• Title/Summary/Keyword: PL intensity

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Probeless Estimation of Electroluminescence Intensities Based on Photoluminescence Measurements of GaN-Based Light-Emitting Diodes

  • Kim, Jongseok;Jeong, Hoon;Choi, Won-Jin;Jung, Hyundon
    • Current Optics and Photonics
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    • v.5 no.2
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    • pp.173-179
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    • 2021
  • The electroluminescence (EL) intensities of GaN-based light-emitting diodes (LEDs) are estimated based on their photoluminescence (PL) properties. The PL intensity obtained under open-circuit conditions is divided into two parts: the PL intensity under a forward bias lower than the optical turn-on voltage, and the difference between the PL intensities under open-circuit conditions and under forward bias. The luminescence induced by photoexcitation under a constant forward bias lower than the optical turn-on voltage is primarily the PL from the excited area of the LED. In contrast the intensity difference, obtained by subtracting the PL intensity under the forward bias from that under open-circuit conditions, contains the EL induced by the photocarriers generated during photoexcitation. In addition, a reverse photocurrent is generated during photoexcitation under constant forward bias across the LED, and can be correlated with the PL-intensity difference. The relationship between the photocurrent and PL-intensity difference matches well the relationship between the injection current and EL intensity of LEDs. The ratio between the photocurrent generated under a bias and the short-circuit current is related to the ratio between the PL-intensity difference and the PL intensity under open-circuit conditions. A relational expression consisting of the ratios, short-circuit current, and PL under open-circuit conditions is proposed to estimate the EL intensity.

Temperature Dependence of Photoluminescence in $SiO_2$ (실리콘산화막의 광루미니센스 온도의존성에 관한 연구)

  • 이재희
    • Journal of the Korean Vacuum Society
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    • v.10 no.2
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    • pp.247-251
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    • 2001
  • Photoluminescence(PL) were observed from room temperature to 8K on $Si^+$-implanted silicon-oxide films. The PL intensities are increased from room temperature to 50~80K and decreased below 50K. The blue-shift occurs during the increasing of PL intensity. Also, temperature-dependent PL were measured at peak wavelengths. The first peak is the most sensitive to the measuring temperature. The experimental results are explained by quantum size effect of O rich defects or(and) Si rich defects rather than nanocrystal silicon.

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Effects of Lattice Mismatch on Photoluminescence Efficiency of InGaAsP/InP Heterostructures (InGaAsP/InP이종접합구조의 격자부정합이 Photoluinescence효율에 미치는 영향)

  • Lee, Jong-Won
    • Korean Journal of Materials Research
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    • v.4 no.5
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    • pp.516-523
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    • 1994
  • The interfacial coherency of metal organic chemical vapor deposition grown InGaAsP/InP heterostructure wafers was examined and their influences on the optoelectronic properties were investigated in this study. (400) symmetric and (511) asymmetric reflections were employed to measure the lattice coherency. Existence of misfit dislocations was examined by x-ray topography and reverified by photoluminescence (PL) imaging. PI, measurements were performed, and higher PL intensity was obtained for elastically strained samples and lower intensity for plastically deformed samples. The highest PL intensity was obtained for the sample lattice matched at the growth temperature. PL full-width at half maximum (FWHM) was found to depend on the degree of lattice mismatch. A correlatior between x-ray FWHM and PL intensity was empirically established. The results presented demonstrate that the interfacial coherency is of primary significance in affecting the optoelectronic properties through elastic strain and plastic deformation.

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Dependence of Thermal Annealing Conditions on Photoluminescence in $SiO_2$ films

  • Lee, Jae-Hee;Lee, Weon-Sik;Kim, Kwang-Il
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.102-102
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    • 1999
  • Visible photoluminescence(PL) in si-implanted SiO2 films on crystaline silicon were observed. Thermal oxide films of 1 ${\mu}{\textrm}{m}$ thickness on P-type crystal silicon were made and si+ ions were implanted with 200keV acceleration voltage on ti. Argon laser (wavelength 488nm) and PM tube were used for PL measurements. As annealing time increased at low temperature, the visible PL intensity are increased and the peak positions are changed. On the other hand, with increasing annealing time at high temperature, the visible PL intensity are disappeared. From the PL peaks and intensity changes, XRD results, and TEM observations, we will discuss the origin of PL in Si+-implanted SiO2 films with oxygen righ defects and silicon rich defects.

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Silica-encapsulated ZnSe Quantum Dots as a Temperature Sensor Media (온도센서용 실리카에 담지된 ZnSe 양자점 소재)

  • Lee, Ae Ri;Park, Sang Joon
    • Applied Chemistry for Engineering
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    • v.26 no.3
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    • pp.362-365
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    • 2015
  • Silica encapsulated ZnSe quantum dots (QDs) were prepared by employing two microemulsion systems: AOT/water/cyclohexane microemulsions containing ZnSe quantum dots with NP5/water/cyclohexane microemulsions containing tetraethylorthosilicate (TEOS). Using this method, cubic zinc blende nanoparticles (3 nm in diameter) were synthesized and encapsulated by silica nanoparticles (20 nm in diameter). The temperature dependence of photoluminescence (PL) for silica-encapsulated ZnSe QDs was investigated to evaluate this material as a temperature sensor media. The fluorescence emission intensity of silica-encapsulated ZnSe nanoparticles (NPs) was decreased with an increase of ambient temperature over the range from $30^{\circ}C$ to $60^{\circ}C$ and a linear relationship between the temperature and the emission intensity was observed. In addition, the temperature dependence of PL intensity for silica-encapsulated ZnSe NPs showed a reversible pattern on ambient temperature. A reversible temperature dependence of the luminescence combined with its insensitivity toward quenching by oxygen due to silica coating established this material as an attractive media for temperature sensor applications.

Strong Red Photoluminescence from Nano-porous Silicon Formed on Fe-Contaminated Silicon Substrate

  • Kim, Dong-Lyeul;Lee, Dong-Yul;Bae, In-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.5
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    • pp.194-198
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    • 2004
  • The influences of the deep-level concentration of p-type Si substrates on the optical properties of nano-porous silicon (PS) are investigated by deep level transient spectroscopy (DLTS) and photoluminescence (PL). Utilizing a Si substrate with Fe contaminations significantly enhanced the PL intensity of PS. All the PS samples formed on Fe-contaminated silicon substrates had stronger PL yield than that of reference PS without any intentional Fe contamination but the emission peak is not significantly changed. For the PS 1000 sample with Fe contamination of 1,000 ppb, the maximum PL intensity showed about ten times stronger PL than that of the reference PS sample. From PL and DLTS results, the PL efficiency strongly depends on the Fe-related trap concentration in Si substrates.

The Effect of Pretreatment of Raw Powders on the Photoluminescence of Ca-α-SiAlON:Eu2+ Phosphor

  • Park, Young-Jo;Kim, Jin-Myung;Lee, Jae-Wook
    • Journal of the Korean Ceramic Society
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    • v.51 no.5
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    • pp.413-417
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    • 2014
  • The effect of calcination treatment of raw powders prior to high temperature synthesis of Ca-${\alpha}$-SiAlON:$Eu^{2+}$ phosphor was investigated. Based on data acquired from thermogravimetric analysis, calcination temperatures were set at 600, 750, and $900^{\circ}C$. Compared to the photoluminescence (PL) intensity of direct synthesis without calcination, a similar intensity was found for the $600^{\circ}C$ treatment, a 19% increased PL intensity was found for the $750^{\circ}C$ treatment, and a 23% decreased PL intensity was found for the $900^{\circ}C$ treatment. Observation of the particle morphology of the synthesized phosphors revealed that the material transport promoted through the agglomerates formed by the $750^{\circ}C$ treatment led to enhanced PL intensity. On the other hand, the oxidation of the starting AlN particles during the $900^{\circ}C$ treatment resulted in decreased photoluminescence.

Comparison of Blue Luminescence Between Spark-processed Photoluminescian Silicon and Ambient Air Aged Anodically Etched Porous Silicon

  • Chang, Sung-Sik;Yoon, Sang-Ok
    • The Korean Journal of Ceramics
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    • v.2 no.3
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    • pp.137-141
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    • 1996
  • Ambient air aged anodically etched porous silicon (PS) and spark-processed silicon (sp-Si) show interesting similarities and dissimilarities in some of their luminescence-related properties. Among these similarties are: (1) the photoluminescence (PL) peak maximum in the blue/violet (410 nm);(2) the blue/violet PL peak positions are essentially unchanged with temperature ; (3) PL decay times in the nanosecond region which are independent of the detection wavelength, which is much faster in decay times compared to that of observed decay time in $SiO_2$.Among the dissimilarities are: (1) the PL intensity of blue/violet luminescence, namely, the PL intensity of sp-Si is at least 2 orders of magnitude larger than that of an ambient air aged PS; (2) the blue/violet PL intensity of sp-Si is more stable than that of ambient air aged PS under UV illuminations; (3) FTIR spectra of sp-Si favor those modes, which involve silicon -oxygen bonds in $SiO_2$ stoichiometry, whereas ambient air aged PS can be considered as a nonstoichiometric oxide judging from the observed vibrational spectra.

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Effects of Carrier Leakage on Photoluminescence Properties of GaN-based Light-emitting Diodes at Room Temperature

  • Kim, Jongseok;Kim, Seungtaek;Kim, HyungTae;Choi, Won-Jin;Jung, Hyundon
    • Current Optics and Photonics
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    • v.3 no.2
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    • pp.164-171
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    • 2019
  • Photoluminescence (PL) properties of GaN-based light-emitting diodes (LEDs) were analyzed to study the effects of carrier leakage on the luminescence properties at room temperature. The electrical leakage and PL properties were compared for LEDs showing leakages at forward bias and an LED with an intentional leakage path formed by connecting a parallel resistance of various values. The leakages at the forward bias, which could be observed from the current-voltage characteristics, resulted in an increase in the excitation laser power density for the maximum PL efficiency (ratio of PL intensity to excitation power) as well as a reduction in the PL intensity. The effect of carrier leakages on PL properties was similar to the change in PL properties owing to a reduction of the photovoltage by a reverse current since the direction of the carrier movement under photoexcitation is identical to that of the reverse current. Valid relations between PL properties and electrical properties were observed as the PL properties deteriorated with an increase in the carrier leakage. The results imply that the PL properties of LED chips can be an indicator of the electrical properties of LEDs.

Encapsulated Silicon Nanocrystals Formed in Silica by Ion Beam Synthesis

  • Choi, Han-Woo;Woo, Hyung-Joo;Kim, Joon-Kon;Kim, Gi-Dong;Hong, Wan-Hong;Ji, Young-Yong
    • Bulletin of the Korean Chemical Society
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    • v.25 no.4
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    • pp.525-528
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    • 2004
  • The photoluminescence (PL) emission of Si nanocrystals synthesized by 400 keV Si ion implanted in $SiO_2$ is studied as a function of ion dose and annealing time. The formation of nanocrystals at around 600 nm from the surface was confirmed by RBS and HRTEM, and the Si nanocrystals showed a wide and very intense PL emission at 700-900 nm. The intensity of this emission showed a typical behaviour with a fast transitory increase to reach a saturation with the annealing time, however, the red shift increased continuously because of the Ostwald ripening. The oversaturation of dose derived a decrease of PL intensity because of the diminishment of quantum confinement. A strong enhancement of PL intensity by H passivation was confirmed also, and the possible mechanism is discussed.