• Ceramist
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• v.22 no.4
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• pp.429-451
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• 2019

Quartz glass is a key material for making semiconductor process components because of its purity, low thermal expansion, high UV transmittance and relatively low cost. Domestic quartz glass has a market worth about 500 billion won in 2018, and the market power of Japanese materials is very high. Quartz glass for semiconductor process can be divided into general process and exposure. For general process, molten quartz glass is mainly used, but synthetic quartz glass with higher purity is preferred. Synthetic quartz glass is used as the photomask for the exposure process. Recently, as semiconductors started the sub-nm process, the transition from the transmission type using ArF ultraviolet (194 nm) to the reflection type using EUV ultraviolet (13.5 nm) began. Therefore, the characteristics required for the synthetic quartz glass substrates used so far are also rapidly changing. This article summarizes the current technical trends of quartz glass and recent technical issues. Lastly, the present situation and development possibility of quartz glass technology in Korea were diagnosed.

• Journal of the Korean Society of Industry Convergence
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• v.10 no.3
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• pp.179-185
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• 2007

Quartz glass are used in semiconductor industries as the reaction furnace, wafer carrier and accessaries. During the process the quartz glass received compression by direct contact with other quartz glass ware and metal as the form of weight itself and vacuum pressure and fatigue by vibrations caused by process. Even as the other ceramic materials quartz glass have high compressive strength but often there happened crack and breakage of quartz glass resulted in a great damage in the process. In this paper investigation will be carried out on fracture behavior of quartz glass under local load to give guideline to prevent unintended fracture of quartz glass.

• Ceramist
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• v.22 no.4
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• pp.452-463
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• 2019

A quartz glass crucible is the essential material for manufacturing silicon ingots such as semiconductors and solar cells. Quartz glass crucibles for semiconductors and solar cells are made similar, but differ in surface purity, structure and durability. Recently, ultra high purity synthetic glass crucibles for semiconductors have become more important due to foreign problems. In Korea, it has succeeded in producing 28-inch quartz glass crucibles through the past 10 years. However, 32-inch synthetic quartz glass for the production of silicon ingots for semiconductors is not up to the level of advanced technology, and the technology gap is expected to be 2 to 3 years. In order to overcome these technological gaps and localize synthetic quartz glass ware, close cooperation between production companies and demand companies and localization of synthetic quartz glass powder must also be made. In addition, if government support can be added, faster results can be expected.

• Korean Chemical Engineering Research
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• v.44 no.5
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• pp.513-519
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• 2006

We developed two kinds of the microchip for application to electrophoresis based on both glass and quartz employing the MEMS fabrications. The poly-Si layer deposited onto the bonding interface apart from channel regions can play a role as the optical slit cutting off the stray light in order to concentrate the UV ray, from which it is possible to improve the signal-to-noise (S/N) ratio of the detection on a chip. In the glass chip, the deposited poly-Si layer had an important function of the etch mask and provided the bonding surface properly enabling the anodic bonding. The glass wafer including more impurities than quartz one results in the higher surface roughness of the channel wall, which affects subsequently on the microflow behavior of the sample solutions. In order to solve this problem, we prepared here the mixed etchant consisting HF and $NH_4F$ solutions, by which the surface roughness was reduced. Both the shape and the dimension of each channel were observed, and the electroosmotic flow velocities were measured as 0.5 mm/s for quartz and 0.36 mm/s for glass channel by implementing the microchip electrophoresis. Applying the optical slit with poly-Si layer provides that the S/N ratio of the peak is increased as ca. 2 times for quartz chip and ca. 3 times for glass chip. The maximum UV absorbance is also enhanced with ca. 1.6 and 1.7 times, respectively.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.8 no.4
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• pp.14-19
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• 2009

Micro fluid channels are machined on quartz glass using powder blasting, and the machining characteristics of the channels are experimentally evaluated. The powder blasting process parameters such as injection pressure, abrasive particle size and density, stand-off distance, number of nozzle scanning, and shape/size of the required patterns affect machining results. In this study, the influence of the number of nozzle scanning, abrasive particle size, and blasting pressure on the formation of micro channels is investigated. Machined shapes and surface roughness are measured, and the results are discussed. Through the experiments and analysis, LOC are ettectinely machined on quartz glass using powder blasting.

• Journal of the Korean Society of Industry Convergence
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• v.10 no.4
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• pp.213-219
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• 2007

Glass-to-metal contact should be prevented in the design of any structural glass component. Because glass is extremely brittle and will fracture readily if even a small point load is applied. If the assembly includes a glass component supported by metallic structure, designers should provide a pliable interface of some kind between the two parts. But there happens high demand of glass-to metal contact in semiconductor industries due to adoption of dry cleaning process as one of the good solution to reduce running cost - carry out equipments cleaning with high corrosive and etching gas such as CF4 with keeping process temperature as the same as high service temperature. Therefore the quartz glass have to be received compression by direct contact with metal as the form of weight itself and vacuum pressure and fatigue by vibrations caused by process during the process. In this paper investigation will be carried out on fracture behavior of quartz glass contacted with metal directly under local load and fatigue given by process vibration with apparatus which can give $lox{\backslash}cal$ load and vibration through PZT ceramics to give guideline to prevent unintended fracture of quartz glass.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.4 no.3
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• pp.315-324
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• 1994

The effects of impurities of the quartz raw materials on the trasformation of quartz to cristobalite were investigated. As the increase of impurities content, the amount of cristobalite crystal increased, whereas the fusion temperature of quartz and the formation temperature of cristobalite decreased. And the courses of the transformation of quartz to cristobalite were examined. The course of quartz $\rightarrow$ transitional noncrystalline phase $\rightarrow$ melt (T) and quartz $\rightarrow$ transitional noncrystalline phase $\rightarrow$ cristobalite $\rightarrow$ melt (C) were always coexisted on the transformation of quartz. In the case of high purity quartz raw material, the T course was predominant, while in low purity quartz raw material, the C course was predominant. And the calculated density of heat treated sand by the quantitative analysis of quartz and cristobalite phase by XRD is well agreed with the measured density by pycnometer. On the melting proces of quartz glass, the volume expansion of sand at a certain temperature can be estimated with the calculated density data.

• Journal of environmental and Sanitary engineering
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• v.10 no.2
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• pp.67-73
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• 1995

In order to study of characteristics of collected filter as analysis of carbon in airborne particulate matters by Elemental Analyzer, quartz fiber filter and glass fiber filter were used. The results are followed as; There was no difference of confidence in collection rate of airborne particulate matters between quartz fiber filter and glass fiber filter. Airborne particulate matters were collected on both filters evenly and the use of quartz fiber filter is better than glass fiber filter as analysis of carbon by thermal method.

• Journal of the Korean Ceramic Society
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• v.54 no.4
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• pp.298-302
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• 2017

To investigate the influence of alkaline impurity K content on bubbles of quartz glass, samples were prepared based on $SiO_2$ sand with differing amounts of potassium hydroxide solution added by electric fusion. Bubble properties such as number, diameter and bubble fraction were determined using a stereoscopic microscope. The results of the observations indicated that an alkaline impurity content of 100 ppm had a good effect on bubble decline in quartz glass. The effect on OH was investigated by FTIR(Fourier transform infrared spectroscopy).

• Journal of the Korea Institute of Military Science and Technology
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• v.10 no.3
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• pp.114-119
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• 2007

Dielectric properties of quartz glass and $Si_3N_4$ are investigated using the waveguide method from room temperature to $800^{\circ}C$. For the case of dielectric constant, $Si_3N_4$ showed similar increase with quartz glass up to $300^{\circ}C$, but less increase from $300^{\circ}C$ to $800^{\circ}C$. For the case of loss tangent, those showed gradual increase with temperature except of some temperature points. The loss tangent of $Si_3N_4$ and quartz glass increased up to 18.2% and 12.5% respectively. Through these researches, high temperature dielectric properties of silicon nitride materials are characterized.