• Title/Summary/Keyword: Tri-Si

Search Result 51, Processing Time 0.033 seconds

Buried contact solar cells using tri-crystalline silicon wafer (삼상 실리콘 기판을 사용한 저가 전극 함몰형 태양전지)

  • Kwon, Jea-Hong;Lee, Soo-Hong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2003.07a
    • /
    • pp.176-180
    • /
    • 2003
  • Tri-crystalline silicon (Tri-Si) wafers have three different orientations and three grain boundaries. In this paper, tri-Si wafers have been used for the fabrication of buried contact solar cells. The optical and micro-structural properties of these cells after texturing in KOH solution have been investigated and compared with those of cast multi-crystalline silicon (multi-Si) wafers. We employed a cost effective fabrication process and achieved buried contact solar cell (BCSC) energy conversion efficiencies up to 15% whereas the cast multi-Si wafer has efficiency around 14%.

  • PDF

Buried Contact Solar Cells using Tri-crystalline Silicon Wafer

  • Lee Soo-Hong
    • Transactions on Electrical and Electronic Materials
    • /
    • v.4 no.3
    • /
    • pp.29-33
    • /
    • 2003
  • Tri-crystalline silicon wafers have three different orientations and three-grain boundaries. In this paper, tri-crystalline silicon (tri-Si) wafers have been used for the fabrication of buried contact solar cells. The optical and micro-structural properties of these cells after texturing in KOH solution have been investigated and compared with those of cast mult- crystalline silicon (multi-Si) wafers. We employed a cost effective fabrication process and achieved buried contact solar cell (BCSC) energy conversion efficiencies up to $15\%$ whereas the cast multi-Si wafer has efficiency around $14\%$.

A study on the Optical and electrical characteristics of Tri-silicon using wet texture (습식텍스쳐를 이용한 삼결정 실리콘 광학적.전기적 특성 연구)

  • Han, Kyu-Min;Yoo, Jin-Su;Yoo, Kwon-Jong;Lee, Hi-Deok;Choi, Sung-Jin;Kwon, Jun-Young;Kim, Ki-Ho;Yi, Jun-Sin
    • 한국신재생에너지학회:학술대회논문집
    • /
    • 2009.06a
    • /
    • pp.180-182
    • /
    • 2009
  • Two different wet etching solutions, NaOH 40% and Acid, were used for etching in tri-crystalline Silicon(Tri-Si) solar cell fabrication. The wafers etched in NaOH40% solution showed higher reflectance compared to the wafers etched in Acid solution after $SiN_x$ deposition. In light current-voltage results, the cells etched in Acid solution exhibited higher short circuit current and open circuit voltage than those of the cells etched in NaOH 40% solution. We have obtained 16.70% conversion efficiency in large area($156cm^2$) Tri-Si solar cells etched in Acid solution.

  • PDF

Thermal Stability Improvement or Ni Germanosilicide Using NiPt/Co/TiN and the Effect of Ge Fraction (x) in $Si_{l-x}Ge_x$ (NiPt/Co/TiN을 이용한 Ni Germanosilicide 의 열안정성 향상 및 Ge 비율 (x) 에 따른 특성 분석)

  • Yun Jang-Gn;Oh Soon-Young;Huang Bin-Feng;Kim Yong-Jin;Ji Hee-Hwan;Kim Yong-Goo;Cha Han-Seob;Heo Sang-Bum;Lee Jeong-Gun;Wang Jin-Suk;Lee Hi-Deok
    • Proceedings of the IEEK Conference
    • /
    • 2004.06b
    • /
    • pp.391-394
    • /
    • 2004
  • In this study, highly thermal stable Ni Germanosilicide has been utilized using NiPt alloy and novel NiPt/Co/TiN tri-layer. And, the Ni Germanosilicide Properties were characterized according to different Ge ratio (x) in $Si_{l-x}Ge_x$ for the next generation CMOS application. The sheet resistance of Ni Germanosilicide utilizing pure-Ni increased dramatically after the post-silicidation annealing at $600^{\circ}C$ for 30 min. Moreover, more degradation was found as the Ge fraction increases. However, using the proposed NiPt/Co/TiN tri-layer, low temperature silicidation and wide range of RTP process window were achieved as well as the improvement of the thermal stability according to different Ge fractions by the subsequent Co and TiN capping layer above NiPt on the $Si_{l-x}Ge_x$. Therefore, highly thermal immune Ni Germanosilicide up to $600^{\circ}C$ for 30 min is utilized using the NiPt/Co/TiN tri-layer promising for future SiGe based ULSI technology.

  • PDF

Reaction of Tri-methylaluminum on Si (001) Surface for Initial Aluminum Oxide Thin-Film Growth

  • Kim, Dae-Hee;Kim, Dae-Hyun;Jeong, Yong-Chan;Seo, Hwa-Il;Kim, Yeong-Cheol
    • Bulletin of the Korean Chemical Society
    • /
    • v.31 no.12
    • /
    • pp.3579-3582
    • /
    • 2010
  • We studied the reaction of tri-methylaluminum (TMA) on hydroxyl (OH)-terminated Si (001) surfaces for the initial growth of aluminum oxide thin-films using density functional theory. TMA was adsorbed on the oxygen atom of OH due to the oxygen atom’s lone pair electrons. The adsorbed TMA reacted with the hydrogen atom of OH to produce a di-methylaluminum group (DMA) and methane with an energy barrier of 0.50 eV. Low energy barriers in the range of 0 - 0.11 eV were required for DMA migration to the inter-dimer, intra-dimer, and inter-row sites on the surface. A unimethylaluminum group (UMA) was generated at each site with low energy barriers in the range of 0.21 - 0.25 eV. Among the three sites, the inter-dimer site was the most probable for UMA formation.

Synthesis of Hybrid Sol Based on ZrO2-SiO2 System and their Coating Properties

  • Lee, Sang-Hoon;Park, Won-Kyu
    • Journal of the Korean Ceramic Society
    • /
    • v.41 no.5
    • /
    • pp.349-352
    • /
    • 2004
  • Organic-inorganic hybrid sol based on ZrO$_2$-SiO$_2$ system was prepared by sol-gel process. Firstly, ZrO$_2$ non-aqueous precursor sol was synthesized and then organosilane compounds which include epoxy silane (GPTS; 3-g1ycidoxypropyl tri-methoxysilane) and acryl silane (ACS; (3-(tri-methoxysilyl)propylmethacrylate)) were added to ZrO$_2$precursor sol for hybridization. Finally, com-mercial silica sol was added to improve the mechanical properties. Synthesized organic-inorganic Zr-hybrid sol was coated on polycarbonate substrate for enhancing it’s mechanical properties, especially hardness. Vicker’s hardness of polycarbonate sub strate was increased from 13.6 to 17.8 MPa and its pencil hardness was increased from 2 to 7 H, respectively, after coating and drying at 10$0^{\circ}C$ for 30 min.

The study of High-efficiency method usign Tri-crystalline Silicon solar cells (삼결정 실리콘 태양전지의 19%변환 효율 최적요건 고찰에 관한 연구)

  • 이욱재;박성현;고재경;김경해;이준신
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2002.07a
    • /
    • pp.318-321
    • /
    • 2002
  • This paper presents a proper condition to achieve high conversion efficiency using PC1D simulator on sri-crystalline Si solar cells. Various efficiency influencing parameters such as rear surface recombination velocity and minority carrier diffusion length in the base region, front surface recombination velocity, junction depth and doping concentration in the Emitter layer, BSF thickness and doping concentration were investigated. Optimized cell parameters were given as rear surface recombination of 1000 cm/s, minority carrier diffusion length in the base region 200 $\mu\textrm{m}$, front surface recombination velocity 100 cm/s, sheet resistivity of emitter layer 100 Ω/$\square$, BSF thickness 5 $\mu\textrm{m}$, doping concentration 5${\times}$10$\^$19/ cm$\^$-3/. Among the investigated variables, we learn that a diffusion length of base layer acts as a key factor to achieve conversion efficiency higher than 19 %.

  • PDF

A design on a tri-state clock driver using charge recycling (Charge recycling 기술을 이용한 tri-state clock driver)

  • Kim, Si-Nai;Im, Jong-Man;Yoon, Han-Sub;Kwack, Kae-Dal
    • Proceedings of the IEEK Conference
    • /
    • 2006.06a
    • /
    • pp.661-662
    • /
    • 2006
  • This paper introduces a CMOS clock driver that shows a high efficiency of electric power (lower power consumption) with the supply of lower voltage(VDD), by taking advantage of charge recycling technology. Comparing with the existing structure, this driver showed the improved maximum efficiency of electric power; 72% and 68%, with the supplied voltage of 1.8v and 1.2v, respectively. Since the output waveform shows the tri-state operating region, utilization is expected in the digital integrated circuits.

  • PDF

Property and Catalytic Activity of Heteropoly Acid Supported on MCM-41, 48 Mesoporous Material and SiO2 (MCM-41, 48 메조포러스 물질 및 SiO2에 담지한 헤테로폴리산의 특성 및 촉매적 활성)

  • Park, Jung-Woo;Kim, Beom-Sik;Lee, Jung-Min;Lee, Kwan-Young
    • Applied Chemistry for Engineering
    • /
    • v.10 no.7
    • /
    • pp.1020-1027
    • /
    • 1999
  • Heteropoly acid(HPW) catalysts supported on three different carriers, an amorphous silica, MCM-41 and MCM-48, with different loadings and calcination temperatures have been prepared and characterized by X-ray diffraction, nitrogen physorption, infrared spectroscopy, and $^{31}P$ magic angle spinning NMR. From the result of IR and NMR, it was shown that HPW retains the Keggin structure on the supported catalysts. No HPW crystal phase was developed even at HPW loadings as high as 35 wt % on the MCM-41 and 65 wt % MCM-48. Thus, HPW appeared to form finely dispersed species. In the hydrolysis reaction of di, bis, tri-pentaerythritol, HPW/MCM-41, 48 exhibited higher catalytic activity than $HPW/SiO_2$ or HPW.

  • PDF

A Study on Korean 4-connected Digit Recognition Using Demi-syllable Context-dependent Models (반음절 문맥종속 모델을 이용한 한국어 4 연숫자음 인식에 관한 연구)

  • 이기영;최성호;이호영;배명진
    • The Journal of the Acoustical Society of Korea
    • /
    • v.22 no.3
    • /
    • pp.175-181
    • /
    • 2003
  • Because a word of Korean digits is a syllable and deeply coarticulatied in connected digits, some recognition models based on demisyllables have been proposed by researchers. However, they could not show an excellent recognition results yet. This paper proposes a recognition model based on extended and context-dependent demisyllables, such as a tri-demisyllable like a tri-phone, for the Korean 4-connected digits recognition. For experiments, we use a toolkit of HTK 3.0 for building this model of continuous HMMs using training Korean connected digits from SiTEC database and for recognizing unknown ones. The results show that the recognition rate is 92% and this model has an ability to improve the recognition performance of Korean connected digits.