• Title/Summary/Keyword: Overlay error

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An Evaluation Model for Analyzing the Overlay Error of Computer-generated Holograms

  • Gan, Zihao;Peng, Xiaoqiang;Hong, Huajie
    • Current Optics and Photonics
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    • v.4 no.4
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    • pp.277-285
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    • 2020
  • Computer-generated holograms (CGH) are the core devices to solve the problem of freeform surface measurement. In view of the overlay error introduced in the manufacturing process of CGH, this paper proposes an evaluation model for analyzing the overlay error of CGH. The detection method of extracting CGH profile information by an ultra-depth of field micro-measurement system is presented. Furthermore, based on the detection method and technical scheme, the effect of overlay error on the wavefront accuracy of CGH can be evaluated.

An Optimal Orthogonal Overlay for Fixed MIMO Wireless Link (고정된 MIMO 환경에서의 최적의 직교 오버레이 시스템 설계)

  • Yun, Yeo-Hun;Cho, Joon-Ho
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.34 no.10C
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    • pp.929-936
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    • 2009
  • In this paper, we consider designing a multi-input multi-output (MIMO) overlay system for fixed MIMO wireless link, where a frequency flat narrowband channel is shared by multiple transmitter and receiver pairs. Assuming the perfect knowledge of the second-order statistics of the received legacy signals and the composite channels from the overlay transmitter to the legacy receivers, the jointly optimal linear precoder and decoder matrices of the MIMO overlay system is derived to minimize the total mean squared error (MSE) of the data symbol vector, subject to total average transmission power and zero interference induced to legacy MIMO systems already existing in the frequency band of interest. Furthermore, the necessary and sufficient condition for the existence of the optimal solution is also derived.

Overlay correction in sub-0.18${\mu}{\textrm}{m}$ metal layer photolithography process (0.18${\mu}{\textrm}{m}$이하 metal layer 사진공정에서의 overlay 보정)

  • 이미영;이홍주
    • Proceedings of the KAIS Fall Conference
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    • 2002.05a
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    • pp.106-108
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    • 2002
  • 반도체 physical layout design rule이 작아짐에 따라 Proximity effect와 overlay가 Pattern 구현에 크게 영향을 미치고 있다. Metal layer와 contact의 부족한 overlay margin으로 overlay 불량이 발생하고, 감소한 space margin으로 인해 bridge와 같은 문제가 나타난다. 따라서, resolution을 향상시키고, 최소한의 overlay margin을 확보함으로써 미세 pattern의 구현을 가능하게 한다. 이를 위해 OPC와 attPSM 같은 분해능향상기술이 사용된다. 그러나 attPSM의 사용은 원하지 않는 pattern이 생성되는 sidelobe와 같은 문제가 발생한다. 따라서 serial image simulation올 통해 추출한 rule을 rule-based correction에 적용하여 sidelobe현상을 방지한다. 그리고 overlay margin 부족으로 나타나는 문제는 metal layer와 contact overlap되는 영역의 line edge를 확장하고, rule checking을 통해 최소한의 space margin을 확보하여 해결한다 따라서 overlay error를 rule-based correction을 사용하여 효과적으로 방지한다.

Research for Adaptive DeadBand Control in Semiconductor Manufacturing (Adaptive DeadBand를 애용한 반도체공정 제어)

  • Kim Jun-Seok;Ko Hyo-Heon;Kim Sung-Shick
    • Journal of the Korea Safety Management & Science
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    • v.7 no.5
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    • pp.255-273
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    • 2005
  • Overlay parameter control of the semiconductor photolithography process is researched in this paper. Overlay parameters denote the error in superposing the current pattern to the pattern previously created. The reduction of the overlay deviation is one of the key factors in improving the quality of the semiconductor products. The semiconductor process is affected by numerous environment and equipment factors. Through process condition prediction and control, the overlay inaccuracy can be reduced. Generally, three types of process condition change exist; uncontrollable white noise, slowly changing drift, and abrupt condition shift. To effectively control the aforementioned process changes, control scheme using adaptive deadband is proposed. The suggested approach and existing control method are cross evaluated through simulation.

Reliable Overlay Multicast with Loosely Coupled TCP Connections

  • Kwon, Gu-In;Byers, John
    • Journal of Communications and Networks
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    • v.11 no.3
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    • pp.306-317
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    • 2009
  • We consider the problem of architecting a reliable content delivery system across an overlay network using TCP connections as the transport primitive. We first argue that natural designs based on store-and-forward principles that tightly couple TCP connections at intermediate end-systems impose fundamental performance limitations, such as dragging down all transfer rates in the system to the rate of the slowest receiver. In contrast, the ROMA architecture we propose incorporates the use of loosely coupled TCP connections together with fast forward error correction techniques to deliver a scalable solution that better accommodates a set of heterogeneous receivers. The methods we develop establish chains of TCP connections, whose expected performance we analyze through equation-based methods. We validate our analytical findings and evaluate the performance of our ROMA architecture using a prototype implementation via extensive Internet experimentation across the PlanetLab distributed testbed.

Motion Vector Based Overlay Metrology Algorithm for Wafer Alignment (웨이퍼 정렬을 위한 움직임 벡터 기반의 오버레이 계측 알고리즘 )

  • Lee Hyun Chul;Woo Ho Sung
    • KIPS Transactions on Software and Data Engineering
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    • v.12 no.3
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    • pp.141-148
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    • 2023
  • Accurate overlay metrology is essential to achieve high yields of semiconductor products. Overlay metrology performance is greatly affected by overlay target design and measurement method. Therefore, in order to improve the performance of the overlay target, measurement methods applicable to various targets are required. In this study, we propose a new algorithm that can measure image-based overlay. The proposed measurement algorithm can estimate the sub-pixel position by using a motion vector. The motion vector may estimate the position of the sub-pixel unit by applying a quadratic equation model through polynomial expansion using pixels in the selected region. The measurement method using the motion vector can calculate the stacking error in all directions at once, unlike the existing correlation coefficient-based measurement method that calculates the stacking error on the X-axis and the Y-axis, respectively. Therefore, more accurate overlay measurement is possible by reflecting the relationship between the X-axis and the Y-axis. However, since the amount of computation is increased compared to the existing correlation coefficient-based algorithm, more computation time may be required. The purpose of this study is not to present an algorithm improved over the existing method, but to suggest a direction for a new measurement method. Through the experimental results, it was confirmed that measurement results similar to those of the existing method could be obtained.

Performance Improvement of OFDM based DSRC System adopting Selective Pilot Overlay Channel Estimation Scheme (선택형 파일럿 중첩 채널예측기법을 적용한 OFDM 기반 DSRC 시스템의 성능개선)

  • Kwak, Jae-Min
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.10 no.10
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    • pp.1863-1868
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    • 2006
  • In this paper we propose the communication system model which improve the performance of OFDM based DSRC system by adopting selective pilot overlay channel estimation scheme. Assuming AWGN and fading channel environment, the performance of OFDM system according to IEEE802.11p physical layer being standardized for OFDM based DSRC is obtained, and the performance of proposed OFDM based DSRC system adopting selective pilot overlay channel estimation scheme is compared with the conventional system. from the simulation results, it is shown that proposed system is superior to conventional one due to reducing channel estimation error.

LED 광원을 이용한 OVERLAY 계측연구

  • Choe, Gyo-Hyeong;Kim, Geun-Nam;Lee, Jeong-Ho;Lee, Gi-Seop;Do, Byeong-Hun;Gang, Hyeon-Tae;Yu, Seong-Jae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.361-361
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    • 2010
  • 노광을 통해 형성되는 패턴 단위를 Shot이라 부르며, 이때 노광되는 각 Shot은 Wafer상에 이전 Layer에서 형성되어 있는 Shot 위에 정확히 중첩되어 형성 시켜야하며, 노광된 Shot이 중첩되어야 할 이전 Layer의 Shot에 대해 얼마만큼의 위치적 오차를 가지고 형성 되었는가 하는 것은 중첩위치오차 (Overlay Alignment Error)로 계측 된다. 이렇게 계측된 중첩위치오차는 현재 진행된 Lot에 대한 재 공정 필요 여부를 결정하거나 다음 Lot 공정을 진행할 때 각 Shot를 이전 Layer Shot에 정확히 중첩시키기 위해 얼마만큼의 위치 보정이 필요한지를 결정하는데 사용된다. 이처럼 Device Node의 Shrink로 인해 엄격한 허용도를 만족시키기 위해서는 Overlay 측정 정확도의 향상이 매우 중요해 지고 있다. 본 논문에서는 Halogen Lamp 대비 Led의 Light Intensity 부분에 대해 중점적으로 실험 하였으며, RBG Type의 Led는 Halogen Lamp Wavelength (광대역) 400nm ~ 800nm가 모두 포함된 White Light Source에서 특정한 단일파장대역 600nm ~ 650nm (가시광선 Led 영역)에서 계측하는 Layer에 대해 적용 가능성을 제시하였다.

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An Transport Layer Vertical Handover Approach for Video Services in Overlay Network Environments (오버레이 네트워크 환경에서 비디오 서비스를 위한 트랜스포트 계층에서의 수직 핸드오버 방안)

  • Chang, Moon-Jeong;Lee, Mee-Jeong
    • The KIPS Transactions:PartC
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    • v.14C no.2
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    • pp.163-170
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    • 2007
  • The next generation communication environment consists of various wireless access networks with distinct features that are configured as an overlay topology. In the network environments, the frequency of hand overs should be minimized and the error propagation should be solved in order to provide high-quality multimedia services to mobile users. Therefore, we propose an performance enhancement approach, based on mSCTP, that provides high quality multimedia services to mobile users by ameliorating the error propagation problem. We utilizes the following four functions: 1) the separation of transmission paths according to the types of frames. 2) retransmission strategy to minimize the loss rate of frames, 3) Foced vertical handover execution by utilizing bicasting, 4) using the stability period in order to reduce the effect of the ping pong phenomenon. The simulation results show that the proposed approach provides seamless multimedia service to mobile users by achieving error resilience.

Measurement and Compensation of Synchronization Error in Offset Printing Process (오프셋 인쇄에서의 동기화 오차 정밀 계측 및 보정 연구)

  • Kang, Dongwoo;Kim, Hyunchang;Lee, Eonseok;Choi, Young-Man;Jo, Jeongdai;Lee, Taik-Min
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.6
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    • pp.477-481
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    • 2014
  • Flexible electronics have been to the fore because it is believed that flexibility can add incredible value such as light weight and mobility into the existing electronic devices and create new markets of large-area and low-cost electronics such as wearable eletronics in near future. Offset printing processes are regarded as major candidates for manufacturing the flexible electronics because they can provide the patterning resolution of micron-size effectively in large-area. In view of mechanics, the most important viewpoint in offset printing is how to achieve the synchronized movement of two contact surfaces in order to prevent slip between two contact surfaces and distortion of the blanket surface during ink transfer so that the high-resolution and good-overlay patterns can be printed. In this paper, a novel low-cost measurement method of the synchronization error using the motor control output signals is proposed and the compensation method is presented to minimize the synchronization error.