• Title/Summary/Keyword: Silica waveguide

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Silica Waveguide for Integrated Diffractive Optical Head (집적형 광탐침 헤드의 실리카 광도파로 제조기술)

  • 백문철;손영준;서동우;한기평;김태엽;김약연
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.160-163
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    • 2002
  • Silica waveguide for an integrated diffractive optical head system was designed and fabricated. The waveguide was designed to optimize the optical efficiency of red and/or blue laser source, and a lab-made RF magnetron sputter was adopted to deposit silica cladding and core layers on SiO$_2$/Si substrates. The cladding and core layers were formed using commercial targets, and the former was done with #7740 and the latter with BK7 and BAK4, respectively The surface roughness of the waveguide layers was measured to be 30.3${\AA}$ for BK7 and 17.8${\AA}$ for BAK4, and the difference of refractive indices between core and cladding layers was 0.9% and 2.5%, respectively. The waveguide fabricated with the core layer of BK7 showed better optical properties when the final diffractive optical probe heads were measured with red laser(650nm) source.

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Planar Waveguide Devices for Communication and Sensing Applications

  • Okamoto, Katsunari
    • Journal of the Optical Society of Korea
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    • v.14 no.4
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    • pp.290-297
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    • 2010
  • The paper reviews progress and future prospects of two kinds of planar waveguide devices; they are (a) silica and silicon photonics multi/demultiplexers for communications and signal processing applications, and (b) a novel waveguide spectrometer based on Fourier transform spectroscopy for sensing applications.

Fabrication of Low Loss Silica Slab Waveguide by Flame Hydrolysis Deposition (FHD 공정에 의한 저손실 실리카 슬랩 도파로 형성)

  • 심재기;김태홍;신장욱;박상호;김덕준;성희경
    • Journal of the Korean Ceramic Society
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    • v.37 no.6
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    • pp.524-529
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    • 2000
  • Silica slab wavegudie was fabricated on Si substrates by FHD for planar optical passive devices. The slab waveguide consists of lower clad and core layers, where core layer index is controlled by GeO2 addition. Doping of GeO2 in silica is difficult because of the low deposition density due to nonspherical particle generation in FHD process. Silica core particles deposited at various conditions such as flame temperature and substrate scanning were analyzed by SEM and TEM. As the flame temperature increased, the surface roughness of the core layer was decreased up to 3.6 nm after consolidation. Index difference and thickness of core of slab waveguide were 0.3%, 8$\mu\textrm{m}$ respectively. Measured optical loss at TE mode was <0.04 dB/cm at 1.3$\mu\textrm{m}$ and <0.06 dB/cm at 1.55$\mu\textrm{m}$.

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Thermal Behavior of Arrayed-Waveguide Grating Made of Silica/Polymer Hybrid Waveguide

  • Kim, Duk-Jun;Shin, Jang-Uk;Han, Young-Tak;Park, Sang-Ho;Park, Yun-Jung;Sung, Hee-Kyung;Kim, Dong-Kun
    • ETRI Journal
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    • v.26 no.6
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    • pp.661-664
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    • 2004
  • The thermal behavior of an arrayed-waveguide grating made of a silica/polymer hybrid waveguide was examined. We experimentally confirmed that the hybrid waveguide is effective to decrease the temperature and polarization dependence of the center wavelength owing to the negative thermo-optic coefficient of the refractive index and extremely low baking temperature of the polymer cladding. However, the detachment of the polymer cladding from the silica core, which took place either during a repeated heat cycle test or during long-term storage in atmosphere, was a serious problem for practical use.

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Polarization-Insensitive Design and Fabrication of Hybrid Sol-Gel Arrayed Waveguide Gratings (무편광 Hybrid Sol-Gel 배열도파로 격자 소자의 설계 및 제작)

  • Park, Soon-Ryong;Jeong, Ja-Wan;O, Beom-Hoan;Lee, Seung-Gol;Lee, El-Hang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.04b
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    • pp.105-108
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    • 2002
  • We report on the polarization-insensitive design and fabrication of an arrayed waveguide gratings (AWG's) using sol-gel derived silica glass films formed on fused silica substrates to provide cheap and stable tools for better design. An arrayed-waveguide grating multiplexer with raised structure is fabricated in order to effect polarization sensitivity. Since polarization is usually not known after propagation in an optical fiber. passive WDM components such as monolithic wavelength demultiplexer have to be polarization insensitive. Here, we observed that polarization have effect on crosstalk of output spectrum in arrayed-waveguide grating

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Silica-Based Planar Lightwave Circuits for WDM Applications

  • Okamoto, Katsunari;Inoue, Yasuyuki;Tanaka, Takuya;Ohmori, Yasuji
    • Electrical & Electronic Materials
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    • v.11 no.11
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    • pp.53-65
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    • 1998
  • Planar lightwave circuits (PLCs) provide various important devices for optical wavelength division multiplexing (WDM) systems, subscriber networks and etc. This paper reviews the recent progress and future prospects of PLC technologies including arrayed-waveguide grating multiplexers, optical add/drop multiplexers, programmable dispersion equalizers and hybrid optoelectronics integration technologies.

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Effective Silicon Oxide Formation on Silica-on-Silicon Platforms for Optical Hybrid Integration

  • Kim, Tae-Hong;Sung, Hee-Kyung;Choi, Ji-Won;Yoon, Ki-Hyun
    • ETRI Journal
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    • v.25 no.2
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    • pp.73-80
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    • 2003
  • This paper describes an effective method for forming silicon oxide on silica-on-silicon platforms, which results in excellent characteristics for hybrid integration. Among the many processes involved in fabricating silica-on-silicon platforms with planar lightwave circuits (PLCs), the process for forming silicon oxide on an etched silicon substrate is very important for obtaining transparent silica film because it determines the compatibility at the interface between the silicon and the silica film. To investigate the effects of the formation process of the silicon oxide on the characteristics of the silica PLC platform, we compared two silicon oxide formation processes: thermal oxidation and plasma-enhanced chemical vapor deposition (PECVD). Thermal oxidation in fabricating silica platforms generates defects and a cristobalite crystal phase, which results in deterioration of the optical waveguide characteristics. On the other hand, a silica platform with the silicon oxide layer deposited by PECVD has a transparent planar optical waveguide because the crystal growth of the silica has been suppressed. We confirm that the PECVD method is an effective process for silicon oxide formation for a silica platform with excellent characteristics.

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Low-Loss Compact Arrayed Waveguide Grating with Spot-Size Converter Fabricated by a Shadow-Mask Etching Technique

  • Jeong, Geon;Kim, Dong-Hoon;Choi, Jun-Seok;Lee, Dong-Hwan;Park, Mahn-Yong;Kim, Jin-Bong;Lee, Hyung-Jong;Lee, Hyun-Yong
    • ETRI Journal
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    • v.27 no.1
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    • pp.89-94
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    • 2005
  • This paper describes a low-loss, compact, 40-channel arrayed waveguide grating (AWG) which utilizes a monolithically integrated spot-size converter (SSC) for lowering the coupling loss between silica waveguides and standard single-mode fibers. The SSC is a simple waveguide structure that is tapered in both the vertical and horizontal directions. The vertically tapered structure was realized using a shadow-mask etching technique. By employing this technique, the fabricated, 40-channel, 100 GHz-spaced AWG with silica waveguides of 1.5% relative index-contrast showed an insertion-loss figure of 2.8 dB without degrading other optical performance.

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