• 제목/요약/키워드: N-drift layer

검색결과 33건 처리시간 0.034초

온도 변화에 따른 NPT-IGBT의 과도 특성 (Transient Characteristics of NPT-IGBT with different temperatures)

  • 류세환;황광철;안형근;한득영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.292-295
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    • 2002
  • In this work, transient characteristics of NPT(Non Punch Through)-IGBT(Insulated Gate Bipolar Transistor) have been studied with different temperatures analytically. Power losses are caused by heat generated in MIT-IGBT for steady state and transient state conditions. We therefore have focused on the analysis of excess carrier concentration and excess charge injected into N-drift layer with different temperatures and have obtained anode voltage drop during turn-off with lifetime of 2.4[${\mu}$s].

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SIPOS를 이용한 SOI RESURF 다이오드의 항복전압 특성 (Breakdown Voltage Characterization of SOI RESURF Diode Using SIPOS)

  • 신동구;한승엽;최연익;정상구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 하계학술대회 논문집 C
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    • pp.1621-1623
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    • 1997
  • The breakdown voltage of SOI RESURF (REduce SURface Field) diode using a SIPOS (Semi Insulating POlycrystalline Silicon) layer is verified in terms of n-drift layer length and surface oxide thickness by device simulator MEDICI, and compared with conventional SOI RESURF diode. Increasing the n-drift layer length, the breakdown voltage of SOI RESURF diode using the SIPOS layer have increased and saturated at $8{\mu}m$. And it has decreased with increasing the surface oxide thickness.

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Current Spreading Layer와 에피 영역 도핑 농도에 따른 4H-SiC Vertical MOSFET 항복 전압 최적화 (Optimization of 4H-SiC Vertical MOSFET by Current Spreading Layer and Doping Level of Epilayer)

  • 안정준;문경숙;구상모
    • 한국전기전자재료학회논문지
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    • 제23권10호
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    • pp.767-770
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    • 2010
  • In this work, we investigated the static characteristics of 4H-SiC vertical metal-oxidesemiconductor field effect transistors (VMOSFETs) by adjusting the doping level of n-epilayer and the effect of a current spreading layer (CSL), which was inserted below the p-base region with highly doped n+ state ($5{\times}10^{17}cm^{-3}$). The structure of SiC VMOSFET was designed by using a 2-dimensional device simulator (ATLAS, Silvaco Inc.). By varying the n-epilayer doping concentration from $1{\times}10^{16}cm^{-3}$ to $1{\times}10^{17}cm^{-3}$, we investigated the static characteristics of SiC VMOSFETs such as blocking voltages and on-resistances. We found that CSL helps distribute the electron flow more uniformly, minimizing current crowding at the top of the drift region and reducing the drift layer resistance. For that reason, silicon carbide VMOSFET structures of highly intensified blocking voltages with good figures of merit can be achieved by adjusting CSL and doping level of n-epilayer.

Extended Trench Gate Superjunction Lateral Power MOSFET for Ultra-Low Specific on-Resistance and High Breakdown Voltage

  • Cho, Doohyung;Kim, Kwangsoo
    • ETRI Journal
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    • 제36권5호
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    • pp.829-834
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    • 2014
  • In this paper, a lateral power metal-oxide-semiconductor field-effect transistor with ultra-low specific on-resistance is proposed to be applied to a high-voltage (up to 200 V) integrated chip. The proposed structure has two characteristics. Firstly, a high level of drift doping concentration can be kept because a tilt-implanted p-drift layer assists in the full depletion of the n-drift region. Secondly, charge imbalance is avoided by an extended trench gate, which suppresses the trench corner effect occurring in the n-drift region and helps achieve a high breakdown voltage (BV). Compared to a conventional trench gate, the simulation result shows a 37.5% decrease in $R_{on.sp}$ and a 16% improvement in BV.

자외선 조사를 이용한 SnO2 나노입자/Pd 촉매층을 갖는 GaN 기반 수소 센서의 안정성 개선 연구 (Improved Stability of GaN-based Hydrogen Sensor with SnO2 Nanoparticles/Pd Catalyst Layer Using UV Illumination)

  • 최원태;오희재;김정진;차호영
    • 반도체공학회 논문지
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    • 제1권1호
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    • pp.9-13
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    • 2023
  • 본 연구에서는 SnO2 나노입자와 Pd 금속의 이중층으로 구성된 촉매층을 갖는 AlGaN/GaN 이종접합 기반의 상온동작 수소센서를 제작하여 해당 센서의 안정성 개선 연구를 수행하였다. 제작된 센서를 고온 환경이 아닌 상온에서 수소에 노출 및 차단을 반복하며 동작 시켰을 때 시간에 따라 대기전류가 감소하는 불안정한 전류 드리프트 (current drift) 현상이 발생하였지만, 자외선 (UV) 조사를 함께 진행하면서 반복 측정을 하였을 때 해당 불안정성의 가시적인 개선 효과를 이루었다.

CT-IGBT의 최적 설계 및 전기적 특성에 관한 분석 (An Analysis on Optimal Design and Electrical Characteristics of CT-IGBT(Circular Trench IGBT))

  • 곽상현;서준호;서인곤;성만영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.22-23
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    • 2008
  • The conventional IGBT has two problems to make the device taking high performance. The one is high on state voltage drop associated with JFET region, the other is low breakdown voltage associated with concentrating the electric field on the junction of between p base and n drift. This paper is about the structure to effectively improve both the lower on state voltage drop and the higher breakdown voltage than the conventional IGBT. For the fabrication of the circular trench IGBT with the circular trench layer, it is necessary to perform the only one wet oxidation step for the circular trench layer. Analysis on both the on state voltage drop and the Breakdown voltage show the improved values compared to the conventional IGBT structure. Because the circular trench layer disperses electric field from p base and n drift junction to circular trench, the breakdown voltage increase. The on state voltage drop decrease due to reduction of JFET region and direction change of current path which pass through reversed layer channel.

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습식 산화를 이용한 원형 트렌치 게이트 IGBT에 관한 연구 (An Analysis of IGBT(Insulator Gate Bipolar Transistor) Structure with an Additional Circular Trench Gate using Wet Oxidation)

  • 곽상현;경신수;성만영
    • 한국전기전자재료학회논문지
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    • 제21권11호
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    • pp.981-986
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    • 2008
  • The conventional IGBT has two problems to make the device taking high performance. The one is high on state voltage drop associated with JFET region, the other is low breakdown voltage associated with concentrating the electric field on the junction of between p base and n drift. This paper is about the structure to effectively improve both the lower on state voltage drop and the higher breakdown voltage than the conventional IGBT. For the fabrication of the circular trench IGBT with the circular trench layer, it is necessary to perform the only one wet oxidation step for the circular trench layer. Analysis on both the on state voltage drop and the breakdown voltage show the improved values compared to the conventional IGBT structure. Because the circular trench layer disperses electric field from the junction of between p base and n drift to circular trench, the breakdown voltage increase. The on state voltage drop decrease due to reduction of JFET region and direction changed of current path which pass through reversed layer channel. The electrical characteristics were studied by MEDICI simulation results.

Numerical Study on Current-Induced Switching of Synthetic Antiferromagnet

  • Lee, Seo-Won;Lee, Kyung-Jin
    • Journal of Magnetics
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    • 제15권4호
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    • pp.149-154
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    • 2010
  • Synthetic antiferromagnets (SAFs) are used as free layer structures for various magnetic devices utilizing spintransfer torque (STT). Therefore, it is important to understand current-induced excitation of SAFs. By means of drift-diffusion and macrospin models, we studied the current-induced excitation of a SAF-free layer structure (NiFe/Ru/NiFe). The simulation results were compared with the previous experimental results [N. Smith et al., Phys. Rev. Lett. 101, 247205 (2008)]. We confirmed that a nonzero STT through the Ru layer is essential for explaining the experimental results.

N개의 원형 실린더 주위에서의 해저면 토사이동 (Bottom Mass Transport Considering the Interaction of Waves with an Array of N Circular Cylinders)

  • 조일형;홍사영
    • 한국항만학회지
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    • 제9권1호
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    • pp.57-63
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    • 1995
  • In this paper we examine the mass transport within the boundary layer near the sea bottom. The fluid domain is seperated into inner and outer region of boundary layers. In outer region, the wave field is assumed to be inviscid and irrotational. When the incident waves enter the arrays of circular cylinders, the scattering of water waves by an array of N bottom mounted vertical circular cylinders is solved using the method proposed by Linton & Evans under the potential theory. In inner region, the Navier-Stokes equation must be satisfied with boundary conditions at the boundary later and bottom is to be represented by the sum of the Eulerian mean drift and the Stokes' drift.

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양성자 조사법에 의한 고속스위칭 사이리스터의 제조 (Fabrication of a fast Switching Thyristor by Proton Irradiation Method)

  • 김은동;장창리;김상철;김남균
    • 한국전기전자재료학회논문지
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    • 제17권12호
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    • pp.1264-1270
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    • 2004
  • A fast switching thyristor with a superior trade-off property between the on-state voltage drop and the turn-off time could be fabricated by the proton irradiation method. After making symmetric thyristor dies with a voltage rating of 1,600 V from 350 $\mu$m thickness of 60 $\Omega$ㆍcm NTD-Si wafer and 200 $\mu$m width of n-base drift layer, the local carrier lifetime control by the proton irradiation was performed with help of the HI-13 tandem accelerator in China. The thyristor samples irradiated with 4.7 MeV proton beam showed a superior trade-off relationship of $V_{TM}$ = 1.55 V and $t_{q}$ = 15 $\mu$s attributed to a very narrow layer of short carrier lifetime(~1 $\mu$s) in the middle of its n-base drift region. To explain the small increase of $V_{TM}$ , we will introduce the effect of carrier compensation at the low carrier lifetime region by the diffusion current.ffusion current.t.