• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.492-492
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• 2012

RF biased inductively coupled plasma (ICP) has been widely used in various semiconductor etching processes and laboratory plasma researches. However, almost researches for the RF bias have been focused on the controls of dc self-bias voltages, even though the RF bias can change plasma parameters, such as electron temperature, plasma density, electron energy distribution (EED), and their spatial distributions. In this study, we report on the effect of the RF bias on the plasma parameters and the EEDs with various external parameters, such the RF bias power, the ICP power, the gas pressure, the gas mixture, and the frequency of RF bias. Our study shows the correlation between the RF bias and the plasma parameters and gives a crucial key for the understanding of collisionless electron heating mechanism in the RF biased ICP.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.132-132
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• 2015

Virtual metrology (VM) model based on plasma information (PI) parameter for C4F8 plasma-assisted oxide etching processes is developed to predict and monitor the process results such as an etching rate with improved performance. To apply fault detection and classification (FDC) or advanced process control (APC) models on to the real mass production lines efficiently, high performance VM model is certainly required and principal component regression (PCR) is preferred technique for VM modeling despite this method requires many number of data set to obtain statistically guaranteed accuracy. In this study, as an effective method to include the 'good information' representing parameter into the VM model, PI parameters are introduced and applied for the etch rate prediction. By the adoption of PI parameters of b-, q-factors and surface passivation parameters as PCs into the PCR based VM model, information about the reactions in the plasma volume, surface, and sheath regions can be efficiently included into the VM model; thus, the performance of VM is secured even for insufficient data set provided cases. For mass production data of 350 wafers, developed PI based VM (PI-VM) model was satisfied required prediction accuracy of industry in C4F8 plasma-assisted oxide etching process.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.147-147
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• 2012

Cutoff probe has been used for measuring a plasma density using the cutoff peak which is located at the plasma frequency in the low pressure plasma. However, research on analysis of low frequency region of transmission microwave frequency (TMF) spectrum does not performed even though important plasma parameters are located in the low frequency region, i.e., ion plasma frequency and collision frequency. In this research, we analyzed the low frequency region of the TMF spectrum. Experimental results reveal the effect of plasma parameters on the low frequency region on the TMF spectrum. Based on the response of TMF spectrum from changing of plasma parameters, deduction of the plasma parameters was tried. This comprehensive analysis of TMF spectrum expands applicable area of cutoff probe.

• Journal of the Korean Home Economics Association
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• v.33 no.6
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• pp.89-97
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• 1995

This study was undertaken to examine the correlations between dietary intakes or anthropometric parameters and the plasma lipid level. measurements of dali nutrients intake, body weight, height, body bass index, skinfold thickness, blood pressure, plasma total lipid, triglyceride and cholesterol were made to each of 124 healthy adult(25-59yrs) : 56 males and 65 females. The mean energy and nutrients intake, anthropometric parameters and plasma lipid levels were all in normal range. In females, the fat and protein intake, the amount and percents to total energy intake, had positive association with the plasma total lipid, but the energy percent from carbohydrate intake was correlated negatively. And body mass index positively correlated with plasma total lipid level, in male and female, Therefore we could postulated the dietary fat intake and body mass index affected to plasma lipid levels in normal conditions of healthy adult.

• Journal of the Korean Vacuum Society
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• v.21 no.3
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• pp.121-129
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• 2012

RF biased inductively coupled plasma (ICP) is widely used in semiconductor and display etch processes which are based on vacuum science. Up to now, researches on how rf-bias power affects have been focused on the controls of dc self-bias voltages. But, effect of RF bias on plasma parameters which give a crucial role in the processing result and device performance has been little studied. In this work, we studied the correlation between the RF bias and plasma parameters and the recent published results were included in this paper. Plasma density was changed with the RF bias power and this variation can be explained by simple global model. As the RF bias was applied to the ICP, increase in the electron temperature from the electron energy distribution was measured indicating electron heating. Plasma density uniformity was enhanced with the RF bias power. This study can be helpful for the control of the optimum discharge condition, as well as the basic understanding for correlation between the RF bias and plasma parameters.

• Journal of the Korean Society for Aeronautical & Space Sciences
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• v.40 no.6
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• pp.492-498
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• 2012

Characteristics of DBD(Dielectric Barrier Discharge) plasma actuator as design parameters were investigated for plasma flow control. Flow velocity and power consumption of the DBD plasma actuator were measured according to the design parameters such as discharge voltage and frequency, gap, width and length of electrode, and the thickness of dielectric barrier. The flow velocity and power consumption increased as the discharge voltage and frequency increased. As the electrode gap increased, the flow velocity increased with decreasing the power consumption, whereas high voltage was required for the plasma discharge. The flow velocity increased as the upper-electrode width decreased, and as the lower-electrode width increased at the constant power consumption. The performance of the DBD plasma actuator can be estimated at the given discharge and geometry conditions.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.145-145
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• 2011

Recently, multi-hole electrode RF capacitively coupled plasma discharge is being used in the deposition of microcrystalline silicon for thin film solar cell to increase the speed of deposition. To make efficient multi-hole electrode RF capacitively coupled plasma discharge, the hole diameter is to be designed concerning the plasma parameters. In past studies, the relationship between plasma parameters such as pressures and gas species, and hole diameter for efficient plasma density enhancement is experimentally shown. In the presentation, the relationship between plasma deriving frequency and hole diameter for efficient multi-hole electrode RF capacitively coupled plasma discharge is shown. In usual capacitively coupled plasma discharge, plasma parameter, such as plasma density, plasma impedence and plasma temperature, change as frequency increases. Because of the change, the optimum hole diameter of the multi-hole electrode RF capacitively coupled plasma for high density plasma is thought to be modified when the plasma deriving frequency changes. To see the frequency effect on the multi-hole RF capacitively coupled plasma is discharged and one of its electrode is changed from a plane electrode to a variety of multi-hole electrodes with different hole diameters. The discharge is derived by RF power source with various frequency and the plasma parameter is measured with RF compensated single Langmuir probe. The shrinkage of the hole diameter for efficient discharge is observed as the plasma deriving frequency increases.

• Fisheries and Aquatic Sciences
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• v.22 no.5
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• pp.9.1-9.7
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• 2019

The study investigated the changes in growth performance, hematological parameters, plasma components, and stress indicators of juvenile starry flounder, Platichthys stellatus, depending on varying exposure to hexavalent chromium. P. stellatus was exposed to waterborne chromium at 0, 50, 100, 200, and 400 ppb for 4 weeks. The result showed that Cr exposure resulted in decreased daily length gain (DLG), daily weight gain (DWG), condition factor (CF), and hepatosomatic index (HIS) in P. stellatus. In terms of hematological parameters, red blood cell (RBC) count, hematocrit (Ht), and hemoglobin (Hb) significantly decreased at 400 ppb after 2 weeks. In terms of plasma components, inorganic analysis was unchanged and cholesterol, an organic component, considerably increased at 400 ppb after 4 weeks. Plasma enzyme components including glutamic oxalate transaminase (GOT) and glutamic pyruvate transaminase (GPT) were significantly increased. Stress indicators such as cortisol and glucose were notably increased over 100 ppb after 4 weeks with increasing chromium concentration. The results indicate that exposure to waterborne Cr induced toxic effects on growth, hematological parameters, plasma components, and stress indicators.

• Journal of fish pathology
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• v.28 no.2
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• pp.87-92
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• 2015

Juvenile Paralichthys olivaceus (mean length $17.3{\pm}2.2cm$, mean weight $46.5{\pm}6.3g$) were exposed for 10 days to tributyltin (TBT) at various concentrations (0, 1, 2, 4 and $8{\mu}g/L$). Hematological parameters, such as red blood cell (RBC) count, hematocrit (Ht), and hemoglobin (Hb) concentration, were considerably decreased by high TBT concentrations. In plasma constituents, inorganic components such calcium and magnesium were also significantly altered. Plasma calcium was notably decreased, whereas plasma magnesium was increased. The enzyme components, glutamic oxalate transaminase (GOT) and glutamic pyruvate transaminase (GPT), were significantly decreased by TBT exposure. The present findings suggest that TBT exposure can cause significant alterations in hematological parameters and plasma constituents of flatfish Paralichthys olivaceus.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.242.1-242.1
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• 2014

The electron cyclotron resonance plasma source with a belt-type magnet assembly (BMA) is designed for effective plasma confinements. For characterizing the plasma source, the plasma parameters are measured by Langmuir probe. However, the plasma parameters and the motion of charged particles near the ECR zone are not easy to diagnostics, because of the high plasma density and temperature. Thus, as an alternative method, the electromagnetic simulation of the plasma source has been performed by using three-dimensional particle-in-cell and Monte Carlo collisional (PIC-MCC) simulation codes. For considering the limitation of simulation resources and time, the periodic boundary condition is applied and the coulomb collision is neglected. In this paper, we present the results of 3D PIC simulations of ECR plasmas with BMA and we compare them with the experimental results.