• Current Optics and Photonics
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• v.4 no.3
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• pp.186-192
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• 2020

This paper describes a real-time monitoring system in Ethernet passive optical networks (EPON) that uses burst-mode fiber Bragg grating (FBG) optical sensors. The FBG interrogation unit in the optical line terminal (OLT) transmits the monitoring wavelength to optical network units (ONUs). The FBG sensor unit in each ONU returns a burst-mode monitoring signal to the OLT. As the system applies time division multiple access (TDMA), a uniform Bragg wavelength can be used to monitor the EPON system. The FBG interrogation unit analyzes the received burst-mode monitoring signals and outputs fault information on the ONU branches in EPON. The simulation results show the effectiveness of the proposed monitoring system based on TDMA. In addition, we compared the proposed TDMA-based monitoring system with a WDMA-based monitoring system.

• Proceedings of the Optical Society of Korea Conference
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• 2008.07a
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• pp.207-208
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• 2008

In this study, we present the error compensation effect of optical monitoring methods for apply of narrow band pass filter and IR-cutoff filter. Then we show the optimization process for apply of optical monitoring methods.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.26 no.7
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• pp.77-83
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• 2012

Since power system is switching to smart grid, on-line monitoring technology has become necessary for underground distribution power cable. Therefore, the application of DTS(Distributed Temperature Sensing) technology using OFCPC(Optical Fiber Composite Power Cable) capable of monitoring underground distribution power cables has been developed. These can bring about reductions in faults and increases in operating capacity of underground distribution system. To date, the test-bed of optical fiber composite power cable on-line monitoring system has been constructed. Then, matters to be improved have been drawn through verification experiments. This paper presents the improvement and experiment results of the optical fiber composite power cable on-line monitoring system to apply to underground distribution lines in the field.

• Journal of the Optical Society of Korea
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• v.13 no.1
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• pp.112-115
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• 2009

We investigate the effect of polarization-mode dispersion (PMD) on the optimum dispersion compensation (ODC) monitoring and nonlinear penalty in optical transmission systems. We report that PMD may reduce the fiber nonlinearity. We also report that the monitoring error of the clock-based ODC monitoring technique decreases after the first-order PMD compensation. A simple explanation of this phenomenon is shown.

• Journal of the Optical Society of Korea
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• v.12 no.3
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• pp.166-169
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• 2008

The submersion monitoring system based on a reflective side-polished optical fiber submersion sensor with an optical fiber mirror was shown to be an effective alarm system with remote monitoringwhen the drainage capacity of a common utility duct is exceeded due to heavy rainfall. The proposed sensor was connected to an existing installed optical fiber network at a height of 250mm in a common utility duct, and then tested under sample materials(distilled water, river water, sea water, foul water, muddy water, petroleum, edible oil) at a distance of 1km from the sensor for remote sensing. In experiments, the proposed real-time sensor system reduced maintenance cost and improved monitoring efficiency by using a reflection-type side-polished optical fiber submersion sensor efficient for remote monitoring of a common utility duct.

• Transactions on Electrical and Electronic Materials
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• v.13 no.2
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• pp.78-84
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• 2012

An in-situ optical monitoring method for real-time process monitoring of electrochemical copper deposition (CED) is presented. Process variables to be controlled in achieving desired process results are numerous in the CED process, and the importance of the chemical bath conditions cannot be overemphasized for a successful process. Conventional monitoring of the chemical solution for CED relies on the pH value of the solution, electrical voltage level for the reduction of metal cations, and gravity measurement by immersing sensors into a plating bath. We propose a nonintrusive optical monitoring technique using three types of optical sensors such as chromatic sensors and UV/VIS spectroscopy sensors as potential candidates as a feasible optical monitoring method. By monitoring the color of the plating solution in the bath, we revealed that optically acquired information is strongly related to the thickness of the deposited copper on the wafers, and that the chromatic information is inversely proportional to the ratio of $Cu$ (111) and {$Cu$ (111)+$Cu$ (200)}, which can used to measure the quality of the chemical solution for electrochemical copper deposition in advanced interconnection technology.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.523-523
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• 2012

As the wafer geometric requirements continuously complicated and minutes in tens of nanometers, the expectation of real-time add-on sensors for in-situ plasma process monitoring is rapidly increasing. Various industry applications, utilizing plasma impedance monitor (PIM) and optical emission spectroscopy (OES), on etch end point detection, etch chemistry investigation, health monitoring, fault detection and classification, and advanced process control are good examples. However, process monitoring in semiconductor manufacturing industry requires non-invasiveness. The hypothesis behind the optical monitoring of plasma induced ion current is for the monitoring of plasma induced charging damage in non-invasive optical way. In plasma dielectric via etching, the bombardment of reactive ions on exposed conductor patterns may induce electrical current. Induced electrical charge can further flow down to device level, and accumulated charges in the consecutive plasma processes during back-end metallization can create plasma induced charging damage to shift the threshold voltage of device. As a preliminary research for the hypothesis, we performed two phases experiment to measure the plasma induced current in etch environmental condition. We fabricated electrical test circuits to convert induced current to flickering frequency of LED output, and the flickering frequency was measured by high speed optical plasma monitoring system (OPMS) in 10 kHz. Current-frequency calibration was done in offline by applying stepwise current increase while LED flickering was measured. Once the performance of the test circuits was evaluated, a metal pad for collecting ion bombardment during plasma etch condition was placed inside etch chamber, and the LED output frequency was measured in real-time. It was successful to acquire high speed optical emission data acquisition in 10 kHz. Offline measurement with the test circuitry was satisfactory, and we are continuously investigating the potential of real-time in-situ plasma induce current measurement via OPMS.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.153-153
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• 2012

Endpoint detection with plasma impedance monitoring and self-plasma optical emission spectroscopy is demonstrated for dielectric layers etching processes. For in-situ detecting endpoint, optical-emission spectroscopy (OES) is used for in-situ endpoint detection for plasma etching. However, the sensitivity of OES is decreased if polymer is deposited on viewport or the proportion of exposed area on the wafer is too small. To overcome these problems, the endpoint was determined by impedance signal variation from I-V monitoring (VI probe) and self-plasma optical emission spectroscopy. In addition, modified principal component analysis was applied to enhance sensitivity for small area etching. As a result, the sensitivity of this method is increased about twice better than that of OES. From plasma impedance monitoring and self-plasma optical emission spectroscopy, properties of plasma and chamber are analyzed, and real-time endpoint detection is achieved.

• Laser Solutions
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• v.4 no.2
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• pp.29-38
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• 2001

A development of in-process and reliable monitoring system in laser materials processing is essential for successful applications toward the real industrial fields. It was known that optical signals induced by laser-matter interactions provide a good indication not only to monitor various defects but also to characterize and identify the process However there are still difficulties to implement the optical monitoring system in real fields since the system is susceptible to the spurious change of the signal affected by the variation of experimental conditions and environmental noises. In this article. a new type of optical monitoring technique named 'chromatic modulation technique' is described as a reliable, robust and sensitive monitor for the applications in laser materials processing in order to tackle the conventional problems in optical system.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2012.05a
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• pp.560-563
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• 2012

Hardware and software of optical network monitoring system for optical network installed in ship for providing massive information are designed and fabricated. And, we investigated whether the fabricated system will accurately monitoring three events of optical cable extension, macrobanding and ferrule dust, which are related with special situation of ship, or not through the experiment. We used the combined method of chained branch and dark fiber for designing and fabricating hardware of optical network monitoring system for optimal corresponding with network configuration in ship. And, we confirmed that the proposed system excellently trace within 5 m range of event point in all three cases by investigating each event experiments.