The Development of Silylated Photoresist Etch Process by Enhanced- Inductively Coupled Plasma (Enhanced-Inductively Coupled Plasma (E-ICP)를 이용한 Silylated photoresist 식각공정개발)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.15 no.3
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- pp.227-232
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- 2002