• Title, Summary, Keyword: LCD

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EO performance of photo-aligned TN-LCD with oblique non-polarized UV light irradiation on polymer surface (폴리이미드막에 편광되지 않은 UV광을 경사지게 조사한 광배향 TN-LCD의 전기광학특성에 관한 연구)

  • Seo, Dae-Shik;Park, Tae-Kyu;Han, Jeong-Min;Park, Doo-Seok;Hwang, Lyul-Yeon
    • Proceedings of the KIEE Conference
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    • pp.1385-1387
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    • 1998
  • In this paper, we studied the electro-optical(EO) performance of photo-aligned twisted nematic(TN)-liquid crystal display(LCD) with oblique non-polarized ultraviolet (UV) light irradiation on polyimide (PI) surface. The monodomain alignment of photo-aligned TN-LCD is obtained with an angle of incidence of $85^{\circ}$ on PI surface. Also, we observed that the voltage transmittance and response time characteristics of photo-aligned TN-LCD is almost same compared to rubbing treated TN-LCD. Finally, we measured that the voltage-holding-ratio(VHR) of photo-aligned TN-LCD is almost same compared to rubbing treated TN-LCD.

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Electron Emission Theory for LCD Backlight

  • Kim, Hee-Tae;Lee, Dong-Chin;Nam, Seok-Hyun;Jang, Tae-Seok
    • 한국정보디스플레이학회:학술대회논문집
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    • pp.1602-1605
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    • 2008
  • We considered most general electron emission caused by temperature as well as electric field with a free electron gas model. The total electron emission current density comes from field emission effect where electron energy is lower than vacuum and from thermionic emission effect where electron energy is higher than vacuum. The total electron emission current density is shown as a function of temperature for constant electric field, and as a function of electric field for constant temperature.

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Aberration Extraction Algorithm for LCD Defect Detection (대면적 LCD 결함검출을 위한 수차량 추출 알고리즘)

  • Ko, Jung-Hwan;Lee, Jung-Suk;Won, Young-Jin
    • 전자공학회논문지 IE
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    • v.48 no.4
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    • pp.1-6
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    • 2011
  • In this paper we show the LCD simulator for defect inspection using image processing algorithm and neural network. The defect inspection algorithm of the LCD consists of preprocessing, feature extraction and defect classification. Preprocess removes noise from LCD image, using morphology operator and neural network is used for the defect classification. Sample images with scratch, pinhole, and spot from real LCD color filter image are used. From some experiments results, the proposed algorithms show that defect detected and classified in the ratio of 92.3% and 94.5 respectively. Accordingly, in this paper, a possibility of practical implementation of the LCD defect inspection system is finally suggested.

LCD Defect Detection using Neural-network based on BEP (BEP기반의 신경회로망을 이용한 LCD 패널 결함 검출)

  • Ko, Jung-Hwan
    • 전자공학회논문지 IE
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    • v.48 no.2
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    • pp.26-31
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    • 2011
  • In this paper we show the LCD simulator for defect inspection using image processing algorithm and neural network. The defect inspection algorithm of the LCD consists of preprocessing, feature extraction and defect classification. Preprocess removes noise from LCD image, using morphology operator and neural network is used for the defect classification. Sample images with scratch, pinhole, and spot from real LCD color filter image are used. From some experiments results, the proposed algorithms show that defect detected and classified in the ratio of 92.3% and 94.5 respectively. Accordingly, in this paper, a possibility of practical implementation of the LCD defect inspection system is finally suggested.

Fabrication of an All-Layer-Printed TFT-LCD Device via Large-Area UV Imprinting Lithography

  • Lee, Seung-Jun;Park, Dae-Jin;Bae, Joo-Han;Lee, Sung-Hee;Kim, Jang-Kyum;Kim, Kyu-Young;Bae, Jung-Mok;Kim, Bo-Sung;Kim, Soon-Kwon;Lee, Su-Kwon;Kwon, Sin;Seo, Jung-Woo;Kim, Ki-Hyun;Cho, Jung-Wok;Chang, Jae-Hyuk
    • Journal of Information Display
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    • v.11 no.2
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    • pp.49-51
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    • 2010
  • Nanoimprint lithography (NIL) using ultraviolet (UV) rays is a technique in which unconventional lithographic patterns are formed on a substrate by curing a suitable liquid resist in contact with a transparent patterned mold, then releasing the freshly patterned material. Here, various solutions are introduced to achieve sufficient overlay accuracy and to overcome the technical challenges in resist patterning via UV imprinting. Moreover, resist patterning of all the layers in TFT and of the BM layer in CF was carried out using UV imprinting lithography to come up with a 12.1-inch TFT-LCD panel with a resolution of $1280{\times}800$ lines (125 ppi).

Biaxial Integrated Optical Film for VA Mode LCD's Made from In-situ Photopolymerised Reactive Mesogens

  • Kim, Kyeong-Hyeon;Lyu, Jae-Jin;Chung, Dong-Hoon;Verrall, M;Slaney, K;Perrett, T;Parri, O;Lee, Seung-Eun;Lee, Hee-Kyu
    • Journal of Information Display
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    • v.5 no.2
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    • pp.23-26
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    • 2004
  • For high end, large area displays, all current LC modes require some degree of optical compensation to improve the front of screen viewing experience. Currently most optical films are laminated to the outside of the LCD cell, between the glass and polariser. In this paper we wish to show how it is possible to integrate the compensating optical film within a VA mode LCD cell. The paper will describe the process of making the biaxial film through the process of in-situ photopolymerisation of an aligned film of reactive mesogens in the cholesteric phase using polarised UV light. The film can be made on the colour filter array side of the LCD panel. In addition the process of fabricating a VA mode LCD containing this film will be described and the performance of this module will be presented.

The Optimization of Indium Zinc Oxide Thin Film Process in Color Filter on Array structure

  • Lee, Je-Hun;Kim, Jin-Suek;Jeong, Chang-Oh;Kim, Shi-Yul;Lim, Soon-Kwon;Souk, Jun-Hyung
    • 한국정보디스플레이학회:학술대회논문집
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    • pp.1244-1247
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    • 2004
  • For obtaining the best panel quality of color filter on array(COA) architecture in TFF LCD, we investigated the influence of deposition temperature, $O_2$ flow, thickness on the optical transmittance, wet etching and adhesion properties of IZO deposited onto each color photo resist(red, green, blue). Average transmittance of the pixel single layer in the visible range(between 380 and 780nm) was mainly affected by thickness and showed maximum at 1250 ${\AA}$ while the thickness showing peak transparency in each R, G, B wavelength was different. The relation was calculated by using bi-layer transmission and reflectance model, which corresponded to experimental data very well. The adhesion of IZO deposited on each color PR was found to have enhanced value except red PR case, compared to that of IZO which was deposited on $SiN_x$. Wet etching pattern linearity was decreased as the thickness increased. The thickness of IZO was one of vital factors in order to optimize overall pixel process for fabricating COA structure.

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