• Bulletin of the Korean Chemical Society
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• v.27 no.10
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• pp.1562-1566
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• 2006

Mesoporous silica films with three different pore sizes were prepared by using cationic surfactant, non-ionic surfactant, or triblock copolymer as structure directing agents with tetramethylorthosilicate as silica source in order to control the pore size and wall thickness. They were synthesized by an evaporation-induced self-assembly process and spin-coated on Si wafer. Mesoporous silica films with three different pore sizes of 2.9, 4.6, and 6.6 nm and wall thickness ranging from $\sim$1 to $\sim$3 nm were prepared by using three different surfactants. These materials were optically transparent mesoporous silica films and crack free when thickness was less than 1 m m. The photoluminescence spectra found in the visible range were peaked at higher energy for smaller pore and thinner wall sized materials, consistent with the quantum confinement effect within the nano-sized walls of the silica pores.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.159-159
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• 2007

In order to reduce a signal delay in ULSI, low resistive metal and intermetal dielectric material of low dielectric constant are required. Ordered mesoporous silica film is proper to intermetal dielectric due to its low dielectric constant and superior mechanical properties. In this study, ordered mesoporous silica films was synthesized using TEOS (tetraethoxysilane) / MTES (methyltriethoxysilane) mixed silica precursor and Brij-$76^{(R)}$ surfactant. These films had the porosity of 40% and dielectric constant of 2.5. To lower dielectric constant, the ordered mesoporous silica films were surface-modified by HMDS (hexamethyldisilazane) treatment. HMDS substituted -OH groups on the surface of silica wall for -Si$(CH_3)_3$ groups. After the HMDS treatment, ordered mesoporous silica films were calcined at various calcination temperatures. Through the investigation, it was concluded that the proper calcination temperature is necessary as aspects of structural, electrical, and mechanical properties.

• Korean Chemical Engineering Research
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• v.55 no.6
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• pp.754-761
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• 2017

UV-curable hydrophilic coating solutions were prepared by mixing colloidal silica dispersed in alcohol with an acrylic monomer, pentaerythritol triacrylate (PETA). Hydrophilic coating films were also prepared by spin coating the hydrophilic coating solutions on PC substrates and UV curing for 10 minutes subsequently. The effect of the amount of colloidal silica in the coating solutions, which was varied from 10 g to 50 g, was investigated on the hydrophilic properties of UV-cured coating films. The results showed that the amount of colloidal silica had a great influence on the hydrophilic properties of UV-cured coating films and the coating film prepared with 30 g of colloidal silica showed a lowest contact angle of $37^{\circ}$ and an excellent pencil hardness of H.

• Proceedings of the Korean Society of Marine Engineers Conference
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• 2006.06a
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• pp.271-272
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• 2006

Zinc confers high corrosion resistance by acting as a sacrificial anode, and a zinc coating improves the appearance of steel. Chromate conversion coating (CCC) films are still one of the most efficient surface treatments for steel. Although such films can self-repair via the dissolution of Cr(VI), dissolved Cr(VI) have adverse effects on humans, and the environment. Therefore, we examined the corrosion protection property and morphology of colloidal silica conversion films as an alternative to CCC films. The corrosion behavior was investigated in 3% NaCl solution using electrochemical techniques, including electrochemical impedance spectroscopy, open circuit potential, and the salt spray test(SST). Corrosion was implied by the appearance of red rust on the specimen surface. In corrosion resistance at 3% NaCl solution, red rust appeared at 15-20, 55-70, and 83-98 days on Zn-electroplated steel, colloidal silica conversion-coated specimens, and CCC-coated specimens, respectively. In the salt spray test, the colloidal silica film provided better corrosion protection than CCC films, i.e., red rust appeared at 96 hours on the Zn-electroplated steel sheet, at 432 hours with the CCC films, and at 888 hours with silica conversion coating.

• Transactions on Electrical and Electronic Materials
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• v.16 no.1
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• pp.5-9
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• 2015

Optical and electrical properties were studied for Antimony doped tin oxide thin films from precursors containing 10, 30, 50, and 70 atom% of Sb deposited on bare sodalime silica, barrier layer coated sodalime silica, and pure silica glass substrates by sol-gel spinning technique. The direct band gaps were found to vary from 3.13~4.12 eV when measured in the hv range of 2.5~5.0 eV, and varied from 4.22~5.08 eV when measured in the range of 4.0~7.0 eV. Indirect band gap values were in the range of 2.35~3.11 eV. Blue shift of band gap with respect to bulk band gap and Moss-Burstein shift were observed. Physical thickness of the films decreased with the increase in % Sb. Resistivity of the films deposited on SLS substrate was in the order of $10^{-2}$ ohm cm. Sheet resistance of the films deposited on barrier layer coated soda lime silica glass substrate was found to be relatively less.

• New Physics: Sae Mulli
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• v.68 no.11
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• pp.1203-1207
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• 2018

In this study, silica nanowires were formed using silicon oxide films with different oxygen contents, and their microstructure and physical properties were compared with those of silica nanowires formed using Si wafers. The silicon oxide films were fabricated by using a plasma-enhanced chemical vapor deposition method. Silica nanowires were formed by thermally annealing silicon oxide films coated with nickel films as a catalyst. In the case of silicon oxide films having an oxygen content of approximately 50 at.% or less, the formation mechanism, microstructure, and physical properties of the nanowires were not substantially different from those of the silicon wafer. In particular, the uniformity of the thickness showed better behavior in the silicon oxide films. These results imply that silicon oxide films can be used as an alternative for fabricating high-quality silica nanowires at low cost.

• Journal of Photoscience
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• v.5 no.3
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• pp.105-109
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• 1998

By using the liquid -phase-deposition (LPD) process, which has a potetnial of preparing organic inorganic composite materials, samples doped with benzo[f]quinoline (BfQ)into silica thia films wre prepared. We observed the fluorescene and fluorescene excitation spectra of the samples, as well as the fluorescence lifetimes and time-resoluved fluorescence spectra. The comparison of thefluorescence spectra in pH-controlled buffer solutions yields the results that the dominant species of BfQ in the LPD silica films is a protonated one. The fluorescence band assigned to a hydrogen-bonded species was observed on the samples prepared from the dipping solutions of 3 and 2 M hexafluorosilicic acid. The band assignment was confirmed by the fluorescence lifetime measurement. The FT-IR M hexaflurosilicic acid. The band assignment was confirmed by the flurescence lifetime meausurement. The FT-IR data proved the existence of included water in silica films prepared from the LPD process. The appearance of the band corresponding to the hydrogen-bonded species within LPD silica phases was explained by the proesence of included water. Depending on the preparation conditions of LPD silica films, the band assigned to protonated species shows bad shifts in a wavenumber region between the peak of hydrogen-bonded and typical protonated species. This implies that there is some distribution of steric conformation of protonated species of BfQ interacting with adsorbing sites of LPD silica. The time -resolved fluorescence spectra suggest that some relaxation process is involved in the conformation of BfQ doped into the solid phase of LPD silica.

• Korean Chemical Engineering Research
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• v.49 no.5
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• pp.535-540
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• 2011

Organic-inorganic hybrid coating solutions were prepared starting from colloidal silica, lanthanum nitrate and ${\gamma}$-glycidoxypropyl trimethoxysilane by the sol-gel method. Also, spiropyran-doped hard coating solutions were prepared by mixing the spiropyran solution, obtained after dissolving spiropyran dye into tetrahydrofuran solvent, with the organic-inorgnic hybrid coating solutions. The spiropyran-doped hard coating solutions were applied as a thin layer to polycarbonate sheets, and their photochromic properties were investigated. The effect of amount of colloidal silica added into the coating solutions was investigated on the photochromic properties of coating films. Both decoloration rate and pencil hardness of the coating films were increased with increasing the amounts of colloidal silica.

• Journal of the Korean Ceramic Society
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• v.46 no.1
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• pp.10-15
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• 2009

We have fabricated silicon-rich silica thin films via RF magnetron sputtering using a SiO target. Thickness evolution and microstructure change of such $SiO_x$ (1$SiO_x$ thin films turned out to be mainly responsible for the increase of refractive index.

• Bulletin of the Korean Chemical Society
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• v.26 no.3
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• pp.418-422
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• 2005

By introducing spin-coating method to the evaporation induced self-assembly (EISA) process, a simple and reproducible route in controlling the mesophase of silica thin films has been developed for the first time in this work. When a comparatively solvent-rich Si-sol (The atomic ratio of TEOS : F127 : HCl : $H_2O$ : EtOH = 1 : 0.006 : 0.2 : 9.2 : 30) was used as coating solution, the mesophase of resultant silica films was selectively controlled by adjusting the spin-on speed. The cubic mesophase has been obtained from the coating at a low rpm, such as 600 rpm, while the 2-D hexagonal mesophase is formed at a high rpm, such as 2,500 rpm. At a medium coating speed, a mixture of cubic and hexagonal mesophase has been found in the fabricated films. The present results confirm that the evaporation rate of volatile components at initial step is critical for the determination of mesopore structures during the EISA process.