• 제목/요약/키워드: Low-k

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Characteristics of the Low Pressure Plasma

  • 배인식;나병근;설유빈;송호현;유신재;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.235.2-235.2
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    • 2014
  • Plasma hardly grows in low pressure because of lack of collision. Especially, in extremely low pressure like 1 mTorr, the experiment scale is far larger than mean free path therefore plasma is hardly generated in such low pressure. But low pressure plasma has useful properties like low damage or fine sputtering process because it has typically low electron density. In here, thermal electron is used to make breakdown in low pressure easily and cylindrical geometry is used to help discharge easily. And we changed magnetic field strength to control electron density or temperature. In low pressure, density and temperature behavior is very interesting so its characteristics are examined here.

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0.13μm Cu/Low-k 공정 Setup과 수율 향상에 관한 연구 (A Study on 0.13μm Cu/Low-k Process Setup and Yield Improvement)

  • 이현기;장의구
    • 한국전기전자재료학회논문지
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    • 제20권4호
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    • pp.325-331
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    • 2007
  • In this study, the inter-metal dielectric material of FSG was changed by low-k material in $0.13{\mu}m$ foundry-compatible technology (FCT) device process based on fluorinated silicate glass (FSG). Black diamond (BD) was used as a low-k material with a dielectric constant of 2.95 for optimization and yield-improvement of the low-k based device process. For yield-improvement in low-k based device process, some problems such as photoresist (PR) poisoning, damage of low-k in etch/ash/cleaning process, and chemical mechanical planarization (CMP) delamination must be solved. The PR poisoning was not observed in BD based device. The pressure in CMP process decreased to 2.8 psi to remove the CMP delamination for Cu-CMP and USG-CMP. $H_2O$ ashing process was selected instead of $O_2$ ashing process due to the lowest condition of low-k damage. NE14 cleaning after ashing process lot the removal of organic residues in vias and trenches was employed for wet process instead of dilute HF (DHF) process. The similar-state of SRAM yield was obtained in Cu/low-k process compared with the conventional $0.13{\mu}m$ FCT device by the optimization of these process conditions.

한국과 중국 논문에서 사용된 요통 변증에 관한 고찰 (The Analysis of Pattern Identification of Low Back Pain, Which is Used in Thesis both in Korea and China)

  • 김민우;고연석;이정한;정원석;신병철;차윤엽;고호연;선승호;전찬용;장보형;송윤경;고성규
    • 한방재활의학과학회지
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    • 제23권2호
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    • pp.85-94
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    • 2013
  • Objectives : This study aims to contribute to developing new pattern identification based on searches regarding pattern identification of low back pain, which is used in thesis both in Korea and China. Methods : First of all, we searched thesis concerning pattern identification of low back pain from RISS, OASIS, Korean traditional knowledge portal, CNKI. Results : 1. There were overall 34 thesis, consist of 18 Korean thesis(13 clinical papers and 5 analytical papers) and 9 Chinese thesis(7 clinical papers and 9 analytical papers). 2. 10 of 11 Korean thesis used more than 9 patterns for pattern identification, 9 of 14 Chinese thesis used less than 4 patterns for pattern identification of low back pain. 3. Patterns, which were repeatedly used in Korea, were 腎虛腰痛(Kidney deficiency low back pain), 濕熱腰痛(Dampness-heat low back pain), 寒濕腰痛(Cold-dampness low back pain), 痰飮腰痛(Phlegm-fluid retention low back pain), 風腰痛(Wind low back pain), 食積腰痛(Food accumulation low back pain), 濕腰痛(Dampness low back pain), 挫閃腰痛(Sprain low back pain), 瘀血腰痛(Static blood low back pain), 氣腰痛(Qi low back pain). 4. Patterns, which were repeatedly used in China, were 腎虛腰痛(Kidney deficiency low back pain), 濕熱腰痛(Dampness-heat low back pain), 寒濕腰痛(Cold-dampness low back pain), 氣滯血瘀腰痛(Blood stasis due to qi stagnation low back pain). Conclusions : Based on these results, it is considered that an advanced type of pattern identification of low back pain should be made or existing type needs to be practically and objectively improved.

광대역 고조파 제거를 위한 고온초전도 저역통과필터의 제작 (Fabrication of high-temperature superconducting low-pass filter for broad-band harmonic rejection)

  • 한석길;강광용;안달;서준석;최춘근;김상현;곽민환
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 2000년도 High Temperature Superconductivity Vol.X
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    • pp.193-196
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    • 2000
  • A new type low-pass filter design method based on a coupled line and transmission line theory is proposed to suppress harmonics by attenuation poles in the stop band. The design formula are derived using the equivalent circuit of a coupled transmission line. The new low-pass filter structure is shown to have attractive properties such as compact size, wide stop band range and low insertion loss. The seventh-order low-pass filter designed by present method has a cutoff frequency of 0.9 CHz with a 0.01 dB ripple level. The coupled line type low-pass filter with strip line configuration was fabricated by using a high-temperature superconducting (HTS : YBa$_2$Cu$_3$O$_{7-{\delta}}$ thin film on MgO(100) substrate. Since the HTS coupled tine type low-pass filter was proposed with five attenuation poles in stop band such as 1.8, 2.5, 4, 5.5, 6.2 GHz. The fabricated low-pass filter has improved the attenuation characteristics up to seven times of the cutoff frequency.

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Low flow-low power 유도결합 플라즈마 원자방출 분광법에서의 분석적 특성에 관한 연구 (A Study on the Analytical Characterizations of the Low Flow-Low Power ICP-AES)

  • 양혜순;김영만;김선태;최범석
    • 분석과학
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    • 제7권3호
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    • pp.253-260
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    • 1994
  • Low power-low flow 유도결합 플라즈마 원자방출 분광법(ICP-AES)에서 분석적 특성에 대해 연구하였다. Low power ICP에서는 moderate power ICP보다 알짜세기는 감소하지만 바탕세기도 감소하여 알짜세기에 대한 바탕세기의 비는 오히려 증가하였다. Low power ICP에서도 작동조건에 따라 moderate power와 비슷한 검출한계를 얻을 수 있으며, 검량곡선도 $10^4{\sim}10^5$ 정도의 직선성을 가질 수 있었다. 알칼리 금속에 의한 이온화 방해영향은 시료운반기체의 사용량을 증가시킬수록 증가하지만, RF power의 변화에 대해서는 큰 차이가 없었다.

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V-Based Self-Forming Layers as Cu Diffusion Barrier on Low-k Samples

  • 박재형;문대용;한동석;강유진;신소라;박종완
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.409-409
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    • 2013
  • 최근, 집적 소자의 미세화에 따라 늘어난 배선 신호 지연 및 상호 간섭, 그리고 소비 전력의 증가는 초고집적 소자 성능 개선에 한계를 가져온다. 이에 따라 기존의 알루미늄(Al)/실리콘 절연 산화막은 구리(Cu)/저유전율 박막(low-k)으로 대체되고 있고, 이는 소자 성능 개선에 큰 영향을 미친다. 그러나 Cu는 Si과 low-k 내부로 확산이 빠르게 일어나 소자의 비저항을 높이고, 누설 전류를 일으키는 등 소자의 성능을 저하시킬 수 있는 문제점을 가지고 있다. 이러한 Cu의 확산을 막기 위하여 Ta, TaN 등과 같은 확산방지막에 대한 연구가 활발히 진행되어 왔으나, 배선 공정의 집적화와 low-k 대체에 따른 공정 및 신뢰성 문제로 인해 새로운 확산방지막의 개발이 필요하게 되었다. 이를 위해, 본 연구에서는 Cu-V 합금을 사용하여 low-k 기판 위에 확산방지막을 자가 형성 시키는 공정에 대한 연구를 진행하였다. 다양한 low-k 기판에서 열처리조건에 따른 Cu-V 합금의 특성을 확인하기 위해 4-point probe를 통한 비저항 평가와 XRD (X-ray diffraction) 분석이 이뤄졌다. 또한, TEM (transmission electron microscope)을 이용하여 $300^{\circ}C$에서 1 시간 동안 열처리를 거쳐 자가형성된 V-based interlayer가 low-k와 Cu의 계면에서 균일하게 형성된 것을 확인하였다. 형성된 V-based interlayer의 barrier 특성을 평가하고자 Cu-V합금/low-k/Si 구조와 Cu/low-k/Si 구조의 leakage current를 비교 분석하였다. Cu/low-k/Si 구조는 비교적 낮은 온도에서 leakage current가 급격히 증가하는 양상을 보였으나, Cu-V 합금/low-k/Si 구조는 $550^{\circ}C$의 thermal stress 에서도 leakage current의 변화가 거의 없었다. 이러한 결과를 바탕으로 열처리를 통해 자가형성된 V-based interlayer의 Cu/low-k 간 확산방지막으로서 가능성을 검증하였다.

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더블로이유리 적용 창호의 구성요소에 따른 단열성능 비교 실험 (A Comparison of Thermal Performance of Double Low-E Glazing Window according to Various Material)

  • 장철용;안병립;김치훈;김준섭;이성재
    • 한국태양에너지학회:학술대회논문집
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    • 한국태양에너지학회 2011년도 춘계학술발표대회 논문집
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    • pp.133-137
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    • 2011
  • Low-e glazing is classified as soft low-e glazing and hard low-e glazing. Hard low-e glazing can be temperable and its handling is comfortable because its coating film is a oxide film generated at high temperatures. But there is a fatal weakness that its insulation performance and shielding performance are lower compared to soft low-e glazing by low electrical conductivity of coating film. Soft low-e glazing is excellent because its coating film consists of Ag that is excellent electrical conductivity and it has strength that can supply various product consumers want. But soft low-e glazing has weaknesses that temperable and handling are difficult because Ag is oxidized easily. Therefore this study analyzes thermal performance of glazing by changing filling gas according to applying low-e glazing through simulation to judge performance before making sample. After this process, a comparative experimental study was done through TVS by making temperable low-e glazing.

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언더필 재료를 사용하는 Cu/Low-K 플립 칩 패키지 공정에서 신뢰성 향상 연구 (Reliability Improvement of Cu/Low K Flip-chip Packaging Using Underfill Materials)

  • 홍석윤;진세민;이재원;조성환;도재천;이해영
    • 마이크로전자및패키징학회지
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    • 제18권4호
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    • pp.19-25
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    • 2011
  • 현대 전자 산업에서Cu/Low-K공정의 도입을 통해 반도체 칩의 소형화 및 전기적 성능 향상이 가능해졌으나, Cu/Low-K는 기존의 반도체 제조 공정에 사용된 물질에 비해 물리적으로 매우 취약해진 단점을 가지고 있어 칩 제조 공정 과 패키지 공정에서 많은 문제를 유발하고 있다. 특히, 온도 사이클 후, Cu 층과 Low-K 유전층 사이의 박리현상은 주요 불량 현상의 하나이다. Cu/Low-K층은 플립 칩 패드의 상부에 위치하기 때문에 플립 칩이 받는 스트레스가 직접적으로 Cu/Low-K층에 영향을 주고 있다. 이런 문제를 해결하기 위한 언더필 공정이나 언더필 물질의 개선이 필요하게 되었고 특히, 플립 칩에 대한 스트레스를 줄이고 솔더 범프를 보호하기 위한 언더필의 선택이 중요하게 되었다. 90 nm Cu/Low-K 플립 칩 패키지의 온도 사이클 후 발생한 박리 문제를 적합한 언더필 선택을 통해 해결하였다.

생육 초기의 저온·저일조가 고추의 수량과 품질에 미치는 영향 (Effects of Low Air Temperature and Low Radiation Conditions on Yield and Quality of Hot Pepper at the Early Growth Stage)

  • 위승환;이희주;유인호;장윤아;여경환;안세웅;이진형;김성겸
    • 한국환경과학회지
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    • 제29권10호
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    • pp.989-996
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    • 2020
  • This study was conducted to determine the effect of low temperature and low radiation conditions on the yield and quality of hot pepper at an early growth stage in Korea. In plastic greenhouses, low temperature, low temperature with covered shading treatments were set 17 to 42 days after transplanting. The pepper growing degree days decreased by 5.5% due to the low temperature during the treatment period. Radiation decreased by 74.7% due to the covered shading. After commencing treatments, pepper plant growth decreased with low temperature and low radiation. Analysis of the yield showed that the first harvest was delayed by low radiation. The cumulative yields of 119 days after transplanting were 1,956, 2,171, and 2,018 g/㎡ for control, low temperature, and low temperature with low radiation respectively. Capsaicin and dihydrocapsaicin concentrations in pepper fruit decreased with low temperature and low radiation. To investigate the photosynthetic characteristics according to the treatment, the carbon dioxide reaction curve was analyzed using the biochemical model of photosynthesis. Results showed that the maximum photosynthetic rate, Vcmax (maximum carboxylation rate), J (electric transportation rate), and TPU (triose phosphate utilization) decreased at low temperatures; the maximum photosynthetic rate, J, and gm (dark respiration rate) were reduced by shading. These results indicate that low temperature and low radiation can retard early growth, yield, and quality, but these can also be recovered 119 days after planting. Based on the results, the yield and quality of pepper can recover from abiotic stresses with proper cultivation.

Effect of Duck Feet Gelatin on Physicochemical, Textural, and Sensory Properties of Low-fat Frankfurters

  • Yeo, Eui-Joo;Kim, Hyun-Wook;Hwang, Ko-Eun;Song, Dong-Heon;Kim, Yong-Jae;Ham, Youn-Kyung;He, Fu-Yi;Park, Jae-Hyun;Kim, Cheon-Jei
    • 한국축산식품학회지
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    • 제34권4호
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    • pp.415-422
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    • 2014
  • Duck feet gelatin (DFG) gel was added as a fat replacer to low-fat frankfurters and the effect of DFG on physicochemical, textural, and sensory characteristics of low-fat frankfurters was evaluated. DFG gel was prepared with a 20% duck feet gelatin concentration (w/w). Adding DFG decreased lightness and increased yellowness of the low-fat frankfurters (p<0.05). However, DFG did not affect redness of low-fat frankfurters (p>0.05). The statistical results indicated that adding DFG improved cooking yield of low-fat frankfurters (p<0.05). In addition, replacing pork back fat with DFG resulted in increased moisture content, protein content, and ash content of low-fat frankfurters, and the low-fat frankfurter formulated with 5% pork back fat and 15% DFG gel had the highest moisture content and lowest fat content (p<0.05). Adding of DFG increased all textural parameters including hardness, springiness, cohesiveness, chewiness, and gumminess of low-fat frankfurters (p<0.05). In terms of sensory properties, the low-fat frankfurter formulated with 5% pork back fat and 15% DFG gel showed similar satisfaction scores for the flavor, tenderness, juiciness, and overall acceptance when compared to the regular frankfurters (20% back fat). Therefore, our results suggest that DFG could be an effective novel source, as a fat replacer, for manufacturing of low-fat frankfurters.