• Title/Summary/Keyword: Nano master

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Fabrication of metallic nano-stamper to replicate nanoscale patterns (나노패턴 성형을 위한 금속 나노 스탬퍼 제작)

  • 김영규;이동철;강신일
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2003.05a
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    • pp.481-484
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    • 2003
  • In this study, we fabricated the master metallic nano-stamper with nano pillar patterns to apply replication processes which is adequate for mass production. Master nano patterns with various hole diameters between 300 nm and 1000 nm was fabricated by e-beam lithography. After the seed layer was deposited on the master nano patterns using e-beam evaporation, the nickel was electroformed. In each step, the shape and surface roughness of their patterns were analyzed using SEM and AFM.

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Fabrication of Nano Master with Anti-reflective Surface Using Aluminum Anodizing Process (양극산화공정을 이용한 반사방지 성형용 나노 마스터 개발)

  • Shin, H.;Park, Y.;Seo, Y.;Kim, B.
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.18 no.6
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    • pp.697-701
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    • 2009
  • A simple method for the fabrication of porous nano-master for the anti-reflection effect on the transparent substrates is presented. In the conventional fabrication methods for antireflective surface, coating method using materials with low refractive index has usually been used. However, it is required to have a high cost and long processing time for mass production. In this paper, we developed a porous nano-master with anti-reflective surface for the molding stamper of the injection mold, hot embossing and UV imprinting by using the aluminum anodizing process. Through two-step anodizing and etching processes, a porous nano-master with anti-reflective surface was fabricated at the large area. Pattern size Pore diameter and inter-pore distance are about 130nm and 200nm, respectively. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

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Study on Fabrication of Highly Ordered Nano Master by Using Anodic Aluminum Oxidation (AAO를 이용한 나노 마스터 제작에 관한 연구)

  • Kwon, J.T.;Shin, H.G.;Seo, Y.H.;Kim, B.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2007.10a
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    • pp.162-165
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    • 2007
  • AAO(Anodic Aluminum Oxidation) method has been known that it is practically useful for the fabrication of nano-structures and makes it possible to fabricate the highly ordered nano masters on large surface and even on the 2.5 or 3D surface at low cost comparing to the expensive e-beam lithography or the conventional silicon processing. In this study, by using the multi-step anodizing and etching processes, highly ordered nano patterned master with concave shapes was fabricated. By varying the processing parameters, such as initial matter and chemical conditions; electrical and thermal conditions; time scheduling; and so on, the size and the pitch of the nano pattern can be controlled. Consequently, various alumina/aluminum nano structures can be easily available in any size and shape by optimized anodic oxidation in various aqueous acids. In order to replicate nano patterned master, the resulting good filled uniform nano molded structure through electro-forming process shows the validity of the fabricated nano pattern masters.

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Study on Fabrication of Highly Ordered Nano Patterned Master by Using Anodic Aluminum Oxidation (AAO를 이용한 나노 패턴 마스터 제작에 관한 연구)

  • Shin, H.G.;Kwon, J.T.;Seo, Y.H.;Kim, B.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2007.05a
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    • pp.368-370
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    • 2007
  • AAO(Anodic Aluminum Oxidation) method has been known that it is practically useful for the fabrication of nano-structures and makes it possible to fabricate the highly ordered nano masters on large surface and even on the 2.5 or 3D surface at low cost comparing to the expensive e-beam lithography or the conventional silicon processing. In this study, by using the multi-step anodizing and etching processes, highly ordered nano patterned master with concave shapes was fabricated. By varying the processing parameters, such as initial matter and chemical conditions; electrical and thermal conditions; time scheduling; and so on, the size and the pitch of the nano pattern can be controlled. Consequently, various alumina/aluminum nano structures can be easily available in any size and shape by optimized anodic oxidation in various aqueous acids. The resulting good filled uniform nano molded structure through hot embossing molding process shows the validity of the fabricated nano pattern masters.

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Fabrication of Polymer Master with High Aspect Ratio by Using Anodic Aluminum Oxidation (양극산화공정을 이용한 고세장비의 폴리머 마스터 제작)

  • Kwon, J.T.;Shin, H.G.;Seo, Y.H.;Kim, B.H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2008.05a
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    • pp.285-287
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    • 2008
  • AAO(Anodic Aluminum Oxidation) method has been known that it is practically useful for the fabrication of nano-structures and makes it possible to fabricate the highly ordered nano masters on large surface and even on the 2.5 or 3D surface at low cost comparing to the expensive e-beam lithography or the conventional silicon processing. In this study, by using the multi-step anodizing and etching processes, highly ordered nano patterned master with concave shapes was fabricated. By varying the processing parameters, such as initial matter and chemical conditions; electrical and thermal conditions; time scheduling; and so on, the size and the pitch of the nano pattern can be controlled. Consequently, various alumina/aluminum nano structures can be easily available in any size and shape by optimized anodic oxidation in various aqueous acids. In order to replicate nano patterned master, the resulting good filled uniform nano molded structure through electro-forming process shows the validity of the fabricated nano pattern masters.

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Polymer master fabrication for antireflection using low-temperature AAO process (저온 양극산화공정을 이용한 반사 방지용 폴리머 마스터 제작)

  • Shin, Hong-Gue;Kwon, Jong-Tae;Seo, Young-Ho;Kim, Byeong-Hee;Park, Chang-Min;Lee, Jae-Suk
    • Proceedings of the KSME Conference
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    • 2008.11a
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    • pp.1825-1828
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    • 2008
  • A simple method for the fabrication of porous nano-master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index has usually been used. However, it is required to have high cost and long times for mass production. In this paper, we suggested the fabrication method of antireflective surface by the hot embossing process using the porous nano patterned master on silicon wafer fabricated by low-temperature anodic aluminum oxidation. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Pore diameter and inter-pore distance are about 150nm and from 150 to 200nm. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

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Fabrication of a PDMS (Poly-Dimethylsiloxane) Stamp Using Nano-Replication Printing Process (나노 복화(複畵)공정을 이용한 PDMS 스탬프 제작)

  • Park, Sang-Hu;Lim, Tae-Woo;Yang, Dong-Yol;Kong, Hong-Jin
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.28 no.7
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    • pp.999-1005
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    • 2004
  • A new stamp fabrication technique for the soft lithography has been developed in the range of several microns by means of a nano-replication printing (nRP) process. In the nRP process, a figure or a pattern can be replicated directly from a two-tone bitmap figure with nano-scale details. A photopolymerizable resin was polymerized by the two-photon absorption which was induced by a femtosecond laser. After the polymerization of master patterns, a gold metal layer (about 30 ㎚ thickness) was deposited on the fabricated master patterns for the purpose of preventing a join between the patterns and the PDMS, then the master patterns were transferred in order to fabricate a stamp by using the PDMS (poly-dimethylsiloxane). In the transferring process, a few of gold particles, which were isolated from the master patterns, remained on the PDMS stamp. A gold selective etchant, the potassium iodine (KI) was employed to remove the needless gold particles without any damage to the PDMS stamp. Through this work, the effectiveness of the nRP process with the PDMS molding was evaluated to make the PDMS stamp with the resolution of around 200 ㎚.

Fabrication of Nanoscale Reusable Quartz Master for Nano Injection Molding Process (재사용 가능한 100nm급 패턴의 퀄츠 마스터 제작 및 퀄츠 마스터를 사용한 사출성형실험)

  • Choi Doo-Sun;Lee Joon-Hyoung;Yoo Yeong-Eun;Je Tae-Jin;Whang Kyung-Hyun;Seo Young Ho
    • Transactions of the Korean Society of Mechanical Engineers A
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    • v.29 no.2 s.233
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    • pp.228-231
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    • 2005
  • In this paper, we present reusable quartz master fabricated by electron-beam lithography and dry etching process of quartz, and results of injection molding based on the reusable quartz master for the manufacturing of nano-scale information media. Since patterned structures of photoresist can be easily damaged by separation (demolding) process of nickel stamper and master, a master with photoresist cannot be reused in stamper fabrication process. In this work, we have made it possible of the repeated use of master by directly patterning on quart in nickel stamper fabrication process. We have designed and fabricated four different specimens including 100nm, 140nm 200nm and 400nm pit patterns. In addition, both intaglio and embossed carving patterns are fabricated for each specimen. In the preliminary test of injection molding, we have fabricated polycarbonate patterns with varying mold temperature. We have experimentally verified the fabrication process of the reusable quart master and possibility of quartz master as direct stamper.

Comparison Study of the Synthesized Silver Nano-particles using Liquid Phase Reduction Method and Alcohol Reduction Process (액상환원법과 알코올환원법으로 제조한 은나노입자특성 비교에 관한 연구)

  • Son, Eun-Jong;Hwang, Young-Gu;Shin, Yu-Shik;Jeong, Sung-Hoon
    • Textile Coloration and Finishing
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    • v.23 no.2
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    • pp.146-153
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    • 2011
  • Silver nano-particles have been synthesized by liquid phase reduction method and alcohol reduction process. Silver nano-particles of the size 30 ~ 40 nm were formed successfully by alcohol reduction process. The formation, structure, morphology and size of silver nano-particles have been studied using FE-SEM, TEM, XRD, UV-visible spectroscopy. In particular high dispersion stability of the synthesized silver nano-particles could be obtained by PVP binding. Antibacterial activity of Ag/PET master batch sample made from its nano-silver particles showed excellent antibacterial activity against S. aureus and E. coli.

Nano-master fabrication for photonic crystal waveguides (광결정 도파로용 나노 마스터 제작)

  • 최춘기;한상필;정명영
    • Journal of the Korean Vacuum Society
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    • v.12 no.4
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    • pp.288-292
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    • 2003
  • The fabrication of silicon nano-master with pillar structures using E-beam lithography and ICP etching was investigated for application of 2-dimensional polymer photonic crystal waveguides with air hole structures. Pillar structures with square, hexagon, dodecagon and circle were successfully fabricated. The diameters and structures of fabricated pillars were measured by CD-SEM and SPM-AFM. It was found that the optimal dose for complete circle pillar structures was 432 $\mu$C/$\textrm{cm}^2$.