• Title/Summary/Keyword: Immersion Lithography

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Two-dimensional Nano-patterning with Immersion Holographic Lithography (액침 홀로그래픽 리소그래피 기술을 이용한 2 차원 나노패터닝)

  • Kim, Sang-Won;Park, Sin-Jeung;Kang, Shin-Il;Hahn, Jae-Won
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.12 s.189
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    • pp.128-134
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    • 2006
  • Two-dimensional nano-patterns are fabricated using immersion holographic lithography. The photoresist layer is exposed to an interference pattern generated by two incident laser beams($\lambda$=441.6 nm, He-Cd laser) of which the pitch size is less than 200 nm. Good surface profiles of the 2 dimensional patterns are achieved by trimming the lithography process parameters, such as, exposure time, developing time and refractive index of medium liquid.

Improving nano gap control using frequency adaptive peak filter in Solid Immersion Lens-based plasmonic lithography (SIL 기반 플라즈모닉 리소그래피에서 주파수 적응형 필터를 이용한 나노간극 제어의 성능향상)

  • Choi, Guk-Jong;Lim, Geon;Park, No-Cheol
    • Transactions of the Society of Information Storage Systems
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    • v.10 no.1
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    • pp.1-6
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    • 2014
  • Plasmonic lithography is the latest technique to overcome diffraction limit of previous optical lithography. In the plasmonic lithography, the nano gap between nano metal wave guide and photoresist should be in sub-wavelength region. SIL-based plasmonic lithography is the one of the solutions to maintain small air gap. However, the nano gap control is so sensitive that a little disturbance is able to have a large effect on the nano gap control. So, we analyzed the characteristics of disturbance, and then modified the previous controller to suppress the disturbance. We applied two peak filters which were fixed one and adaptively changeable one. We experimentally confirmed the improvement of the nano gap control, which reduced nano gap error by 30 %. The proposed control will improve the quality of lithography pattern.

Sub 150nm Soft-Lithography using the monomer based thermally curable resin (Monomer based thermally curable resin을 이용한 150nm 급 Soft-Lithography)

  • Yang K.Y.;Hong S.H.;Lee H.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.06a
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    • pp.676-679
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    • 2005
  • Nano imprint Lithography (NIL) is regarded as one of the next-generation lithography technologies with EUV lithography, immersion lithography, Laser interference lithography. Because a Si wafer stamp and a quartz stamp, used to imprinting usually are very expensive and easily broken, it is suggested that master stamp is duplicated by PDMS and the PDMS stamp uses to imprint .For using the PDMS stamp, a thermally curable monomer resin was used for the imprinting process to lower pressure and temperature. As a result, NIL patterns were successfully fabricated.

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An Ellipsometry Study of Water Absorption in the 193 nm photoresist (Ellipsometry를 이용한 193 nm photoresist에서의 물의 흡수 연구)

  • Lee, Hyoung-Joo;Lee, Jung-Hwan;Seo, Ju-Bin;Kyoung, Jai-Sun;An, Il-Sin
    • Journal of the Semiconductor & Display Technology
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    • v.5 no.2 s.15
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    • pp.37-39
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    • 2006
  • We employed in-situ spectroscopic ellipsometry(SE) and imaging ellipsometry(IE) to study the interaction of water and photoresist(PR) in 193 immersion lithography. Real time measurement of SE showed thickness increase when PR was immerged in water indicating swelling effect. From the temporal evolution we could observe its reaction-limited behavior. Meanwhile, IE could identify the modification of PR surface by contact of water even for a short period of a second.

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Possibility of Benzene Exposure in Workers of a Semiconductor Industry Based on the Patent Resources, 1990-2010

  • Choi, Sangjun;Park, Donguk;Park, Yunkyung
    • Safety and Health at Work
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    • v.12 no.3
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    • pp.403-415
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    • 2021
  • Background: This study aimed to assess the possibility of benzene exposure in workers of a Korean semiconductor manufacturing company by reviewing the issued patents. Methods: A systematic patent search was conducted with the Google "Advanced Patent Search" engine using the keywords "semiconductor" and "benzene" combined with all of the words accessed on January 24, 2016. Results: As a result of the search, we reviewed 75 patent documents filed by a Korean semiconductor manufacturing company from 1994 to 2010. From 22 patents, we found that benzene could have been used as one of the carbon sources in chemical vapor deposition for capacitor; as diamond-like carbon for solar cell, graphene formation, or etching for transition metal thin film; and as a solvent for dielectric film, silicon oxide layer, nanomaterials, photoresist, rise for immersion lithography, electrophotography, and quantum dot ink. Conclusion: Considering the date of patent filing, it is possible that workers in the chemical vapor deposition, immersion lithography, and graphene formation processes could be exposed to benzene from 1996 to 2010.

Immersion grating mount design of IGRINS

  • Moon, Bong-Kon;Wang, Weisong;Park, Chan;Lee, Sung-Ho;Yuk, In-Soo;Chun, Moo-Young;Lee, Han-Shin;Jaffe, Daniel T.
    • The Bulletin of The Korean Astronomical Society
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    • v.36 no.2
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    • pp.153.2-153.2
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    • 2011
  • The IGRINS (Immersion GRating INfrared Spectrometer) is a high resolution wide-band infrared spectrograph developed by Korea Astronomy and Space Science Institute (KASI) and the University of Texas at Austin (UT). Immersion grating is a key component of IGRINS, which disperses the input ray by using a Silicon material with a lithography technology. Opto-mechanical mount for the immersion grating is important to keep the high spectral resolution and the optical alignment in a cold temperature of $130{\pm}0.06K$. The optical performance of immersion grating can maintain within the de-center tolerance of ${\pm}0.05mm$ and the tip-tilt tolerance of ${\pm}1.5arcmin$. The mount mechanism utilizes the flexure and the kinematic support design to satisfy the requirement and the operation condition. When the IGRINS system is cooled down to a cold temperature, three flexures compensate the thermal contraction stress due to the different material between the immersion grating and the mounting part(Aluminum 6061). They also support the immersion grating by an appropriate preload. Thermal stability is controlled by a copper strap with proper dimensions and a heater. Generally structural and thermal analysis was performed to confirm the mount mechanism. This talk presents the opto-mechanical mount design of the immersion grating of IGRINS.

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Fabrication of Mo Nano Patterns Using Nano Transfer Printing with Poly Vinyl Alcohol Mold (Poly Vinyl Alcohol 몰드를 이용한 Nano Transfer Printing 기술 및 이를 이용한 Mo 나노 패턴 제작 기술)

  • Yang, Ki-Yeon;Yoon, Kyung-Min;Han, Kang-Soo;Byun, Kyung-Jae;Lee, Heon
    • Korean Journal of Materials Research
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    • v.19 no.4
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    • pp.224-227
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    • 2009
  • Nanofabrication is an essential process throughout industry. Technologies that produce general nanofabrication, such as e-beam lithography, dip-pen lithography, DUV lithography, immersion lithography, and laser interference lithography, have drawbacks including complicated processes, low throughput, and high costs, whereas nano-transfer printing (nTP) is inexpensive, simple, and can produce patterns on non-plane substrates and multilayer structures. In general nTP, the coherency of gold-deposited stamps is strengthened by using SAM treatment on substrates, so the gold patterns are transferred from stamps to substrates. However, it is hard to apply to transfer other metallic materials, and the existing nTP process requires a complicated surface treatment. Therefore, it is necessary to simplify the nTP technology to obtain an easy and simple method for fabricating metal patterns. In this paper, asnTP process with poly vinyl alcohol (PVA) mold was proposed without any chemical treatment. At first, a PVA mold was duplicated from the master mold. Then, a Mo layer, with a thickness of 20 nm, was deposited on the PVA mold. The Mo deposited PVA mold was put on the Si wafer substrate, and nTP process progressed. After the nTP process, the PVA mold was removed using DI water, and transferred Mo nano patterns were characterized by a Scanning electron micrograph (SEM) and Energy Dispersive spectroscopy (EDS).

Critical Review of Current Trends in ASIC Writing and Layout Analysis

  • Vikram, Abhishek;Agarwal, Vineeta
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.2
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    • pp.236-250
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    • 2016
  • Electrical Designs for Application Specific Integrated Circuits (ASIC) has undergone a change recently with the advent of the sub-wavelength lithography. The optical projection with 193 nm wavelength has been further extended with the use of immersion and other techniques. The competing trends for printing smaller design features have been discussed in this paper with the discussion of the electrical layout analysis to find unfriendly design features. The early knowledge of the unfriendly design features allows remedial actions in time for better yield on the wafer. There are existing standard design qualification criteria being used in the design and fabrication community, but they seem to be insufficient to guarantee defect free designs. This paper proposes an integrated approach for screening the layout with multiple aspects: layout geometry based, graphical analysis and process model based verification. The results have been discussed with few example design features from the 28nm design layout.

$\mu$CP Process Technology for Nanopattern Implementation (나노패턴 구현을 위한 $\mu$CP 공정기술)

  • 조정대;신영재;김광영
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.624-627
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    • 2003
  • Microcontact printing (uCP) of alkanethiols on gold was the first representative of soft-lithography processes. This is an attempt to enhance the accuracy of classical to a precision comparable with optical lithography, creating a low-cost, large-area, and high-resolution patterning process. Microcontact printing relies on replication of a pattered PDMS stamp from a master to form an elastic stamp that can be inked with a SAM solution(monolayer -forming ink) using either immersion inking or contact inking. The inked PDMS stamp is then used to print a pattern that selectively protects the gold substrate during the subsequent etch.

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