• 제목/요약/키워드: Scattering Pattern

검색결과 180건 처리시간 0.03초

Bistatic Scattering from a Hemi-Spherically Capped Cylinder

  • Park, Sang-Hyun;La, Hyoung-Sul;Cho, Sung-Ho;Oh, Taek-Hwan;Kim, Young-Shin;Lee, Chang-Won;Na, Jung-Yul
    • The Journal of the Acoustical Society of Korea
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    • 제25권3E호
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    • pp.115-122
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    • 2006
  • The bistatic scattering of an incident wave by a hemi-spherically capped cylinder is of particular interest because it has rarely been studied until the present day. The configuration of a hemi-spherically capped cylinder is similar to naval underwater weapons (submarines, mines, torpedos, etc.), but which is not exactly the same. This paper describes a novel laboratory experiment aimed at direct measurement of bistatic scattering by a hemi-spherically capped cylinder. Bistatic scattering by a hemi-spherically capped cylinder was measured in an acoustic water tank (5m long, 5m wide, 5m deep) using a high frequency projector (120kHz) and hydrophone. Measurements of monostatic scattering were also made under the same conditions. The bistatic scattering pattern by a hemi-spherically capped cylinder was measured against the incident angles $(0^{\circ},\;15^{\circ},\;20^{\circ},\;30^{\circ},\;45^{\circ},\;60^{\circ},\;90^{\circ})$ in order to verify various scattering pattern characteristics by the change of incident angle. The results indicate that the bistatic scattering TS at a wide scattering angle is much stronger than the mono static scattering TS. In bistatic scattering, the forward scattering TS is significantly stronger than the backward scattering TS, and the forward scattering pattern is also broader. In case of seven incident angles, the maximum value of forward scattering TS is about 14dB stronger than that of backward scattering TS. It is also found that forward scattering varies with the incident angle of sound to a much less extent than backscattering, and it is not seriously affected by the incident angle. These features could be the advantages of using forward scattering for detecting underwater targets at long range and increasing detection area and probability.

태양전지 실리콘 웨이퍼에서의 레일리기준 기반 레이저산란 패턴 분석 및 결함 검출 (Investigation of Laser Scattering Pattern and Defect Detection Based on Rayleigh Criterion for Crystalline Silicon Wafer Used in Solar Cell)

  • 연정승;김경범
    • 한국정밀공학회지
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    • 제28권5호
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    • pp.606-613
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    • 2011
  • In this paper, patterns of laser scattering and detection of micro defects have been investigated based on Rayleigh criterion for silicon wafer in solar cell. Also, a new laser scattering mechanism is designed using characteristics of light scattering against silicon wafer surfaces. Its parameters are to be optimally selected to obtain effective and featured patterns of laser scattering. The optimal parametric ranges of laser scattering are determined using the mean intensity of laser scattering. Scattering patterns of micro defects are investigated at the extracted parameter region. Among a lot of pattern features, both maximum connected area and number of connected component in patterns of laser scattering are regarded as the important information for detecting micro defects. Their usefulness is verified in the experiment.

표면 거칠기 광산란 패턴의 컴퓨터 수치 분석 (I) (Mumerical Anlysis of light Scattering Patterns for Measurement of Roughmess(I))

  • 임동열;김승우
    • 대한기계학회논문집
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    • 제16권2호
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    • pp.267-280
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    • 1992
  • This paper describes a numerical analysis of the light scattering patterns of roughness profiles. This analysis was based upon the light scattering theory developed by Beckmann. In the analysis, the roughness profile was regarded as a profile whose irregularities depend on the production process and the shape of cutting tool. Generally, waviness of an actual surface seriously distorts the scattered pattern of roughness profile. In order to avoid the effects of waviness of actual surfaces, several theoretically calculated scattering patterns, instead of actual scattering patterns, were used to analyze the scattering patterns of typical engineering roughness profiles. The characteristics of the light scattering patterns for five model surfaces were studied.

Overlap Margin 확보 및 Side-lobe 억제를 위한 Scattering Bar Optical Proximity Correction (Scattering Bar Optical Proximity Correction to Suppress Overlap Error and Side-lobe in Semiconductor Lithography Process)

  • 이흥주
    • 한국산학기술학회논문지
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    • 제4권1호
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    • pp.22-26
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    • 2003
  • Attenuated PSM lithography 공정에서 overlay margin 확보 및 side-lobe 제거를 위해 기존의 Cr shield 방식의 단점인 복잡한 mask 제작공정과 구조를 단순화하기 위한 방법으로 scattering bar 방식을 제안하였다. Scattering bar는 Cr 보조패턴처럼 완전히 빛을 차단하는 것이 아니라 약간의 빛을 투과시켜 보강된 intensity를 상쇄하므로 side-lobe를 억제하는 방법으로 metal pattern을 생성할 때 scattering bar도 동시에 만들어 mask제작에 필요한 공정횟수를 줄이고 mask구조 역시 단순하게 한다 그리고 동시에 DOF(depth of focus)를 향상시킨다. Background clear pattern의 경우에 발생하는 side-lobe도 scattering bar를 이용하여 효율적으로 제거되었다.

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확산체의 표면적 변화에 따른 흡음 및 확산계수 측정 (Measurements of scattering and absorption coefficients of diffusers with variation of surface area)

  • 센딜꾸마르;김용희;전진용
    • 한국소음진동공학회:학술대회논문집
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    • 한국소음진동공학회 2007년도 추계학술대회논문집
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    • pp.983-986
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    • 2007
  • The absorption power of a surface depends on the surface irregularity which has been known as an important factor in determining scattering coefficient. This study investigates the effect of increase in surface area on the absorption and scattering coefficients of a diffuse surface. The surface irregularity or surface pattern can be compared to the wavelengths and the random-incidence scattering coefficient of surface is measured by ISO 17497-1. The scattering coefficients of increasing the surface area in linear pattern of v-cut groove on rubber plate were measured in 1:10 scale model reverberation chamber. It is found that the scattering and absorption coefficients increase with increasing surface area. At 60% of increased surface area the spacing between the hemisphere diffuser and the v-cut groove acts similar with results of absorption coefficient. The results show that absorption coefficient depends on surface area and the spacing where as scattering coefficient depends on surface area and texture.

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Analysis of Electromagnetic Wave Scattering from a Sea Surface Using a Monte-Carlo FDTD Technique

  • Choi Dong-Muk;Kim Che-Young;Kim Dong-Il;Jeon Joong-Sung
    • Journal of electromagnetic engineering and science
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    • 제5권2호
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    • pp.87-91
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    • 2005
  • This paper presents a Monte-Carlo FDTD technique to determine the scattered field from a perfectly conducting surface like a sea surface, from which the useful information on the incoherent pattern tendency could be observed. A one-dimensional sea surface used to analysis scattering was generated using the Pierson-Moskowitz model. In order to verify the numerical results by this technique, these results are compared with those of the small perturbation method, which show a good match between them. To investigate the incoherent pattern tendency involved, the dependence of the back scattering coefficients on the different wind speed(U) is discussed for the back scattering case.

원통형 산란체의 고주파 산란 특성 (High Frequency Scattering from Cylindrical Scatterer)

  • 김기택;윤관섭;라형술;나정열
    • 한국음향학회지
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    • 제24권8호
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    • pp.441-446
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    • 2005
  • 수중에서 원통형 산란체의 산란 음장에서 발생하는 간섭 효과를 확인하기 위하여 한 개의 원통형 산란체와 동일한 두 원통형 산란체의 방위각에 따른 고주파 (120 kHz) 산란 패턴을 측정하였다. 실험은 가로, 세로, 높이가 각각 $5m\times5m\times5m$ 수조에서 공기가 채워진 원통형 PVC (poly vinyl-chloride)로부터 1.5m 거리에 위치한 수중 청음기를 $360^{\circ}$ 회전시키면서 실시하였다. 실험 결과 한 개 원통은 후방에서 무지향성으로 산란하는 특성을 보였으나 두 개 원통에서는 방위각에 따른 표적 강도의 변동성 (fluctuation)이 나타났다. Stanton이 제한한 이론 식과 측정한 산란 패턴을 비교한 결과 유사한 경향을 확인할 수 있었다.. 두 개 원통의 산란 패턴에서 나타나는 표적 강도의 변동성은 두 산란체의 중심으로부터 청음기까지의 거리차로 인한 산란 음장의 간섭 때문이다. 또한 두 개 원통의 산란 이론으로부터 원통의 간격이 커짐에 따라 표적 강도의 변동성이 심해지는 현상을 확인할 수 있었다.

Scattering Bar를 이용한 AttPSM Lithography 공정에서의 OPC (OPC Technique in The AttPSM Lithography Process Using Scattering Bars)

  • 이미영;이홍주
    • 한국산학기술학회:학술대회논문집
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    • 한국산학기술학회 2002년도 추계학술발표논문집
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    • pp.201-204
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    • 2002
  • Overlay margin 확보를 위한 oversizing과, design rule checking, jog filtering를 통하여 side-lobe를 추출하였다. 이렇게 추출한 side-lobe를 extent하고, Cr pattern을 정의하여 side-lobe 현상을 해결할 수 있었다. 하지만 이 방법은 mask제조 공정이 복잡하므로 Cr shield방식의 단점인 복잡한 mask제작공정과 구조를 단순화하기 위하여 scattering bar를 이용하였다. 따라서, scattering bar를 삽입하기 위한 rule을 생성하여 metal layer에 적용하고 aerial image simulation을 통해 side-lobe 현상이 억제되었음을 확인하였다. 그리고 앞에서와는 반대로 background clear의 경우에 발생하는 side-lobe에 scattering bar를 적용하여 억제됨을 확인하였다.

일차원 비균질 유전매질의 TE 및 TM 산란패턴 합성에 관한 연구 (A Study on the Synthesis of TE and TM Scattering Patterns of One-Dimensional Inhomogeneous Dielectric Media)

  • 남준석;전상재;전후동;정준식;박의준
    • 한국전자파학회:학술대회논문집
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    • 한국전자파학회 2003년도 종합학술발표회 논문집 Vol.13 No.1
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    • pp.69-73
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    • 2003
  • In this paper, a synthesis method for the desired scattering pattern is presented when illuminating by TE-polarized and TM-polarized plane waves to arbitrary dielectric material. It is considered that the one-dimensional dielectric media are inhomogeneously distributed with continuously varying dielectric constants. Accordingly the desired patterns and the corresponding source distributions are inversely transformed by the proposed algorithm which are based on the one-dimensional inverse scattering problem. Some bandstop spatial filter are illustrated for applications.

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반복 샘플링법을 사용한 임의 역산란 패턴을 위한 유전율 포텐셜 합성에 관한 연구 (A Study on the Synthesis of Dielectric Constant Potential for Arbitrary Inverse Scattering Pattern Using an Iterative Sampling Method)

  • 남준석;박의준
    • 대한전자공학회논문지TC
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    • 제40권10호
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    • pp.150-158
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    • 2003
  • 라인 소스에 의한 빔 패턴 합성 문제에서 소스 분포함수와 빔 패턴간의 관계는 푸리에 변환쌍으로 표현 될 수 있다. 본 연구에서는 원하는 lobe형 빔 패턴을 만족시키는 라인 소스 분포함수를 반복 샘플링을 통한 비선형 역변환법을 사용하여 합성하는 일반적인 방법을 제안한다. 이 방법은 유전 매질에 TE 및 TM 평면파 입사시 원하는 역산란 반사계수를 갖도록 하는 연속적으로 분포된 유전율 합성에 적용될 수 있으며, 임의 반사계수를 갖는 전송선로 합성에도 적용될 수 있는 장점을 가진다. 대역저지 공간 필터 및 분산 특성을 갖는 전송선로 필터에 적용, 분석하므로서 제안한 방법의 타당성을 보인다.