• Transactions on Electrical and Electronic Materials
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• 제14권2호
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• pp.86-89
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• 2013

Dye-sensitized solar cells have a FTO/$TiO_2$/Dye/Electrode/Pt counter electrode structure, yet more than a 10% electron loss occurs at each interface. A passivating layer between the $TiO_2$/FTO glass interface can prevent this loss of electrons. In theory, ZnO has excellent electron collecting capabilities and a 3.4 eV band gap, which suppresses electron mobility. FTO glass was coated with ZnO thin films by RF-magnetron sputtering; each film was deposited under different $O_2$:Ar ratios and RF-gun power. The optical transmittance of the ZnO thin film depends on the thickness and morphology of ZnO. The conversion efficiency was measured with the maximum value of 5.22% at an Ar:$O_2$ ratio of 1:1 and RF-gun power of 80 W, due to effective prevention of the electron recombination into electrolytes.

• The Korean Journal of Ceramics
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• 제1권3호
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• pp.160-164
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• 1995

Mechanical and chemical tests were performed on $Zro_2 \cdot SiO_2$ glass fibers manufactured by the sol-gel method and E-glass fibers-reinforced cement composites in order to investigate the interactions between glass fibers and cement matrices. Chemical attack leads to corrosion of the glass fiber surfaces. In the corrosion reactions, the surface of $30ZrO_2 \cdot 70 SiO_2$ glass fibers developed a densified concentric layer, which consists of glass corrosion products with much higher Zr and lower Si than the fresh glass fiber. The layer of reaction product is regarded to stiffen the cement matrices and provide a useful improvement to the mechanical properties. The addition of $ZrO_2$ content increases the corrosion resistance of glass fibers in cement by forming a passivating layer on the surface of glass fibers.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2007년도 추계학술대회 논문집
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• pp.323-323
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• 2007

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.347.2-347.2
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• 2016

Recently, in order to improve the performance of the colloidal quantum dot solar cells (CQDSCs), various efforts such as the modification of the cell architecture and surface treatment for quantum dot (QD) passivation have been made. Especially, the incorporation of halides into the QD matrix was reported to improve the performances significantly via passivating QD trap states that lower the life-time of the minority-carrier. In this work, we fabricated a lead sulfide (PbS) QD bilayer treated with different ligands and utilized it as a photoactive layer of the CQDSCs. The bottom and top PbS layer was treated using metal iodide ($MI_x$ and butanedithiol (BuDT), respectively. All the depositions and ligand treatments were carried out in air using layer-by-layer spin-coating process. The fabrication of the active layers as well as the n-type zinc oxide (ZnO) layer was successfully carried out on the bendable indium-tin-oxide (ITO)-coated polyethylene terephthalate (PET) substrate, which implies that this technique can be applied to the fabrication of flexible and/or wearable solar cells. The power conversion efficiency (PCE) of the CQDSCs with the architecture of $PET/ITO/ZnO/PbS-MI_x/PbS-BuDT/MoO_x/Ag$ reached 4.2 %, which is significantly larger than that of the cells with single QD (PbS-BuDT) layer.

• 한국전기전자재료학회논문지
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• 제26권1호
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• pp.18-21
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• 2013

$SiO_2$ layer grown by rapid thermal oxidation and $SiN_x$ layer were used for passivating the surface of n-type silicon solar cell, instead of only $SiN_x$ layer generally used in photovoltaic industry. The rapid thermal oxidation provides the reduction of processing time and avoids bulk life time degradation during the processing. Improvement of 30 mV in Voc and $2.7mA/cm^2$ in Jsc was obtained by applying these two layers. This improvement led to fabrication of a large area ($239cm^2$) n-type solar cell with 17.34% efficiency. Internal quantum efficiency measurement indicates that the improvement comes from the front side passivation, but not the rear side, by using $SiO_2/SiN_x$ stack.

• 자원리싸이클링
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• 제16권3호
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• pp.44-49
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• 2007

본 연구는 고온 산소가압 하에서의 황동광(칠레산 에스콘디다광석) 황산침출에 관한 연구로 침출시간, 침출온도, 산소압력에 따른 Cu 침출율 및 침출거동에 대하여 고찰하였다. 침출온도가 Cu의 침출율에 미치는 영향이 가장 켰으며, 산소압력은 큰 영향을 미치지 않았다. 침출온도 $200^{\circ}C$, 산소압력 10 atm인 조건으로 2시간 침출하여 87.1%의 Cu를 침출하였으며, 이 때 함께 침출된 Fe는 대부분 hematite($Fe_2O_3$) 형태로 재침전이 일어났다. 산소가압 하에 고온($150^{\circ}C$ 이상) 침출조건에서 황동광 침출반응은 주로 산소의 산화작용에 의한 분해인 것을 확인하였으며, 황은 대부분 황산염 형태로 산화되어 단체황 생성으로 인한 passivating 현상은 일어나지 않은 것으로 사료된다.

• 한국정밀공학회지
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• 제22권12호
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• pp.163-169
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• 2005

Micro hole is ode of basic elements for micro device or micro parts. Micro electrochemical machining (ECM) can be applied to the machining of micro holes less than 50 ${\mu}m$ in diameter, which it is not easy to apply other techniques to. For the machining of passivating metals such as stainless steel, machining conditions should be chosen carefully to prevent a passive layer. The machining conditions also affect the machining resolution, In this paper, machining characteristics of micro ECM were investigated according to machining conditions such as electrolyte concentration and pulse conditions. From the investigation, optimal machining conditions were suggested for micro ECM of stainless steel.

• 한국전기전자재료학회논문지
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• 제36권3호
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• pp.233-240
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• 2023

p-type Tunnel Oxide Passivating Contacts (TOPCon) solar cell is fabricated with a poly-Si/SiO_x structure. It simultaneously achieves surface passivation and enhances the carriers' selective collection, which is a promising technology for conventional solar cells. The quality of passivation is depended on the quality of the tunnel oxide layer at the interface with the c-Si wafer, which is affected by the bond of SiO formed during the subsequent annealing process. The highest cell efficiency reported to date for the laboratory scale has increased to 26.1%, fabricated by the Institute for Solar Energy Research. The cells used a p-type float zone silicon with an interdigitated back contact (IBC) structure that fabricates poly-Si and SiO_x layer achieves the highest implied open-circuit voltage (iV_oc) is 750 mV, and the highest level of edge passivation is 40%. This review presents an overview of p-type TOPCon technologies, including the ultra-thin silicon oxide layer (SiO_x) and poly-silicon layer (poly-Si), as well as the advancement of the SiO_x and poly-Si layers. Subsequently, the limitations of improving efficiency are discussed in detail. Consequently, it is expected to provide a basis for the simplification of industrial mass production.

• E2M - 전기 전자와 첨단 소재
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• 제10권5호
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• pp.473-480
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• 1997

Surface passivation using glass powders results in good reliability for high voltage silicon power devices. In this paper Zinc borosilicate glass and Lead borosilicate glass were prepared for the purpose of passivating, and a deposition technique of glass films on the silicon surface by electrophoresis in which acetone is used as a suspension medium has been investigated. Their physical properties were compared using DTA, SEM, XRD, as a function of firing temperature, I can get the fine films of 22${\mu}{\textrm}{m}$ thickness with Lead borosilicate glass under 300 volts applied, 3 minutes and $700^{\circ}C$ firing temperature. Also I can get the fine films of 17${\mu}{\textrm}{m}$ thickness with Zinc borosilicate glass under same conditions. As a result of investigation of glass films from which glass layer was removed by placing it in HCl, it has been found that pre-firing and annealing play an important role to achieve uniform and fine glass deposition films. And also it was found that relative dielectric constant is independence of frequency.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제55권12호
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• pp.565-569
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• 2006

Plasma enhanced chemical vapor deposition(PECVD) is a well established technique for the deposition of hydrogenated film of silicon nitride (SiNx:H), which is commonly used as an antireflection coating as well as passivating layer in crystalline silicon solar cell. PECVD-SiNx:H films were investigated by varying the deposition and annealing conditions to optimize for the application in silicon solar cells. By varying the gas ratio (ammonia to silane), the silicon nitride films of refractive indices 1.85 - 2.45 were obtained. The film deposited at $450^{\circ}C$ showed the best carrier lifetime through the film deposition rate was not encouraging. The film deposited with the gas ratio of 0.57 showed the best carrier lifetime after annealing at a temperature of $800^{\circ}C$. The single crystalline silicon solar cells fabricated in conventional industrial production line applying the optimized film deposition and annealing conditions on large area substrate of size $125mm{\times}125mm$ (pseudo square) was found to have the conversion efficiencies as high as 17.05 %. Low cost and high efficiency silicon solar cells fabrication sequence has also been explained in this paper.