• Macromolecular Research
• /
• v.12 no.4
• /
• pp.391-398
• /
• 2004

Thick-film photolithography is a new technology that combines lithography processes, such as exposure and development, with the conventional thick-film process applied to screen-printing. In this study, we developed a low-temperature cofireable silver paste applicable for thick-film processing to form fine lines using photolitho-graphic technologies. The optimum paste composition for forming fine lines was investigated. The effect of processing parameters, such as the exposing dose, had on the fine-line resolution was also investigated. As the result, we found that the type of polymer and monomer, the silver powder loading, and the amount of photoinitiator were the main factors affecting the resolution of the fine lines. The developed photoimageable silver paste was printed on a low-temperature cofireable green sheet, dried, exposed, developed in an aqueous process, laminated, and then fired. Our results demonstrate that thick-film fine lines having widths < 20 $\mu\textrm{m}$ can be obtained after cofiring.

• Journal of the Microelectronics and Packaging Society
• /
• v.18 no.4
• /
• pp.63-70
• /
• 2011

Anorthite forming glass frits in amounts up to 25 vol% of the silver powder were added to improve the adhesion between the conductor pattern formed by thick film photoimageable process and the low temperature co-fired ceramics (LTCC) substrate. The sheet resistance of the conductor pattern was raised from 0.13 ${\Omega}/{\square}$ to 2.25 ${\Omega}/{\square}$ as the volume percentage of glass frit increased up to 25 vol%. The adhesion strength was improved with this glass frit increase, but it decreased when the glass content exceeded 20 vol% which are possibly attributed to the liquid pool effect and the reduced fracture toughness in the interface between conductor and LTCC layer. The shrinkage of the width of the conductor pattern decreased with the addition of glass contents.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2008.11a
• /
• pp.208-208
• /
• 2008

Micro patterning of conductor line/space on LTCC green sheet in the LTCC module is an important process for miniaturization in 3D integrated circuits. This work presented the effect of inorganic binders on the microstructure, adhesion, electrical resistivity, shrinkage and line/space resolution, which is a part of study in photoimageable conductor paste. The photoimageable conductor paste contains silver powder, polymer binder, monomer, photo-initiator, UV absorber, and solvent. The inorganic binders were furnished with varied weight percentage of anorthite, diopside and MLS-62 glass frits from 0% to 7%. The Line/space sizes thus obtained was under 25 micron.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2006.06a
• /
• pp.228-229
• /
• 2006

본 연구에서는 PCB에 적용하기 위한 폴리머 타입 후막저항의 하나로서, 포토공정으로 저항 패턴의 형성이 가능한 페이스트를 제조하였다. 기존의 폴리머 후막저항은 스크린 인쇄를 패터닝의 주요 방법으로 하고 있어 패턴의 정밀성이 떨어지는 단점이 있었다. 이를 개선하여 고정밀 저항 패턴의 형성이 가능하도록 Photoimageable Resin을 저항 페이스트의 개발에 도입하였다. Acrylated oligomer 및 monomer, 그리고 Novolac Epoxy를 주 기지상 재료로서 사용하였으며, acrylate와 epoxy의 함량비에 따른 저항 페이스트의 현상성 및 시트저항을 평가하였다. 전도성 Filler 재료로 카본블랙을 이용하였는데, 그 물리적 특성차와 함량이 저항 페이스트의 현상성과 저항값에 미치는 영향을 평가하였다. 실험결과 Acrylate와 epoxy의 비가 2.5:1일 때 현상성이 가장 양호하였으며, 이 조성에 XC72R 카본블랙을 2g 첨가하였을 때 시트저항의 평균값은 약 $6\;k{\Omega}\{\square}$였다.

• Journal of the Microelectronics and Packaging Society
• /
• v.8 no.3
• /
• pp.69-75
• /
• 2001

Photoimageable thick film technology is a new technology in that the lithography process such as exposure and development is applied to the conventional thick film process. Line resolution of 25 $\mu\textrm{m}$ width and 25 $\mu\textrm{m}$ space could be obtained by laminating green sheet, printing photoimageable Ag paste, exposing the test patterns, developing, and co-firing. In case of using the alumina substrate, 20 $\mu\textrm{m}$ fine line could be also obtained by similar process. Test results showed that exposing power density and developing time were the most important processing parameters for the fine line formation. Microstrip and series gap resonators with well-defined line morphology and good transmission characteristics in high frequency were formed by this new technology, and thereby dielectric constant and loss of test substrate were calculated.

• Proceedings of the International Microelectronics And Packaging Society Conference
• /
• 2001.07a
• /
• pp.151-156
• /
• 2001

Using the photoimageable thick film conductors, $25\mu\textrm{m}$ line widths and $25\mu\textrm{m}$ spaces can be obtained. Test patterns are made by green tape lamination, paste printing, exposing to UV light, developing in an aqueous process and cofiring. Postfiring method using alumina substrate can be also applied to fine line formation. Series gap resonator formed by photopatterning process showed the improved signal transmission characteristics compared to that obtained by conventional screen printing.

• Journal of the Korean Ceramic Society
• /
• v.45 no.11
• /
• pp.739-743
• /
• 2008

Microfluidic device can be applied in a wide range of chemical and biological technology. In this paper, ceramic-based T-type passive mixers for microfluidic applications were fabricated by LTCC process combined with thick film photolithography. The base ceramic material in thick film was amorphous cordierite $((Mg,Ca)_2Al_4Si_5O_{18})$ and photoimageable polymers were added to give a photosensitivity. Two types of passive mixer, which showed the channel width of 1.0 mm and $200{\mu}m$, respectively, were designed considering mixing efficiency in the channel and their microfluidic properties were discussed in detail.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2007.06a
• /
• pp.303-303
• /
• 2007

Photo-imageable thick-film lithography technology was developed for the fabrication of embedded passives such as inductors and capacitors. In this study, photo-imageable dielectric and conductor pastes have apoted a negative type. Sodalime glass wafer, alumina substrate and zero-shrinkage LTCC green tapes were used as substrates. In result, The lithographic patterns were designed as lines and spaces for conductor material, or via-holes for ceramic, LTCC, materials. The scattering and reflection of UV-beam on the substrate had negative effects on fine patterning. The patterning performance was varied with the exposing and developing process conditions, and also varied with the substrate materials. Fine resolution of less then $50/50{\mu}m$ in line and space was obtained, which is difficult in screen printing method.