• Transactions on Electrical and Electronic Materials
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• v.5 no.6
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• pp.215-218
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• 2004

This paper presents a three-dimensional numerical simulation for thermal oxidation process. A new elasto-viscoplastic model for robust numerical oxidation simulation is proposed. The three-dimensional effects of oxidation process such as mask lifting effect and corner effects are analyzed. In nano-scale process, the oxidant diffusion is punched through to the other side of the mask. The mask is lifted so the thickness of oxide region is greatly enhanced. The compressive pressure during the oxidation is largest in the mask corner of the island structure. This is because the masked area near the corner is surrounded by an area larger than the others in the island structure. This stress induces the retardation of the oxide growth, especially at the masked corner in the island structure.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.32A no.8
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• pp.94-106
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• 1995

A three-dimensional(3D) Monte Carlo simulator for boron ion implantation into <100>single-crystal silicon considering the mask structure has been developed to predict the mask-dependent impurity doping profiles of the implanted boron at low energies into the reduced area according to the trend of a reduction in the size of semiconductor devices. All relevant important parameters during ion implantation have been taken into account in this simulator. These are incident energy, tilt and rotation of wafer, orientation of silicon wafer, presence of native silicon dioxide layer, dose, wafer temperature, ion beam divergence, masking thickness, and size and structure of open window in the mask. The one-dimensional(1D) results obtained by using the 3D simulator have been compared with the SIMS experiments to demonstrate its capabilities and confirem its reliability, and we obtained relatively accurate 1D doping profiles. Through these 3D simulations considering the hole structure and its size, we found the mask effects during boron ion implantation process.

• Journal of the Korean Society of Clothing and Textiles
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• v.44 no.6
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• pp.1163-1177
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• 2020

The purpose of this study is to figure out the information needed to improve the shape and size suitability of face-applied mask sheets. The study analyzed the shape of the mask sheet from the scanned images of 50 products of 37 domestic brands. In addition, each measurement of 42 mask sheets were compared and analyzed multilaterally with the 3D measurement dimensions of the faces of men and women in their 20s from the 6th SizeKorea data. Analysis on the shapes of mask sheets indicated that domestic commercial mask sheets are mainly made of single or dual sheets, with slits for enhancing fitness to the three-dimensional face. In the dimensional analysis of Korean men, women and mask sheets, most of the lengths of the mask sheets were significantly larger or smaller than the actual faces of men and women. The horizontal length and vertical length of the forehead above the eyes are significantly shorter, thereby requiring adjustments in the dimensions of this area. In order to improve the size suitability of the mask, it is necessary to adjust the dimensions of the problem area according to the research results as well as diversify the dimensions considering the target layer.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.30A no.12
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• pp.43-50
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• 1993

Three-dimensional simulator for the ion implantation process is developed. The simulator based on an analytical model which would be a choice with high computational efficiency and accuracy. This is an important issue for the simulation of a numerous number of processing steps required in the fabrication of ULSI or GSI. The model can explain scattering and bulk channeling mechanism (1D). It can also explain depth dependent lateral diffusion effect(2D) and mask effect(3D). The model is consist of one-dimensional JPD(Joined Pearson Distribution) function and two-dimensional modified Gaussian functions. Final implanted profiles under typical mask structures such as hole, line and island structure are obtained with varying ion species.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.26 no.11
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• pp.2297-2304
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• 2002

Two-dimensional and three-dimensional finite element methods have been used to analyze the deformation behavior of a shadow mask due to thermal and tension load. The shadow mask inside the Braun tube of a TV set has numerous slits through which the electron beams are guided to land on the designed phosphor of red, green or blue. Its thermal deformation therefore causes landing shift of the electron beam and results in decolorization of a screen. For the realistic finite element analysis, the effective thermal conductivity and the effective elastic modulus arc calculated, and then the shadow mask is modeled as shell without slits. Next a transient thermal analysis of the shadow mask is performed, wherein thermal radiation is a major heat transfer mechanism. Analysis of the resulting thermal deformation is followed, from which the landing shift of the electron beam is obtained. The present finite element scheme may be efficiently used to reduce thermal deformation of a shadow mask and in developing prototypes of a large screen flat TV.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.215-216
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• 2009

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1996.11a
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• pp.93-96
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• 1996

We developed three dimensional Monte carlo ion implantation simulator which simulate distributions of impurities under the ion implantation on the tilted multi-layered layer. Our simulation reveals three dimensional shadow effect and sidewall scattering effect due to the geometrical shapes. For the evaluation of the developed three dimensional Monte carlo ion implantation simulator, calculations with 100,000 ions have been performed for the island and hole structures with a thin oxide of 100$\AA$ and nitride of 2000$\AA$. The simulation results showed that the distribution of ion decreases near the conner of the hole structure covered with a nitride layer and increases near the conner for the island structure open to oxide. Moreover, three dimensional distributions of ions were obtained with varying incident energy, tilt and rotation angle, mask depth and three-dimensional structure geometry.

• Journal of the Optical Society of Korea
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• v.5 no.3
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• pp.99-109
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• 2001

This paper presents a phase-only modulation scheme for a three-dimensional (3-D) image matching system to improve optical efficiency of the system. The 3-D image matching system is based on the two mask heterodyne scanning. A hologram of the 3-D reference object is first created and then the phase of the hologram is extracted. The phase of the hologram is represented as one mask with the other mask being a plane wave. The superposition of each beam modulated by the two masks generated a scanning beam pattern. This beam pattern scans the 3-D target object to be recognized. The output of the scanning system gives out the correlation of the phase-only hologram of the reference object and the complex hologram of the target object. Since a hologram contains 3-D information of an object as a form of fringe pattern, the correlation of holograms matches whole 3-D aspect of the objects. Computer simulations are performed with additive gaussian noise and without noise for the complex hologram modulation scheme and the phase-only hologram modulation scheme. The computer simulation results show that the phase-only hologram modulation scheme improves the optical efficiency. Thus the system with the phase-only hologram modulation scheme is more robust than the system with the complex hologram modulation scheme.

• Journal of Korean Vacuum Science & Technology
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• v.1 no.1
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• pp.1-12
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• 1997

A new three-dimensional (3D) Monte Carlo ion implantation simulator, TRICSI, has been developed to investigate 3D mask effects in the typical mask structure for ion implantation into crystalline silicon. We present the mask corner and mask size effects of implanted boron range profiles, and also show the calculated damage distributions by applying the modified Kinchin-Pease equation in the single-crystal silicon target. The simulator calculates accurately and efficiently the implanted-boron range profiles under the relatively large implanted area, using a newly developed search algorithm for the collision partner in the single-crystal silicon. All of the typical implant parameters such as dose, tilt and rotation angles, in addition to energy can be used for the 3D simulation of ion implantation.

• Fashion & Textile Research Journal
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• v.22 no.6
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• pp.826-833
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• 2020

When it is necessary to wear masks for long periods, such as during the current COVID-19 pandemic, the essential function of masks to prevent contamination (or transmission to others) as well as comfortableness are important. For this study, we used three-dimensional (3D) facial measurements of adult women to compile basic face shape data for designing comfortable and effective masks. This study analyzed the 3D facial data of 127 subjects in their 20s to 30s of the 6th Size Korea. Factor analysis of the survey data produced seven factors that formed the composition of adult female faces. These factors combined to produce three facial types: square (long face and a large lower middle face), oval (smallest central and lower body in the middle), and triangle (short face with a small central and lower large nose). These types reflect that the facial types of adult women show the differences in the nose angle, nose length, bitragion-subnasal arc, bitragion-menton arc. Therefore, properly fitting masks for fine dust particle filtration require 3D customization of a mask's breathing apparatus to fit differently shaped central and lower face parts that interfere with mask fit.