• 제목/요약/키워드: Secondary electron

검색결과 640건 처리시간 0.031초

실리콘박막의 증착시간에 따른 감마계수 측정법 개발 (Measurement of Secondary Electron Emission Coefficient on Deposition Time of the Silicon Thin Films)

  • 이중휘;최병정;양성채
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.330-331
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    • 2006
  • Recently, plasma display panels (PDPs) are highlighted for the flat type display device. Therefore, much attention has been paid to secondary electron emission coefficient of the electrode protective material of PDPs. As PDPs is developing, the concern about secondary electron emission coefficient ($\gamma$) which is related with PDPs electrode protection material is increasing continually. So the concern about the way to how to measure secondary electron emission coefficient is on the rise. At present, the way to how to measure secondary electron emission coefficient is developed by some research groups, which is giving some research part's advance help. In this research, we have studied how to measure secondary electron emission coefficient which is related with various thin films more conveniently than previous measurement method. We studied the method of measurement of secondary electron emission coefficient (${\gamma}$) of amorphous silicon films by using Paschen's curve.

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수치해석을 통한 SEM 챔버내의 이차전자 거동해석 및 이차전자 검출기의 최적 장착 위치 선정 (The Behavior of Secondary Electrons and Optimal Mounting Position of a Secondary Electron Detector in SEM with a Numerical Analysis)

  • 부경석;전종업
    • 한국공작기계학회논문집
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    • 제17권4호
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    • pp.15-21
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    • 2008
  • Secondary electron detectors used in scanning electron microscope accept secondary electrons emitted from the specimen and convert them to an electrical signal that, after amplification, is used to modulate the gray-level intensities on a cathode ray tube, producing an image of the specimen. In order to acquire images with good qualities, as many secondary electrons as possible should be reached to the detector. To realize this it is very important to select an appropriate mounting position and angle of the detector inside the chamber of scanning electron microscope. In this paper, a number of numerical simulations are performed to explore the relationships between detection rates of secondary electrons and the values of some parameters, such as distances between the detector and sample, relative mounting positions of scintillator positioned inside the detector with respect to detector cover, two types of mounting angles of the detector. The relationships between detection rates and applied voltages to corona ring and faraday cage, and energies of secondary electrons are investigated as well.

SEM용 전자 검출기의 설계 및 제작 (A Study on the Secondary Electron Detector for use in Scanning Electron Microscope)

  • 이상욱;전종업;박기태;박규열
    • 한국공작기계학회:학술대회논문집
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    • 한국공작기계학회 2005년도 춘계학술대회 논문집
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    • pp.9-14
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    • 2005
  • The nature of the signals collected by an SEM(Scanning Electron Microscope) in order to form images are all dependent on the detector used to collect them, and the quality of an acquired image is strongly influenced by detector performance. Therefore, the development of detector with high performance is very important in pulling up the resolution of SEM This study presents the secondary electron detector for use in scanning electron microscope, electric circuit and I/V conversion circuit for driving that detector.

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서로 다른 전극간격에서 이차전자 방출이 글로우 방전에 미치는 영향에 관한 연구 (Effect of Secondary Electron Emission on the Glow Discharges with Different Electrode Gaps)

  • 서정현;강경두
    • 전기학회논문지
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    • 제58권4호
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    • pp.777-782
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    • 2009
  • In this paper, the effect of the secondary electron emission coefficient of Xe ion on glow discharge was examined by ID numerical simulation. The simulation was performed for two distinct structures, short and long gaps. The features of the glow discharges in the both structures, firing and sustain voltages, luminance, and efficiency, were analyzed at various secondary electron emission coefficient of Xe ion.

전자빔 몬테 카를로 시물레이션 프로그램 개발 및 전자현미경 이미징 특성 분석 (Development of Electron Beam Monte Carlo Simulation and Analysis of SEM Imaging Characteristics)

  • 김흥배
    • 한국정밀공학회지
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    • 제29권5호
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    • pp.554-562
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    • 2012
  • Processing of Scanning electron microscope imaging has been analyzed in both secondary electron (SE) imaging and backscattered electron (BSE) image. Because of unique characteristics of both secondary electron and backscattered electron image, mechanism of imaging process and image quality are quite different each other. For the sake of characterize imaging process, Monte Carlo simulation code have been developed. It simulates electron penetration and depth profile in certain material. In addition, secondary electron and backscattered electron generation process as well as their spatial distribution and energy characteristics can be simulated. Geometries that has fundamental feature have been imaged using the developed Monte Carlo code. Two, SE and BSE images generation process will be discussed. BSE imaging process can be readily used to discriminate in both material and geometry by simply changing position and direction of BSE detector. The developed MC code could be useful to design BSE detector and their position. Furthermore, surface reconstruction technique is possibly developed at the further research efforts. Basics of Monte Carlo simulation method will be discussed as well as characteristics of SE and BSE images.

STUDY ON THE ELECTRON GENERATION BY A MICRO-CHANNEL PLATE BASED ON EGS4 CALCULATIONS AND THE UNIVERSAL YIELD CURVE

  • Moon, B.S.;Han, S.H.;Kim, Y.K.;Chung, C.E.
    • Journal of Radiation Protection and Research
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    • 제26권3호
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    • pp.177-181
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    • 2001
  • The conversion efficiency of a cesium iodine coated micro-channel plate is studied. We use the EGS4 code to transport photons and generated electrons until their energies become less than 1keV and 10keV respectively. Among the generated electrons, the emission from the secondary electrons located within the escape depth of 56nm from the photo-converter boundary is estimated by integrating the product of the secondary electrons with a probability depending only on their geometric locations. The secondary electron emission from the generated electrons of energy higher than 100eV is estimated by the 'universal yield curve'. The sum of these provides an estimate for the secondary electron yield and we show that results of applying this algorithm agree with known experimental results. Using this algorithm, we computed secondary electron emissions from a micro-channel plate used in a gas electron multiplier detector that is currently being developed at Korea Atomic Energy Research Institute.

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Secondary Electron Emission of ZnO Films

  • Choi, Jinsung;Lee, Sung Kwang;Choi, Joon Ho;Choi, Eun Ha;Jung, Ranju;Kim, Yunki
    • Applied Science and Convergence Technology
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    • 제24권6호
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    • pp.273-277
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    • 2015
  • We investigated secondary electron emission characteristics of ZnO thin films prepared by pulsed laser deposition method with respect to the ambient oxygen pressure and the substrate temperature during the deposition. X-ray diffraction, UV-Vis spectrometry, atomic force microscopy, and ${\gamma}$-FIB were used to examine the structural, optical transmission, surface morphology, and secondary electron emission properties of the films, respectively. The secondary electron emission coefficient of the ZnO films increases as the O/Zn ratio of the films increases which was thought to result from either the ambient oxygen pressure increase or the substrate temperature decrease and as the grain size of the films decreases. It was confirmed that ZnO has better secondary electron emission characteristics than those of MgO, which is currently widely used as a material for PDP protecting layers.

Measurement of Secondary Electron Emission Coefficient and Bimolecular Valence Band Energy Structure of Erythrocyte with and Without Bioplasma Treatment

  • Lee, Jin-Young;Baik, Guyon;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.483-483
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    • 2012
  • Recently, nonthermal bioplasma has been attracted by researchers due to their potentials to modulate cellular functions resulting in changes of biomolecular electron band structures as well as cell morphologies. We have investigated the secondary electron emission characteristics from the surface of the erythrocyte, i.e., red blood cell (RBC) with and without the nonthermal bioplasma treatment in morphological and biomolecular aspects. The morphologies have been controlled by osmotic pressure and biomolecular structures were changed by well known reactive oxygen species. Ion-induced secondary electron emission coefficient have been measured by using gamma-focused ion beam (${\gamma}$-FIB) system, based on the quantum mechanical Auger neutralization theory. Our result suggests that the nonthermal bioplasma treatment on biological cells could result in change of the secondary electron emission coefficient characterizing the biomolecular valence band electron energy structures caused by the cell morphologies as well as its surface charge distributions.

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A Parametric Study on Secondary Electron Emission from MgO

  • Yoon, Sang-Hoon;Kim, Yong-Seog
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.953-956
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    • 2008
  • Using the theoretical model of Auger electron emission, effects of MgO properties which include band gap energy, escape probability, gas ion, and doping elements on the yield of secondary electron emission were examined. The results indicated that the band gap of MgO must be decreased and escape probability must be enhanced in order to increase the yield of secondary electrons from Xe ions and that may proved to be a critical for achieving high luminance efficacy in ac-PDPs.

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