• Title/Summary/Keyword: PIC-MCC

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Control of Plasma Characteristic to Suppress Production of HSRS in SiH4/H2 Discharge for Growth of a-Si: H Using Global and PIC-MCC Simulation

  • Won, Im-Hui;Gwon, Hyeong-Cheol;Hong, Yong-Jun;Lee, Jae-Gu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.312-312
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    • 2011
  • In SiH4/H2 discharge for growth process of hydrogenated amorphous silicon (a-Si:H), silane polymers, produced by SiH2 + Sin-1H2n ${\rightarrow}$ SinH2n+2, have no reactivity on the film-growing surface. However, under the SiH2 rich condition, high silane reactive species (HSRS) can be produced by electron collision to silane polymers. HSRS, having relatively strong reactivity on the surface, can react with dangling bond and form Si-H2 networks which have a close correlation with photo-induced degradation of a-Si:H thin film solar cell [1]. To find contributions of suggested several external plasma conditions (pressure, frequency and ratio of mixture gas) [2,3] to suppressing productions of HSRS, some plasma characteristics are studied by numerical methods. For this study, a zero-dimensional global model for SiH4/H2 discharge and a one-dimensional particle-in-cell Monte-Carlo-collision model (PIC-MCC) for pure SiH4 discharge have been developed. Densities of important reactive species of SiH4/H2 discharge are observed by means of the global model, dealing 30 species and 136 reactions, and electron energy probability functions (EEPFs) of pure SiH4 discharge are obtained from the PIC-MCC model, containing 5 charged species and 15 reactions. Using global model, SiH2/SiH3 values were calculated when pressure and driving frequency vary from 0.1 Torr to 10 Torr, from 13.56 MHz to 60 MHz respectively and when the portion of hydrogen changes. Due to the limitation of global model, frequency effects can be explained by PIC-MCC model. Through PIC-MCC model for pure SiH4, EEPFs are obtained in the specific range responsible for forming SiH2 and SiH3: from 8.75 eV to 9.47 eV [4]. Through densities of reactive species and EEPFs, polymerization reactions and production of HSRS are discussed.

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Mechanism of Striation in Plasma Display Panel Cell

  • Yang, Sung-Soo;Iza, Felipe;Kim, Hyun-Chul;Lee, Jae-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07a
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    • pp.167-170
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    • 2005
  • The mechanism of striation in the coplanar- and matrix-type plasma display panel (PDP) cells has been studied using the particle-in-cell Monte-Carlo Collision (PIC-MCC) model. The striation formation is related to the ionization energy of neutral atoms and the well-like deformation of space potential by space charge distribution. Negative wall charge accumulation by electrons on the MgO surface of the anode region is also one of the key factors for the formation of striation. The clearness of the striation phenomenon in PIC-MCC code in comparison with fluid code can be explained by using nonlocal electron kinetic effect.

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Study on target erosion in rocking magnet sputtering system

  • Lee, Do-Sun;Kwon, Ui-Hui;Lee, Won-Jong
    • Journal of the Korean Vacuum Society
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    • v.14 no.4
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    • pp.245-251
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    • 2005
  • A high performance dual rocking magnet sputtering gun has been developed. The rocking magnet sputtering gun introduces full-face erosion by rapidly rocking the magnet in the region where the high plasma density is maintained. The newly developed dual rocking magnet sputtering gun whose target utilization was 77 percent achieved high performance in quality in the view of target utilization and target life-time comparing to the existing magnetron sputtering gun. The PIC-MCC target erosion simulation has been performed simultaneously. Comparing experimental target erosion profiles with simulated target erosion profiles, the simulation could estimate the tendency of the target erosion profiles but could not estimate an exact target erosion profile. If the simulation were improved more precisely, the cost reduction for the development of the multiple rocking magnet sputtering gun would be expected.

Three-dimensional Self-consistent Particle-in-cell and Monte Carlo Collisional Simulation of DC Magnetron Discharges

  • Kim, Seong-Bong;Chang, Hyon-U;Yoo, Suk-Jae;Oh, Ji-Young;Park, Jang-Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.526-526
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    • 2012
  • DC magnetron discharges were studied using three-dimensional self-consistent particle-in-cell and Monte Carlo collisional (PIC-MCC) simulation codes. Two rectangular sputter sources (120 mm * 250 mm and 380 mm * 200 mm target sizes) were used in the simulation modeling. The number of incident ions to the Cu target as a function of position and simulation time was obtained. The target erosion profile was calculated by using the incident ions and the sputtering yields of the Cu target calculated with SRIM codes. The maximum ion density of the ion density distribution in the discharge was about $10^{10}cm^{-3}$ due to the calculation speed limit. The result may be less than one or two order of magnitude smaller than the real maximum ion density. However, the target erosion profiles of the two sputter sources were in good agreement with the measured target erosion profiles except for the erosion profile near the target surface, in which which the measured erosion width was broader than the simulation erosion width.

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A Two-Dimensional Particle-in-cell Simulation for the Acceleration Channel of a Hall Thruster

  • Lim, Wang-Sun;Lee, Hae-June;Lee, Jong-Sub;Lim, Yu-Bong;Seo, Mi-Hui;Choe, Won-Ho;Seon, Jong-Ho;Park, Jae-Heung
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2008.03a
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    • pp.557-560
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    • 2008
  • A two-dimensional particle-in-cell(PIC) simulation with a Monte-Carlo Collision(MCC) has been developed to investigate the discharge characteristics of the acceleration channel of a HET. The dynamics of electrons and ions are treated with PIC method at the time scale of electrons in order to investigate the particle transport. The densities of charged particles are coupled with Poisson's equation. Xenon neutrals are injected from the anode and experience elastic, excitation, and ionization collisions with electrons, and are scattered by ions. These collisions are simulated by using an MCC model. The effects of control parameters such as magnetic field profile, electron current density, and the applied voltage have been investigated. The secondary electron emission on the dielectric surface is also considered.

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Three-Dimensional Particle-in-cell Simulation of Electron Cyclotron Resonance Plasma with Belt-type Magnet Assembly

  • Lee, Hui Jea;Kim, Seong Bong;Yoo, Suk Jae;Cho, Moohyun;Namkung, Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.242.1-242.1
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    • 2014
  • The electron cyclotron resonance plasma source with a belt-type magnet assembly (BMA) is designed for effective plasma confinements. For characterizing the plasma source, the plasma parameters are measured by Langmuir probe. However, the plasma parameters and the motion of charged particles near the ECR zone are not easy to diagnostics, because of the high plasma density and temperature. Thus, as an alternative method, the electromagnetic simulation of the plasma source has been performed by using three-dimensional particle-in-cell and Monte Carlo collisional (PIC-MCC) simulation codes. For considering the limitation of simulation resources and time, the periodic boundary condition is applied and the coulomb collision is neglected. In this paper, we present the results of 3D PIC simulations of ECR plasmas with BMA and we compare them with the experimental results.

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Particle-in-Cell Simulation for the Control of Electron Energy Probability & Electron temperature of Dielectric Barrier Discharges at Atmospheric Pressure

  • Lee, Jung-Yel;Song, In-Cheol;Lee, Ho-Jun;Lee, Hae-June
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.528-528
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    • 2012
  • Recently, atmospheric pressure plasmas attract lots of interests for the useful applications such as surface modification and bio-medical treatment. In this study, a particle-in-cell Monte Carlo collision (PIC-MCC) simulation was adopted to investigate the discharge characteristics of a planar micro dielectric barrier discharge (DBD) with a driving frequency from 13.56 MHz to 162.72 MHz and with a gap distance of 80 micrometers. The variation of frequency, in the change in the electron energy probability function (EEPF). Through the relation between the ion trajectories and the frequency, results in the change of EEPFs is achievable with the turning point of frequency mode. Therefore, it is possible to categorize the efficient operation range of DBDs for its applications by controlling the interactions between plasmas and neutral gas for the generation of preferable radicals.

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Numerical Analysis of Discharge in Wire ion Plasma Source (입자법을 이용한 와이어.이온.플라즈마원의 해석)

  • 송태헌;고광철;강형부
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.369-372
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    • 1997
  • Wire Ion Plasma Source (WIPS) is a plasma device which has a thin wire anode, a coaxially-set cylindrical cathode and electrodes located in both ends of the cylinder. The potential between the anode and cathode changes logarithmically by this electrode configuration. This electrode configuration enables high-density plasma to produce even at a low anode voltage. Since the electrode configuration is axially symmetric and long. plasma with axially uniform number density can be produced. Using particle-in-cell(PIC) and Monte Carlo collision(MCC), we investigate the traiectory of electrons and the characteristics of D.C. discharge in Wire ton Plasma Source.

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3D Plasma simulation을 이용한 Cylindrical Rotating Magnetron Sputtering Cathode 개발

  • Cheon, Yong-Hwan;O, Ji-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.179.1-179.1
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    • 2013
  • Cylindrical Rotating Magnetron Sputtering Cathode (이하 Rotary Cathode)는 기존에 사용 되던 rectangular type 보다 Target 사용 효율이 높다는 큰 이점을 가지고 있다. 높은 Target 사용 효율은 비용 절감 효과와 직접적으로 관련 된다. 이번 연구는 3D Plasma simulation(PIC-MCC)을 통한 Target 사용 효율 80% 이상의 Rotary Cathode 개발을 목적으로 한다. Plasma simulation에 External Magnetic fields를 접목하여 Electron의 이동 궤적을 제어하였고, 생성된 Ion (Ar+)의 밀도 및 속도로 Plasma의 안정성과 Erosion 계산 구간을 선정 하였다. Target Erosion Profile은 Sputtering yield Data와 Target에 충돌한 Ion 정보를 사용하여 산출 하였으며, Sputtered Particles의 Deposition Profile은 계산된 Target Erosion Profile과 The cosine law of emission을 이용하여 계산 하였다. 실험 조건은 Plasma simulation의 초기조건 바탕으로 하여 2G size의 ITO Target을 대상으로 실험 하였다. 비 Erosion 영역 최소화하기 위해 Magnet Length를 변경하여 제작 적용 하였다. Simulation 계산 시간의 제약으로 인하여 simulation에서 생성된 최대 이온 밀도는 일반적으로 알려진 값 보다 적게 계산 되었지만, Simulation으로 예측한 Erosion Profile 및 Deposition Profile은 실험 값과 유사한 형태를 나타났으며, 실험 결과는 Target 사용 효율 80%이상의 결과를 보였다.

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