• 제목/요약/키워드: Metallic interlayer

검색결과 21건 처리시간 0.024초

XPS Study of MoO3 Interlayer Between Aluminum Electrode and Inkjet-Printed Zinc Tin Oxide for Thin-Film Transistor

  • Choi, Woon-Seop
    • Transactions on Electrical and Electronic Materials
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    • 제12권6호
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    • pp.267-270
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    • 2011
  • In the process of inkjet-printed zinc tin oxide thin-film transistor, the effect of metallic interlayer underneath of source and drain electrode was investigated. The reason for the improved electrical properties with thin molybdenum oxide ($MoO_3$) layer was due to the chemically intermixed state of metallic interlayer, aluminum source and drain, and oxide semiconductor together. The atomic configuration of three Mo $3d_3$ and $3d_5$ doublets, three different Al 2p core levels, two Sn $3d_5$, and four different types of oxygen O 1s in the interfaces among those layers was confirmed by X-ray photospectroscopy.

Pt Thickness Dependence of Oscillatory Interlayer Exchange Coupling in [CoFe/Pt/CoFe]/IrMn Multilayers with Perpendicular Anisotropy

  • Lee, Sang-Suk;Choi, Jong-Gu;Kim, Sun-Wook;Hwang, Do-Guwn;Rhee, Jang-Roh
    • Journal of Magnetics
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    • 제10권2호
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    • pp.44-47
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    • 2005
  • The oscillatory interlayer exchange coupling (IEC) has been shown in pinned $[CoFe/Pt(t_{pt})/CoFe]/IrMn$ multi-layers with perpendicular anisotropy. The period of oscillation corresponds to about 2 monolayers of Pt. The oscillatory behavior of IEC depending on the nonmagnetic metallic Pt thickness is thought to be related the antiferromagnetic ordering induced by IrMn layer. Oscillatory IEC as function of insulating NiO thickness has been observed in $[Pt/CoFe]_4/NiO(t_{NiO})/[CoFe/Pt]_4$ multilayers. The effect of N (number of bilayer repeats) upon the magnetic property of [Pt/CoFe]N/IrMn is also studied.

The In-situ Dressing of CMP Pad Conditioners with Novel Coating Protection

  • Sung, James-C.;Kan, Ming-Chi
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part2
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    • pp.1142-1143
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    • 2006
  • Kinik Company pioneered diamond pad conditioners protected by DLC barrier ($DiaShield^{(R)}$ Coating) back in 1999 (Sung & Lin, US Patent 6,368,198). Kink also evaluated Cermet Composite Coating (CCC or $C^3$, patent pending) with a composition that grades from a metallic (e.g. stainless steel) interlayer to a ceramic (e.g. $Al_2O_3$ or SiC) exterior. The metallic interlayer can form metallurgical bond with metallic matrix on the diamond pad conditioner. The ceramic exterior is both wear and corrosion resistant. The gradational design of $C^3$ coating will assure its strong adherence to the substrate because there is no weak boundary between coating and substrate.

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c-axis Tunneling in Intercalated Bi$_2Sr_2CaCu_2O_{8+x}$ Single Crystals

  • Lee, Min-Hyea;Chang, Hyun-Sik;Doh, Yong-Joo;Lee, Hu-Jong;Lee, Woo;Choy, Jin-Ho
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 1999년도 High Temperature Superconductivity Vol.IX
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    • pp.260-260
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    • 1999
  • We compared c-axis tunneling characteristics of small stacked intrinsic Josephson junctions prepared on the surface of pristine, I-, and HgI$_2$-intercalated Bi$_2Sr_2CaCu_2O_{8+x}$ (Bi2212) single crystals. The R(T) curves are almost metallic in I-Bi2212 specimens, but semiconducting in HgI$_2$-Bi2212 ones.· The transition temperatures were 82.0 K, 73.0 K, and 76.8 K for pristine Bi2212, I-Bi2212, and HgI2-Bi2212 specimens, respectively, consistent with p-T$_c$ phase diagram. Current-voltage (IV) characteristics of both kinds of specimens show multiple quasiparticle branches with well developed gap features, indicating Josephson coupling is established between neighboring CuO$_2$ planes. The critical current I$_c$ of I-Bi2212 is almost the same as of that of pristine crystals, but I$_c$ is much reduced in Hgl$_2$-Bi2212. In spite of expanded interlayer distances, the interlayer coupling is not significantly affected in I-Bi2212due to holes generated by iodine atoms. The coupling in HgI$_2$-Bi2212 is, however, weakened due to inertness of HgI$_2$ molecules and the expansion of interlayer distance. Relation between the superconducting transition temperature T$_c$ and the critical current I$_c$ seems to contradict Anderson's interlayer-pair-tunneling theory but agree with a modified version of it.

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계면층 형성 및 열처리가 탄소 나노튜브 미세팁의 전계방출 특성에 미치는 영향 (Effects of Interlayer Formation and Thermal Treatment on Field-emission Properties of Carbon Nanotube Micro-tips)

  • 김부종;박진석
    • 반도체디스플레이기술학회지
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    • 제12권2호
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    • pp.1-6
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    • 2013
  • The effects of interlayer formation and thermal treatment on the field-emission properties of carbon nanotubes (CNTs) were investigated. The CNTs were prepared on tungsten (W) micro-tip substrates using the electrophoretic deposition (EPD) method. The interlayers, such as aluminum (Al) and hafnium (Hf) were coated on the W-tips prior to CNT deposition and after the deposition of CNTs all the species were thermally treated at $700^{\circ}C$ for 30 min. The field-emission properties of CNTs were significantly improved by thermal treatment. The threshold electric field for igniting the electron emission was decreased and the emission current was increased. The Raman spectroscopy results indicated that this was attributed mainly to the enhancement of CNTs by thermal treatment. Also, the CNTs deposited on the interlayers showed the remarkably improved results in the long-term emission stability, especially when they were thermally treated. The X-ray photoelectron spectroscopy (XPS) measurement confirmed that this was resulted from the formation of the additional cohesive forces between the CNTs and the underlying interlayers.

조절 가능한 층간교환상호작용에 관한 연구 (Tunable Interlayer Exchange Coupling Energy)

  • 하승석;유천열
    • 한국자기학회지
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    • 제16권2호
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    • pp.130-135
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    • 2006
  • 강자성체/비자성 금속/강자성체/반도체 구조에서 층간교환강호작용(interlayer exchange coupling) 에너지가 외부 인가전압으로 제어 가능함을 이론적으로 보였다. 비자성 금속층으로 격리된 두 강자성층 사이의 층간교환상호작용 에너지는 강자성체/비자성 금속 계면에서 전자의 스핀에 의존하는 반사율의 차이에 의해 결정된다는 것은 잘 알려진 사실인데, 이를 각자성체/비자성 금속/강자성체/반도체 구조에 적용하여 층간교환상호작용 에너지가 강자성체/비자성 금속/강자성체 계면에서 전자의 반사율뿐 아니라 강자성체/반도체 계면에서의 반사율에도 의존한다는 것을 보였다 강자성체/반도체 계면에 생기는 Schottky 장벽의 높이와 두께는 인가전압으로 바꿀 수 있고, 그에 따른 전자의 반사율이 인가전압에 의해 바뀔 수 있음을 알 수 있었다. 결과적으로 일차원 자유전자 모델을 사용하여 외부 인가 전압으로써 두 강자성체 사이의 층간 교환 상호작용 에너지를 제어할 수 있다는 것을 확인하였다.

METALLIC INTERFACES IN HARSH CHEMO-MECHANICAL ENVIRONMENTS

  • Yildiz, Bilge;Nikiforova, Anna;Yip, Sidney
    • Nuclear Engineering and Technology
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    • 제41권1호
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    • pp.21-38
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    • 2009
  • The use of multi scale modeling concepts and simulation techniques to study the destabilization of an ultrathin layer of oxide interface between a metal substrate and the surrounding environment is considered. Of particular interest are chemo-mechanical behavior of this interface in the context of a molecular-level description of stress corrosion cracking. Motivated by our previous molecular dynamics simulations of unit processes in materials strength and toughness, we examine the challenges of dealing with chemical reactivity on an equal footing with mechanical deformation, (a) understanding electron transfer processes using first-principles methods, (b) modeling cation transport and associated charged defect migration kinetics, and (c) simulation of pit nucleation and intergranular deformation to initiate the breakdown of the oxide interlayer. These problems illustrate a level of multi-scale complexity that would be practically impossible to attack by other means; they also point to a perspective framework that could guide future research in the broad computational science community.

Silicon 기반 IC 디바이스에서의 층간 절연막 특성 분석 연구 (Raman Spectroscopy Analysis of Inter Metallic Dielectric Characteristics in IC Device)

  • 권순형;표성규
    • 마이크로전자및패키징학회지
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    • 제23권4호
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    • pp.19-24
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    • 2016
  • Along the few nano sizing dimensions of integrated circuit (IC) devices, acceptable interlayer material for design is inevitable. The interlayer which include dielectric, interconnect, barrier etc. needs to achieve not only electrical properties, but also mechanical properties for endure post manufacture process and prolonging life time. For developing intermetallic dielectric (IMD) the mechanical issues with post manufacturing processes were need to be solved. For analyzing specific structural problem and material properties Raman spectroscopy was performed for various researches in Si semiconductor based materials. As improve of the laser and charge-coupled device (CCD) technology the total effectiveness and reliability was enhanced. For thin film as IMD developed material could be analyzed by Raman spectroscopy, and diverse researches of developing method to analyze thin layer were comprehended. Also In-situ analysis of Raman spectroscopy is introduced for material forming research.

ALD-assisted Hybrid Processes for improved Corrosion Resistance of Hard coatings

  • Wan, Zhixin;Kwon, Se-Hun
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2016년도 추계학술대회 논문집
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    • pp.105-105
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    • 2016
  • Recently, high power impulse magnetron sputtering (HIPIMS) has attracted considerable attentions due to its high potential for industrial applications. By pulsing the sputtering target with high power density and short duration pulses, a high plasma density and high ionization of the sputtered species can be obtained. HIPIMS has exhibited several merits such as increased coating density, good adhesion, microparticle-free and smooth surface, which make the HIPIMS technique desirable for synthesizing hard coatings. However, hard coatings present intrinsic defects (columnar structures, pinholes, pores, discontinuities) which can affect the corrosion behavior, especially when substrates are active alloys like steel or in a wear-corrosion process. Atomic layer deposition (ALD), a CVD derived method with a broad spectrum of applications, has shown great potential for corrosion protection of high-precision metallic parts or systems. In ALD deposition, the growth proceeds through cyclic repetition of self-limiting surface reactions, which leads to the thin films possess high quality, low defect density, uniformity, low-temperature processing and exquisite thickness control. These merits make ALD an ideal candidate for the fabrication of excellent oxide barrier layer which can block the pinhole and other defects left in the coating structure to improve the corrosion protection of hard coatings. In this work, CrN/Al2O3/CrN multilayered coatings were synthesized by a hybrid process of HIPIMS and ALD techniques, aiming to improve the CrN hard coating properties. The influence of the Al2O3 interlayer addition, the thickness and intercalation position of the Al2O3 layer in the coatings on the microstructure, surface roughness, mechanical properties and corrosion behaviors were investigated. The results indicated that the dense Al2O3 interlayer addition by ALD lead to a significant decrease of the average grain size and surface roughness and greatly improved the mechanical properties and corrosion resistance of the CrN coatings. The thickness increase of the Al2O3 layer and intercalation position change to near the coating surface resulted in improved mechanical properties and corrosion resistance. The mechanism can be explained by that the dense Al2O3 interlayer acted as an excellent barrier for dislocation motion and diffusion of the corrosive substance.

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[CoFe/Pt/CoFe]/IrMn 다층박막의 수직자기 이방성 각도에 따른 상호교환결합력 특성 (Anisotropy Angle Dependence of Interlayer Exchange Coupling of Perpendicular Magnetic [CoFe/Pt/CoFe]/IrMn Multilayers)

  • 이상석;최종구;황도근;이장로
    • 한국자기학회지
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    • 제18권6호
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    • pp.232-236
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    • 2008
  • [CoFe/Pt/CoFe]/IrMn 다층박막에 대하여 반강자성체 IrMn층 두께 의존성 및 열적안정성, 수평으로 전환하는 각도에 의존하는 수직자기 이방성 특성을 관찰하였다. IrMn층을 통해 유도된 강자성체/비자성체/강자성체 구조인 [CoFe($10{\AA}$)/Pt($8{\AA}$)/CoFe($10{\AA}$)]/IrMn 다층박막은 IrMn 두께 $7{\AA}$부터 상호교환결합력이 형성되었고, 열처리 온도 $250^{\circ}C$까지 열적안정성을 유지하였다. 수직자기 이방성 [CoFe/Pt/CoFe]/IrMn 다층박막에서 바닥 CoFe층과 Pt층을 사이에 두고 반강자성체인 IrMn층에 의해 고정되어 있는 상부 CoFe층간의 상호교환결합력은 이방성 측정 각도가 $0^{\circ}$, $60^{\circ}$일 때 각각 1,000 Oe, 1,500 Oe로, $90^{\circ}$일 때 $\infty$ Oe로 나타났다.