.420c $m^{2}$ $V^{-1}$ se $c^{-1}$ for p-type, n.iden.2.5*10$^{17}$ c $m^{-3}$ , .rho..iden.0.07.ohm.-cm, .mu.$_{n}$ .iden.520c $m^{2}$ $V^{-1}$ se $c^{-1}$ for n-type respectively. GaSb crystals had a tendency to lower resistivity and higher mobility, for surface treatment with metal ion effectively diminished surface recombination centers.s.

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Formation of Al0.3Ga0.7As/GaAs Multiple Quantum Wells on Silicon Substrate with AlAsxSb1-x Step-graded Buffer (AlAsxSb1-x 단계 성분 변화 완충층을 이용한 Si (100) 기판 상 Al0.3Ga0.7As/GaAs 다중 양자 우물 형성)

  • Lee, Eun Hye;Song, Jin Dong;Yoen, Kyu Hyoek;Bae, Min Hwan;Oh, Hyun Ji;Han, Il Ki;Choi, Won Jun;Chang, Soo Kyung
    • Journal of the Korean Vacuum Society
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    • v.22 no.6
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    • pp.313-320
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    • 2013
  • The $AlAs_xSb_{1-x}$ step-graded buffer (SGB) layer was grown on the Silicon (Si) substrate to overcome lattice mismatch between Si substrate and $Al_{0.3}Ga_{0.7}As$/GaAs multiple quantum wells (MQWs). The value of root-mean-square (RMS) surface roughness for 5 nm-thick GaAs grown on $AlAs_xSb_{1-x}$ step-graded buffer layer was ~1.7 nm. $Al_{0.3}Ga_{0.7}As$/GaAs MQWs with AlAs/GaAs short period superlattice (SPS) were formed on the $AlAs_xSb_{1-x}$/Si substrate. Photoluminescence (PL) peak at 10 K for the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure showed relatively low intensity at ~813 nm. The RMS surface roughness of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure was ~42.9 nm. The crystal defects were observed on the cross-sectional transmission electron microscope (TEM) images of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure. The decrease of PL intensity and increase of RMS surface roughness would be due to the formation of the crystal defects.

Study on the Crystal Growth and Characterization of GaSb treated with $Ru^{+3}$, $Pt^{+4}$ ($Ru^{+3}$, $Pt^{+4}$로 표면 처리한 GaSb의 결정 성장과 특성)

  • 이재구;오장섭;송복식;정성훈;문동찬;김선태
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.77-80
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    • 1995
  • GaSb crystals were grown by the vertical Bridgman method. P-type GaSb crystals were grown with Ga:Sb=1:1 at % ratio without dopants and with Te, respectively. Also, GaSb:Te crystals were investigated. Lattice constants were 6.117${\AA}$ for p-type. The carrier concentration, the resistivity, and the carrier mobility measured by the van der Pauw method were p≡8 x $10^{16}$$cm^{-3}$, p≡0.20$\Omega$-cm, ${\mu}$$_{n}$$400\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for p-type, n≡1 x $10^{17}$$cm^{-3}$, p≡0.15 $\Omega$-cm, ${\mu}$$_{n}$$500\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for n-type at 300K. In case of treating with metal ion of $Ru^{+3}$, $Pt^{+1}$, p≡2 x $10^{17}$$cm^{-3}$, p≡0.08$\Omega$-cm, ${\mu}$$_{n}$≡420$\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for p-type, n≡2.5 x $10^{17}$$cm^{-13}$, p≡0.07 $\Omega$-cm, ${\mu}$$_{n}$≡520$\textrm{cm}^2$$V^{-1}$$sec^{-1}$ for n-type were obtained.

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The Crystal Growth and Electrical Characteristics of $Al_{x}Ga_{1-x}Sb$ ($Al_{x}Ga_{1-x}Sb$ 결정 성장과 전기적 특성)

  • 이재구;정성훈;송복식;문동찬;김선태
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1996.05a
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    • pp.185-188
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    • 1996
  • The doped n-type $Al_{x}Ga_{1-x}Sb$ crystals were grown by the vertical Bridgman method at composition ratio x=0, x=0.1, x=02 respectively. The lattice constants of the $Al_{x}Ga_{1-x}Sb$ crystals were 6.096${\AA}$, 6.097${\AA}$, 6.106${\AA}$ at composition ratio respectively. The carrier concentration, the resistivity, and the carrier mobility measured by the Van der Pauw method at x-0 were n≡1 x $10^{17}$$cm^{-3}$, $\rho$≡0.15 ${\Omega}$-cm, ${\mu}$$_{n}$≡500 $\textrm{cm}^2$$V^{-1}$$sec^{-1}$ at 300K. The carrier concentration, the resistivity, and the carrier mobility measured by the Van der Pauw method at x=0.1 were n≡2.96 x $10^{15}$$cm^{-3}$, $\rho$≡103 $\textrm{cm}^2$$V^{-1}$$sec^{-1}$ at 300K.

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Performance Analysis of Photonic Crystal Enhanced Micro-Combustor Thermophotovoltaic System for Drone Application (광결정 표면을 이용한 드론용 마이크로 연소기 열광전 에너지변환시스템의 성능해석)

  • Lee, Junghun
    • Journal of the Korea Institute of Military Science and Technology
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    • v.24 no.3
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    • pp.309-316
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    • 2021
  • In this paper, the electrical power output of the micro-combustor thermophotovoltiac(TPV) system was analyzed. The system consists of a micro-combustor, photonic crystals(PhCs), and photovoltaic cells(PV cells). The system has a micro-combustor that can achieve over 1,000 K surface temperature by consuming 2.5 g/h hydrogen fuel. Also, this system incorporates current state-of-the-art PhCs surfaces(2D Ta PhCs and Tandem Filter) to increase electrical power output. In addition, InGaAsSb PV cell, which bandgap is 0.55 eV, was applied to convert a wide range of radiative energy. The performance analysis shows that a single micro-combustor TPV system can produce 0.4 W ~ 27.7 W electrical power with the temperature change of emitter(900 K ~ 1,500 K) and PV cell(250 K ~ 400 K).