• Title/Summary/Keyword: HTL

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형광 Green OLED Device의 Hole Transport layer와 Electron Transport Layer에 따른 특성 변화 분석

  • Kim, Hyeon-Gi;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.229.1-229.1
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    • 2016
  • 본 연구에서는 Hole Transporting Layer(HTL)와 Electron Transporting Layer(ETL)의 두께에 의한 특성을 비교해보기 위해서 각각 0, 10, 20 nm로 HTL, ETL 두께를 달리한 형광 OLED소자를 제작하였다. ETL의 두께가 얇아질수록 $V_{TH}$ 값은 2.5V에서 0.9 V로 낮게 나타났고 소자의 전체 두께와 on voltage는 비례한다는 특성을 발견할 수 있었다. HTL과 ETL이 두꺼울수록 각 layer에서 carrier들의 이동에 delay가 생기고 emission layer에서 표면까지 거리가 생기기 때문이다. ETL의 두께가 두꺼울수록 높은 luminance 값을 나타내는 차이를 보여주고 있다. Hole에 비해 이동도가 작은 electron은 emission layer까지 늦게 전달되어, EML내에서 비교적 cathode쪽에 가까운 곳에서 exciton이 형성되기 때문이다. CE에도 더 두꺼운 ETL을 가진 소자가 더 높은 CE값 가짐을 확인할 수 있다. 모든 소자가 $200mA/cm^2$에서 가장 높은 CE값을 나타낸 이유는 $200mA/cm^2$에서 electron-hole 결합이 만들어내는 exciton형성이 가장 많기 때문이다. PE, QE도 ETL 두께가 두꺼울수록 특성을 향상이다. 결론적으로 ETL의 두꺼울수록 current density값이 감소함을 보이고 있는 반면 turn on voltage, luminance, efficiency 증가함을 볼 수 있다.

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Light-emitting property of the EL device with the thickness ratio of the HTL.ETL (HTL/ETL 두께 비율에 따른 EL 소자의 발광 특성)

  • 손철호;여철호;박정일;장선주;박종화;이영종;정홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.11a
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    • pp.170-173
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    • 2000
  • In this study, we have investigated the light-emitting property of the EL device with the thickness ratio of the HTL/ETL, which was 500$\AA$:500$\AA$, 400$\AA$:600$\AA$, 600$\AA$:400$\AA$. The ALq$_3$ was used for the ETL. We have studied the relation of voltage, contrase, efficiency for current density. Emission was observed above 10mA/$\textrm{cm}^2$ and luminance was measured to be 1030cd/$m^2$ at a current density of 100mA/$\textrm{cm}^2$ in 500$\AA$/500$\AA$ sample. A luminance of over 2500cd/$m^2$ was also observed after the final fabrication process in 500$\AA$/500$\AA$ sample

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Quantum Dot Light-Emitting Diodes with Poly-TPD/PVK Bilayer Hole Transport Layer (Poly-TPD/PVK 이중 박막 정공수송층 구조의 양자점발광다이오드)

  • Kim, Hyun Soo;Lee, Do Hyung;Kim, Bada;Hwang, Bo Ram;Kim, Chang Kyo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.393-398
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    • 2019
  • A poly[bis(4-butypheny)-bis(phenyl)benzidine] (poly-TPD) and poly(9-vinylcarbazole) (PVK) bilayer was employed as a hole transport layer (HTL) in solution-processed CdSe/ZnS quantum dot light-emitting diodes (QLEDs). The thickness of the PVK layer spin-coated onto the poly-TPD layer, whose thickness was fixed to 40 nm, was varied, with PVK layer thicknesses of 0 nm, 35 nm, 45 nm, and 55 nm. Because the thickness of the PVK can determine the hole transport properties of the HTL, a PVK thickness that maximizes the performance of the HTL for the QLEDs was investigated. By employing the optimized PVK thickness of 45 nm, the current efficiency of the QLED exhibited a 1.74 times improvement when compared with that of the QLED with poly-TPD based HTL without PVK. This was mainly attributed to the decrease in the energy barrier between the HTL and the quantum dot (QD) emitting layer (EML).

Synthesis and Characterization of Crosslinkable Hole-Injection Transport Material for Polymer Light Emitting Diodes

  • Thi, Mai Nguyen;Kim, Jin-Woo;Vu, Quang Hung;Park, Lee-Soon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.810-813
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    • 2009
  • Fluorene derivatives are well-known in the polymer OLEDs due to their good charge carrying property. In this work, we synthesized a series of conjugated copolymers based fluorene derivative and phenylamine units by using Buchwald-Hartwig reaction in order to investigate their photoreactivities and use as the HIL/HTL layers of OLEDs using solution processes.

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Degradation of PLEDs and a Way to Improve Device Performances

  • Kim, Sung-Han;Hsu, Che;Zhang, Chi;Skulason, Hjalti;Uckert, Frank;Lecloux, Dan;Cao, Yong;Parker, Ian
    • Journal of Information Display
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    • v.5 no.2
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    • pp.14-18
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    • 2004
  • The most significant degradation problem of PLED has been described and new buffer layer material aimed for use as HTL in PLED to solve this issue has been studied. This approach has enabled the increase of the green device efficiency (${\sim}$2x) and lifetime (${\sim}$5-6x).

Investigation of the Green Emission Profile in PHOLED by Gasket Doping

  • Park, Won-Hyeok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.226-226
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    • 2016
  • PHOLED devices which have the structure of ITO/HAT-CN(5nm)/NPB(50nm)/EML(30nm)/TPBi(10nm)/Alq3(20nm)/LiF(0.8nm)/Al(100nm) are fabricated to investigate the green emission profile in EML by using a gasket doping method. CBP and Ir(ppy)3 (2% wt) are co-deposited homogeneously as a background material of EML for green PHOLED, then a 5nm thickness of additionally doped layer by Ir(btp)2 (8% wt) is formed as a profiler of the green emission. The total thickness of the EML is maintained at 30nm while the distance of the profiler from the HTL/EML interface side (x) is changed in 5nm steps from 0nm to 25nm. As shown in Fig. 1, the green (513nm) peak from Ir(ppy)3 is not observed when Ir(btp)2 is also doped homogeneously because Ir(ppy)3 works as an gasket dopant of the Ir(btp)2 :CBP system. Therefore, in this experment, Ir(btp)2 can be used as a profiler of the green emission in CBP:Ir(ppy)3 system. The emission spectra from the PHOLED devices with different x are shown in Fig. 2. In this gasket doping system, stronger red peak means more energy transfer from green to red dopant or higher exciton density by green dopant. To find the green emission profile, the external quantum efficiency (EQE) at 3mA/cm2 for red peaks are calculated. More green light emission at near EML/HBL interface than that of HTL/EML is observed (insert of Fig. 2). This means that the higher exciton density at near EML/HBL interface in homogeneously doped CBP with Ir(ppy)3. As shown in Fig. 3, excitons can be quenched easily to HTL(NPB) because the T1 level of HTL(2.5eV) is relatively lower than that of EML(2.6eV). On the other hand, the T1 level of HBL(2.7eV) is higher than that of EML.

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Speedy Two-Step Thermal Evaporation Process for Gold Electrode in a Perovskite Solar Cell

  • Kim, Kwangbae;Park, Taeyeul;Song, Ohsung
    • Korean Journal of Materials Research
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    • v.28 no.4
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    • pp.235-240
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    • 2018
  • We propose a speedy two-step deposit process to form an Au electrode on hole transport layer(HTL) without any damage using a general thermal evaporator in a perovskite solar cell(PSC). An Au electrode with a thickness of 70 nm was prepared with one-step and two-step processes using a general thermal evaporator with a 30 cm source-substrate distance and $6.0{\times}10^{-6}$ torr vacuum. The one-step process deposits the Au film with the desirable thickness through a source power of 60 and 100 W at a time. The two-step process deposits a 7 nm-thick buffer layer with source power of 60, 70, and 80 W, and then deposits the remaining film thickness at higher source power of 80, 90, and 100 W. The photovoltaic properties and microstructure of these PSC devices with a glass/FTO/$TiO_2$/perovskite/HTL/Au electrode were measured by a solar simulator and field emission scanning electron microscope. The one-step process showed a low depo-temperature of $88.5^{\circ}C$ with a long deposition time of 90 minutes at 60 W. It showed a high depo-temperature of $135.4^{\circ}C$ with a short deposition time of 8 minutes at 100 W. All the samples showed an ECE lower than 2.8 % due to damage on the HTL. The two-step process offered an ECE higher than 6.25 % without HTL damage through a deposition temperature lower than $88^{\circ}C$ and a short deposition time within 20 minutes in general. Therefore, the proposed two-step process is favorable to produce an Au electrode layer for the PSC device with a general thermal evaporator.

Thermally Adjusted Graphene Oxide as the Hole Transport Layer for Organic Light-Emitting Diodes (열처리된 그래핀 산화물을 정공주입층으로 이용한 유기발광 다이오드)

  • Shin, Seongbeom
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.4
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    • pp.363-367
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    • 2015
  • This paper reports on thermally adjusted graphene oxide (GO) as the hole transport layer (HTL) for organic light-emitting diodes (OLEDs). GO is generally not suitable for HTL of OLEDs because of intrinsic specific resistance. In this paper, the specific resistance of GO is adjusted by the thermal annealing process. The optimum specific resistance of HTL is found to be $10^2{\Omega}{\cdot}m$, and is defined by the maximum current efficiency of OLEDs, 2 cd/A. In addition, the reasons for specific resistance change are identified by x-ray photoelectron spectroscopy (XPS). First, the XPS results show that several functional groups of GO were detached by thermal energy, and the amount of epoxide changed substantially following the temperature. Second, the full width at half maximum (FWHM) of the C-C bond decreased during the process. That means the crystallinity of the graphene improved, which is the scientific basis for the change in specific resistance.

OLED 소자의 효율 개선을 위한 소재 및 구조의 변화에 따른 특성 평가

  • Bae, Il-Ji;Hong, Yeong-Gyu;Yun, Dang-Mo;Sin, Jin-Guk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.227-227
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    • 2014
  • OLED 소자에 사용되는 유기물들은 대부분 전자에 비해 정공의 이동속도가 매우 빨라 소자 효율의 손실이 일어난다. 본 연구에서는 이러한 전하 이동도의 불균형에 의한 OLED 소자 성능의 감소를 개선하기 위해 HBL (hole blocking layer) 물질로 BCP (HOMO : 6.5 eV, LUMO : 2.83 eV)를 도입하였다. 그러나 BCP의 LUMO 값이 약 3 eV를 가지기 때문에 전자의 이동에 영향을 미치는 것으로 예상되어 더 높은 효율을 가지는 소자를 제작하기 위해 host 물질을 상용물질(PGH02)로 교체하였다. PGH02의 HOMO 값은 약 5.86 eV로 소자에 사용된 HTL (hole transport layer)의 HOMO 값(5.54 eV)에 비해 높은 값을 가지기 때문에 HBL의 역할 역시 가능하여 소자의 성능이 상당히 개선되는 것을 확인할 수 있었다. 또한 전하 이동도의 균형을 맞추기 위해 ETL 물질로는 기존에 많이 사용되고 있는 Alq3 (${\mu}{\sim}10-5cm2/Vs$)에 비해 이동도가 10배 이상 빠른 Bebq2 (${\mu}{\sim}10-4cm2/Vs$)를 사용하였다. HTL (hole transport layer) 물질로는 상용물질(LHT 259)를 사용하였고, LHT 259의 전하 이동도는 FET (field effect transistor)를 제작하여 측정하였다. 이를 기반으로 하여 ETL과 HTL의 두께를 조절하여 전하 이동도가 균형을 이루는 OLED 소자를 제작하기 위해 실험을 진행하였다.

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Development of Inorganic Metal Oxide based Hole-Transporting Layer for High Efficiency Perovskite Solar Cell (고효율 페로브스카이트 태양전지용 무기 금속 산화물 기반 정공수송층의 개발)

  • Lee, Haram;Mai, Cuc Thi Kim;Jang, Yoon Hee;Lee, Doh-Kwon
    • Current Photovoltaic Research
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    • v.8 no.2
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    • pp.60-65
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    • 2020
  • In perovskite solar cells with planar heterojunction configuration, selection of proper charge-transporting layers is very important to achieve stable and efficient device. Here, we developed solution processible Cu doped NiOx (Cu:NiOx) thin film as a hole-transporting layer (HTL) in p-i-n structured methylammonium lead trihalide (MAPbI3) perovskite solar cell. The transmittance and thickness of NiOx HTL is optimized by control the spin-coating rate and Cu is additionally doped to improve the surface morphology of undoped NiOx thin film and hole-extraction properties. Consequently, a perovskite solar cell containing Cu:NiOx HTL with optimal doping ratio of Cu exhibits a power conversion efficiency of 14.6%.