• 제목/요약/키워드: Micro bumps

검색결과 35건 처리시간 0.023초

마이크로 표면돌기의 응착력과 마찰력 (Adhesion and Friction Forces of Micro Surface Bumps)

  • 조성산;임제성;박승호;이승섭
    • 대한기계학회논문집A
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    • 제28권8호
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    • pp.1087-1092
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    • 2004
  • Adhesion and friction forces influence adversely on performance and durability of MEMS. It has been reported that the adhesion and friction forces can be reduced with the introduction of micro surface bumps into the contacting interfaces. In this study experiments were conducted to investigate comparatively the effect of hemispherical and torus micro bumps on the adhesion and friction forces. It is confirmed that micro bumps reduce the adhesion and friction forces, and their effect is more pronounced with the bumps of smaller outer boundary radius. Moreover, the results shows that the torus bumps exhibit more rapid decrease of the adhesion and friction forces with the decrease in the outer boundary radius of bump than the hemispherical bumps. When the magnitude of adhesion force is same, the torus bumps generate smaller friction force than the hemispherical bumps. The usage of hemispherical and torus bumps to reduce the adhesion and friction forces in MEMS is discussed.

첨단 반도체 패키징을 위한 미세 피치 Cu Pillar Bump 연구 동향 (Recent Advances in Fine Pitch Cu Pillar Bumps for Advanced Semiconductor Packaging)

  • 노은채;이효원;윤정원
    • 마이크로전자및패키징학회지
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    • 제30권3호
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    • pp.1-10
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    • 2023
  • 최근, 고사양 컴퓨터, 모바일 제품의 수요가 증가하면서 반도체 패키지의 고집적화, 고밀도화가 요구된다. 따라서 많은 양의 데이터를 한 번에 전송하기 위해 범프 크기 및 피치 (Pitch)를 줄이고 I/O 밀도를 증가시킬 수 있는 플립 칩 (flip-chip), 구리 필러 (Cu pillar)와 같은 마이크로 범프 (Micro-bump)가 사용된다. 하지만 범프의 직경이 70 ㎛ 이하일 경우 솔더 (Solder) 내 금속간화합물 (Intermetallic compound, IMC)이 차지하는 부피 분율의 급격한 증가로 인해 취성이 증가하고, 전기적 특성이 감소하여 접합부 신뢰성을 악화시킨다. 따라서 이러한 점을 개선하기 위해 UBM (Under Bump Metallization) 또는 Cu pillar와 솔더 캡 사이에 diffusion barrier 역할을 하는 층을 삽입시키기도 한다. 본 review 논문에서는 추가적인 층 삽입을 통해 마이크로 범프의 과도한 IMC의 성장을 억제하여 접합부 특성을 향상시키기 위한 다양한 연구를 비교 분석하였다.

스크린 인쇄용 미세 범프 금속마스크의 변형특성 해석 (Deformation Analysis of a Metal Mask for the Screen Printing of Micro Bumps)

  • 이기연;이혜진;김종봉;박근
    • 한국생산제조학회지
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    • 제21권3호
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    • pp.408-414
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    • 2012
  • Screen printing is a printing method that uses a woven mesh to support an ink-blocking stencil by transferring ink or other printable materials in order to form an image onto a substrate. Recently, the screen printing method has applied to micro-electronic packaging by using solder paste as a printable material. For the screen printing of solder paste, metal masks containing a number of micro-holes are used as a stencil material. The metal mask undergoes deformation when it is installed in the screen printing machine, which results in the deformation of micro-holes. In the present study, finite element (FE) analysis was performed to predict the amount of deformation of a metal mask. For an efficient calculation of the micro-holes of the metal mask, the sub-domain analysis method was applied to perform FE analyses connecting the global domain (the metal mask) and the local domain (micro-holes). The FE analyses were then performed to evaluate the effects of slot designs on the deformation characteristics, from which more uniform and adjustable deformation of the metal mask can be obtained.

스텐실 프린팅 공정에서 미세범프의 성형성 향상을 위한 연구 (Improvement of Filling Characteristics of Micro-Bumps in the Stencil Printing Process)

  • 서원상;민병욱;박근;이혜진;김종봉
    • 한국생산제조학회지
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    • 제21권1호
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    • pp.26-32
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    • 2012
  • In the present study, the stencil printing process using solder paste are numerically analyzed. The key design parameters in the stencil printing process are the printing conditions, stencil design, and solder paste properties. Among these parameters, the effects of printing conditions including the squeegee angle and squeegee pressure are investigated through finite element (FE) analysis. However, the FE analysis for the stencil printing process requires tremendous computational loads and time because this process carries micro-filling through thousands of micro-apertures in stencil. To overcome this difficulty in simulation, the present study proposes a two-step approach to sequentially perform the global domain analysis and the local domain analysis. That is, the pressure development under the squeegee are firstly calculated in the full analysis domain through the global analysis. The filling stage of the solder paste into a micro-aperture is then analyzed in the local analysis domain based on the results of the preceding global analysis.

전해도금에 의해 형성된 Sn-Ag-Cu 솔더범프와 Cu 계면에서의 열 시효의 영향 (Influence of Thermal Aging at the Interface Cu/sn-Ag-Cu Solder Bump Made by Electroplating)

  • 이세형;신의선;이창우;김준기;김정한
    • 대한용접접합학회:학술대회논문집
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    • 대한용접접합학회 2007년 추계학술발표대회 개요집
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    • pp.235-237
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    • 2007
  • In this paper, fabrication of Sn-3.0Ag-0.5Cu solder bumping having accurate composition and behavior of intermetallic compounds(IMCs) growth at interface between Sn-Ag-Cu bumps and Cu substrate were studied. The ternary alloy of the Sn-3.0Ag-0.5Cu solder was made by two binary(Sn-Cu, Sn-Ag) electroplating on Cu pad. For the manufacturing of the micro-bumps, photo-lithography and reflow process were carried out. After reflow process, the micro-bumps were aged at $150^{\circ}C$ during 1 hr to 500 hrs to observe behavior of IMCs growth at interface. As a different of Cu contents(0.5 or 2wt%) at Sn-Cu layer, behavior of IMCs was estimated. The interface were observed by FE-SEM and TEM for estimating of their each IMCs volume ratio and crystallographic-structure, respectively. From the results, it was found that the thickness of $Cu_3Sn$ layer formed at Sn-2.0Cu was thinner than the thickness of that layer be formed Sn-0.5Cu. After aging treatment $Cu_3Sn$ was formed at Sn-0.5Cu layer far thinner.

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다층 PCB 빌드업 기판용 마이크로 범프 도금에 미치는 전해조건의 영향 (Effects of Electroplating Condition on Micro Bump of Multi-Layer Build-Up PCB)

  • 서민혜;홍현선;정운석
    • 한국재료학회지
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    • 제18권3호
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    • pp.117-122
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    • 2008
  • Micro-sized bumps on a multi-layered build-up PCB were fabricated by pulse-reverse copper electroplating. The values of the current density and brightener content for the electroplating were optimized for suitable performance with maximum efficiency. The micro-bumps thus electroplated were characterized using a range of analytical tools that included an optical microscope, a scanning electron microscope, an atomic force microscope and a hydraulic bulge tester. The optical microscope and scanning electron microscope analyses results showed that the uniformity of the electroplating was viable in the current density range of $2-4\;A/dm^2$; however, the uniformity was slightly degraded as the current density increased. To study the effect of the brightener concentration, the concentration was varied from zero to 1.2 ml/L. The optimum concentration for micro-bump electroplating was found to be 0.6 ml/L based on an examination of the electroplating properties, including the roughness, yield strength and grain size.

Contact Start-Stop 방식에서의 극저부상 높이에서 Head-Disk Interface Interactions 연구 (A Study on Head-Disk Interactions at Ultra-low Flying Height in Contact Start-Stop)

  • 조언정
    • Tribology and Lubricants
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    • 제19권2호
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    • pp.102-108
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    • 2003
  • The height of laser bumps has been considered as the limit of the minimum flying height in the contact start-stop (CSS) of hard disk drives. In this paper, tribological interactions at flying height under laser bumps are investigated in a spin stand for development of ultra-low flying head-disk interface. With the reduction of the spinning speed in a spin stand, the flying height is decreased under the height of laser bumps and, then, head-disk interactions are investigated using AE and stiction/friction signals. During seek tests and 20000 cycle-sweep tests, AE and stiction/friction signals are not significantly changed and there are no catastrophic failures of head-disk interface. Bearing analysis and AFM analysis show that there are signs of wear and plastic deformation on the disks. It is suggested that flying height could be as low as and, sometimes, lower than laser bump height.

Micro Indentor를 이용한 Stiction Free Slider 개발 (Fabrication and Investigation of a Method of the Reduced-Stiction Slider)

  • 박준우;김대은
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2000년도 춘계학술대회 논문집
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    • pp.842-845
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    • 2000
  • It is essential to reduce stiction between the slider and the disk for super-smooth media such as glass disk for high density recording. We developed a stiction-reduced slider by fabricating mechanical bumps on the air bearing surface of the slider by indentation technique. This paper presents a possibility and concept of Stiction-Free-Slider which can operate on the data zone of a magnetic disk. The slider hat many bumps and their heights are in the tens of nm range. The SFS shows good performance on the data zone. Moreover, little wear of the bumps was observed when the preload was small.

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극저부상 HDI 개발을 위한 Head-Disk Impact 연구 (Investigation of Head-Disk Impact for Development of Ultra-Low Flying HDI)

  • 조언정;박노열
    • 한국윤활학회:학술대회논문집
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    • 한국윤활학회 2001년도 제33회 춘계학술대회 개최
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    • pp.122-126
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    • 2001
  • Magnetic hard disk drive is continually being pushed to reduce head-disk spacing for higher recording densities. The current minimum spacing between the air-bearing slider and disk has been reduced to under 15 nm. In this work, it was investigated if flying height could be lowered under the height of laser bumps. With the reduction of the spinning speed, the flying height was decreased under the height of laser bumps. When a head swept between landing zone and data zone, the head-disk impact was monitored using AE and friction signals. It is demonstrated that magnetic hard disk drive could be operated without tribological failures under the height of laser bumps.

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플립칩 패키징용 Sn-0.7Cu 전해도금 초미세 솔더 범프의 제조와 특성 (Fabrication and Characteristics of Electroplated Sn-0.7Cu Micro-bumps for Flip-Chip Packaging)

  • 노명훈;이희열;김원중;정재필
    • 대한금속재료학회지
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    • 제49권5호
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    • pp.411-418
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    • 2011
  • The current study investigates the electroplating characteristics of Sn-Cu eutectic micro-bumps electroplated on a Si chip for flip chip application. Under bump metallization (UBM) layers consisting of Cr, Cu, Ni and Au sequentially from bottom to top with the aim of achieving Sn-Cu bumps $10\times10\times6$ ${\mu}m$ in size, with 20${\mu}m$ pitch. In order to determine optimal plating parameters, the polarization curve, current density and plating time were analyzed. Experimental results showed the equilibrium potential from the Sn-Cu polarization curve is -0.465 V, which is attained when Sn-Cu electro-deposition occurred. The thickness of the electroplated bumps increased with rising current density and plating time up to 20 mA/$cm^2$ and 30 min respectively. The near eutectic composition of the Sn-0.72wt%Cu bump was obtained by plating at 10 mA/$cm^2$ for 20 min, and the bump size at these conditions was $10\times10\times6$ ${\mu}m$. The shear strength of the eutectic Sn-Cu bump was 9.0 gf when the shearing tip height was 50% of the bump height.