• 정보저장시스템학회논문집
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• 제5권2호
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• pp.58-63
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• 2009

This paper describes the effects of slider behavior over patterned media. The flying characteristics of a slider over patterned media are different from slider flying behavior over conventional plane disk. In order to perform the most realistic simulation of slider flying characteristics over patterned disk surfaces, our simulation approach virtually distributes the grooves on the slider ABS instead of on the disk surface. Also, we define SSFA which is steady-state slider flying attitude. The results show that the more patterned size is small and height is large, the more increased SSFA is. Also if patterned distance is small, then SSFA is increased. In addition, we analyzed the effects of patterned shapes.

• 정보저장시스템학회논문집
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• 제3권3호
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• pp.149-153
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• 2007

Perpendicular patterned magnetic media have been regarded as a prime candidate to achieve an ultra-high magnetic recording density of over 1 Tera-bits/$inch^2$. Patterned magnetic media with nanoscale patterns have been fabricated using various nanopatterning technologies. We focused on the two technical issues of nanoinjection molding technology. Firstly, we have investigated a cost-effective method to fabricate metallic stamps. Secondly, we focused on the analysis of nanoinjection molding with passive heating, where the replication of 50 nm nanopillar arrays was successful. The effect of the thermal insulation layer on the replication quality was examined by analytical and experimental methods. Finally, we deposited a magnetic layer on a injection molded nanopillars and measured. Our methodology can provide cost-effective mass-production for patterned magnetic media.

• 정보저장시스템학회논문집
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• 제3권2호
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• pp.86-93
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• 2007

In this paper we explain why future probe storage systems will use patterned media. As a model system, magnetic patterned media will be discussed, even though their data density is limited to about $7Tbit/in^2$. The first results on magnetic probe storage on patterned media are presented, and the problem of switching field distribution is discussed in detail. Finally we will present the first steps into two-dimensional coding for patterned media.

• 정보저장시스템학회논문집
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• 제1권2호
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• pp.192-196
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. The nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. In nano-injection molding process, since the solidified layer, generated during the polymer filling, deteriorates transcribability of nano patterns by preventing the polymer melt from filling the nano cavities, an injection-mold system was constructed to actively control the stamper surface temperature using MEMS heater and sensors. The replicated polymeric patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth. The replicated polymeric patterns can be applied to high density patterned media.

• 소성∙가공
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• 제14권9호통권81호
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• pp.741-750
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• 2005

• 소성∙가공
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• 제14권7호
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• pp.624-627
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by I-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50nm in diameter, 150nm in pitch, and 50nm in depth.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 춘계학술대회 논문집
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• pp.60-63
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• 2005

In this paper, we investigated the possibility of replicating patterned media by nano-injection molding process with a metallic nano-stamper. The original nano-master was fabricated by E-beam lithography and ICP etching process. The metallic nano-stamper was fabricated using a nanoimprint lithography and nano-electroforming process. Finally, the nano-patterned substrate was replicated using a nano-injection molding process without additional etching process. The replicated patterns using nano-injection molding process were as small as 50 nm in diameter, 150 nm in pitch, and 50 nm in depth.

• 한국통신학회논문지
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• 제38A권9호
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• pp.739-743
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• 2013

본 논문에서는 비트 패턴드 자기기록 저장장치 채널을 위한 2차원 변조부호를 제안한다. 패턴드 미디어 기록장치는 하나의 자성점에 한 비트의 정보를 저장한다. 정보저장 기록 밀도를 높이기 위하여 인접한 트랙 사이의 간격을 아주 좁게 만들기 때문에 인접한 트랙간 간섭(intertrack interference, ITI)과 인접한 심볼간 간섭(intersymbol interference, ISI)이 문제가 된다. 따라서 한 비트 신호의 진폭은 2차원 간섭에 의해 변형된다. 같은 값으로 둘러싸인 비트의 신호가, 특히 어느 한 비트의 값이 둘러싸인 여덟 비트의 값과 동일한 경우 영향을 받는다. 제안된 변조부호 방법은 기존의 변조부호보다 좋은 부호율을 가지면서 위와 같은 최악의 경우가 발생하지 않도록 하므로써 패턴드 미디어의 기록 성능을 향상시키도록 한다.

• 정보저장시스템학회논문집
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• 제3권3호
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• pp.144-148
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• 2007

In this paper, we analyzed the effect of the pattern height on the readback signal characteristics of the magnetic nanopillar tops and trench bottoms. In addition, we discuss the applicability of the present method to the production of patterned magnetic media, which can be obtained by depositing magnetic thin films on the molded nanopillars with passive heating. We found that the individual magnetic island deposited on each molded nanopillars with passive heating is a single magnetic domain and confirmed that its magnetization can be successfully reversed by applying an external magnetic field.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2010년도 임시총회 및 하계학술연구발표회
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• pp.70-71
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• 2010

In this study, We fabricated FePt-based perpendicular patterned media using a selective combination of E-beam lithography and either Ar plasma etching (deposition-first process) or FePt lift-off (deposition-last process). We employed the deposition-last process to avoid chemical and structural disordering by impinging Ar ions (deposition-first process). For a patterned medium with 100 nm patterns made by this process, the out-of-plane coercivity was measured to be 5 fold larger than its in-plane value. The deposition-last process may be a promising way to achieve ultra-high density patterned media.