• 제목/요약/키워드: O-O bond formation

검색결과 138건 처리시간 0.024초

Failure Mechanisms of Thermal Barrier Coatings Deposited on Hot Components in Gas Turbine Engines

  • Lee E. Y.;Kim J. H.;Chung S. I.
    • 한국추진공학회:학술대회논문집
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    • 한국추진공학회 2005년도 제24회 춘계학술대회논문집
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    • pp.106-111
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    • 2005
  • Failure mechanisms were investigated for the two layer thermal barrier coatings consisting of NiCrAlY bond coat and $ZrO_2-8wt.\% Y_{2}O_3$ ceramic coating during cyclic oxidation. $Al_{2}O_3$ developed at the ceramic coating/bond coat interface first, followed by the Cr/Ni rich oxides such as $NiCr_{2}O_4 and Ni(Al,Cr)_{2}O_4$ during cyclic oxidation It was observed that the spalling of ceramic coatings took place primarily within the NiCrAlY bond coat oxidation products or at the interface between the bond coat oxidation products and zirconia based ceramic coating or the bond coat. It was also observed that the fracture within these oxidation products occurred with the formation of $Ni(Cr,Al)_{2}O_4$ spinel or Cr/Ni rich oxides. It was therefore concluded that the formation of these oxides was a life-limiting event for the thermal barrier coatings.

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Failure Mechanisms for Zirconia Based Thermal Barrier Coatings

  • Lee, Eui Y.;Kim, Jong H.
    • The Korean Journal of Ceramics
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    • 제4권4호
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    • pp.340-344
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    • 1998
  • Failure mechanisms were investigated for the two layer thermal barrier coatings consisting of NiCrAlY bond coat and $ZrO_2$-8wt.% $Y_2O_3$ ceramic coating during cyclic oxidation. $Al_2O_3$ developed at the ceramic coating/bond coat interface first, followed by the Cr/Ni rich oxides such as $NiCr_2O_4$ and $Ni(Al, Cr)_2O_4$ during cyclic oxidation. It was observed that the spalling of ceramic coatings took place primarily within the NiCrAlY bond coat oxidation products or at the interface between the bond coat oxidation products and zirconia based ceramic coating or the bond coat. It was also observed that the fracture within these oxidation products occurred with the formation of $Ni(Cr, Al)_2O_4$ spinel or Cr/Ni rich oxides. It was therefore concluded that the formation of these oxides was a life-limiting event for the thermal barrier coatings.

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Bond Coat의 산화가 Thermal Barrier Coating의 파괴에 미치는 영향 (Effect of Oxidation of Bond Coat on Failure of Thermal Barrier Coating)

  • 최동구;최함메;강병성;최원경;최시경;김재철;박영규;김길무
    • 한국세라믹학회지
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    • 제34권1호
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    • pp.88-94
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    • 1997
  • 플라즈마 용사법(plasma spray method)으로 제작된 상용 가스 터빈 연소기의 finned segment의 열차폐용 코팅계, ZrO2-8wt%Y2O3 top coat/Ni-26Cr-5Al-0.5Y bond coat/Hastelloy X superalloy 기판에서 NiCrAlY bond coat의 산화 거동과 열피로 파괴에 대하여 조사하였다. 생성된 bond coat의 주산화물은 NiO, CrO2, Al2O3였다. ZrO2/bond coat계면에서 생성된 산화물의 분포는 고온에서의 사용 전에 이 계면 아래에 얇은 층의 Al2O3가없는 곳에서는 NiO 산화층 및에 Cr2O3와 Al2O3가 혼합된 형태를 나타내었다. 열피로에 의해 박리된 시편의 파면을 관찰한 결과, 파괴는 주로 ZrO2/산화층 계면보다 세라믹층내로 약간 치우쳐서 일어나지만, 산화층 내에서도 약간 일어남을 알 수 있었다.

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Formation of Silicon nanocrystallites by ion beam assisted electron beam deposition

  • Won Chel Choi
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 1998년도 제14회 학술발표회 논문개요집
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    • pp.68-69
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    • 1998
  • Nano-crystalline silicon(nc-Si) thin films were directly depposited by ion beam assisted electron beam depposition (IBAED) method. The visibe luminescence in IBAED sampples were originated from not an oxygen bond but Si nano-crystallites. And we can conclude that the ion beam would be contribute to the suppression of the Si-O bond formation.

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Effect of Heat Treatment Method on Properties of ZnO Thin Films Deposited by RF Magnetron Sputtering

  • Kim, Deok Kyu
    • Applied Science and Convergence Technology
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    • 제26권2호
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    • pp.30-33
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    • 2017
  • ZnO thin films which were deposited by RF magnetron sputtering system were annealed by furnace and insitu heat treatment methods. We investigated the effect of heat treatment method on physical properties of ZnO thin films. The structural and optical properties of ZnO thin films were improved by heat treatment. Through the annealing treatment of ZnO film by furnace, the good crystallinity and ultraviolet emission were obtained. These results are attributed to the improved formation of Zn-O bond in ZnO thin film annealed at by furnace. We confirm that the formation of Zn-O bond plays an important role in obtaining the excellent structural and optical properties of ZnO thin films.

2가지 서로 다른 기능에 의해 생성된 박막의 물리적인 특성의 기원 (Physical Properties of Thin Films Generated by Two Kinds of Different Function)

  • 오데레사
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2008년도 하계종합학술대회
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    • pp.487-488
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    • 2008
  • SiOC films containing alkyl groups have a low dielectric constant because of the interaction between the C-H hydrogen bonds and the oxygen of high electro-negative atom. The Si-$CH_3$ in a void is broken by the $O_2$, therefore the strength of CH bond in Si-O-O-$CH_3$ bond increases. The Si-O-O-$CH_3$ bond is broken by nucleophilic attack due to Si atom, again. The elongation of C-H bond causes the red shift, and the compression of C-H bond causes the blue shift. Among these chemical shifts, the blue shift from $1000\;cm^{-1}$ to $1250\;cm^{-1}$ was related with the formation of pores. If the oxygen is deficient condition, the methylradicals of the electron-rich substitution group terminate easily the Si-O-Si cross-link, and the pore is originated from the cross-link breakdown due to much methyl radicals of Si-$CH_3$. The dielectric constant of the films decreases due to pore generation.

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SiOC 박막에서 Si-O 결합의 증가와 유전상수의 관계 (Relationship between Dielectric Constant and Increament of Si-O bond in SiOC Film)

  • 오데레사
    • 한국산학기술학회논문지
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    • 제11권11호
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    • pp.4468-4472
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    • 2010
  • ICP-CVD 방법에 의해 제작된 SiOC 박막을 유전상수와 화학적 이동의 상관성에 대하여 조사하였다. SiOC 박막은 플라즈마 에너지에 의해서 해리작용과 재결합작용에 의해서 cross link 구조를 갖게 되는 Si-O 와 C-O 결합으로 구성된 $930{\sim}1230\;cm^{-1}$ 영역에서 혼합된 Si-O-C 주 결합으로 이루어졌다. C-O 결합은 $1270cm^{-1}$에서 보여지는 Si-$CH_3$ 결합의 말단부분인 C-H 결합이 전기음성도가 큰 산소에 의해서 끌리는 효과로부터 만들어진 결합이다. 그러나 Si-O 결합은 Si-$CH_3$ 결합이 분해되고 난뒤 2차 이온결합에 의해서 만들어진 결합이다. Si-O 결합의 증가는 주결합에서 오른쪽 결합이 증가하기 때문이며, FTIR 스펙트라에 의해서 red shift로 나타났다. 이러한 결과는 SiOC 박막이 보다 더 안정되고 강한 박막임을 의미한다. 그래서 SiOC 박막은 열처리 후 비정질도가 높고 거칠기가 감소되는 것을 확인하였다.

플라즈마 용사 및 EB-PVD에 의한 열벽코팅 수명에 대한 산화물 생성의 영향 (The Effect of Oxide Formation on the Lifetime of Plasma Sprayed or EB-PVD Thermal Barrier Coatings)

  • 이의열
    • 한국표면공학회지
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    • 제27권2호
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    • pp.91-98
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    • 1994
  • For the plasma sprayed as well as the EB-PVD thermal barrier coatings, the fracture paths within the oxidation products developed at the interface between the partially stabilized zirconia ceramic coating and NiCoCrAlY bond coat during cyclic thermal oxidation has been investigated. It was observed that the fracture in the oxidation products primarily took place within the oxide such as $Ni_{1-x}Co_3(Al_,Cr)_2O_4$ or at the interface between the oxide and $Al_2O_3$. It was found that Al2O3 developed first, followed by the Ni/Co/Cr rich oxides such as ,,$Ni_{1-x}Co_x(Al_,Cr)_2O_4$ $Cr_2O_3$and NiO at the interface between the ceramic coating and the bond coat in a cyclic high temperature environment. It was therfore concluded that the formation of the oxide containing Ni, Cr and Co was a life-limiting event for thermal barrier coatings during cyclic thermal oxidation.

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Water Oxidation Mechanism for 3d Transition Metal Oxide Catalysts under Neutral Condition

  • Seo, Hongmin;Cho, Kang Hee;Ha, Heonjin;Park, Sunghak;Hong, Jung Sug;Jin, Kyoungsuk;Nam, Ki Tae
    • 한국세라믹학회지
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    • 제54권1호
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    • pp.1-8
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    • 2017
  • Electrochemical water splitting to produce hydrogen energy is regarded as a promising energy conversion process for its environmentally friendly nature. To improve cell efficiency, the development of efficient water oxidation catalysts is essentially demanded. For several decades, 3d transition metal oxides have been intensively investigated for their high activity, good durability and low-cost. This review covers i) recent progress on 3d transition metal oxide electrocatalysts and ii) the reaction mechanism of oxygen evolving catalysis, specifically focused on the proposed pathways for the O-O bond formation step.

Benzyl Arenesulfonate의 離脫基의 置換基效果에 關한 硏究 (第 1 報) (Substituent Effects on the Leaving Groups in Benzyl Arenesulfonates)

  • 여수동
    • 대한화학회지
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    • 제19권2호
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    • pp.116-122
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    • 1975
  • Benzyl arenesulfonate와 피리딘과의 아세톤 용매중에서의 反應速度를 測定하였다. Benzyl arenesulfonate의 離脫基의 치환기효과는 p-MeO基 및 $p-NO_2$기를 除外하고는 Hammett 式에 잘 적용되었으며, 전자끄는기는 반응속도를 증가시켰다. 離脫基의 치환효과는 벤질炭素에 아민이 親核的으로 공격하여 전이상태에서 치환기의 電子끄는 능력이 C-N 結合의 形成과 C-O結合의 쪼개짐에 변화를 주고 있다는 사실로서도 설명이 되어진다. 치환기효과는 benzyl p-bromobenzeneslfonate가 benzyl p-nitrobenzenesulfonate보다 N-C結合이 tight 한 전이상태의 구조를 가지고 있음을 말해주며 이는 結合의 형성과 쪼개짐에 있어 Thornton의 $S_N2$전이상태 구조의 예상과도 잘 符合된다.

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