• Title/Summary/Keyword: VJFET

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4H-SiC High Power VJFET with modulation of n-epi layer and channel dimension (N-epi 영역과 Channel 폭에 따른 4H-SiC 고전력 VJFET 설계)

  • Ahn, Jung-Joon;Bahng, Wook;Kim, Sang-Cheol;Kim, Nam-Kyun;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.350-350
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    • 2010
  • Silicon carbide (SiC), one of the well known wide band gap semiconductors, shows high thermal conductivities, chemical inertness and breakdown energies. The design of normally-off 4H-SiC VJFETs [1] has been reported and 4H-SiC VJFETs with different lateral JFET channel opening dimensions have been studied [2]. In this work, 4H-SiC based VJFETs has been designed using the device simulator (ATLAS, Silvaco Data System, Inc). We varied the n-epi layer thickness (from $6\;{\mu}m$ to $10\;{\mu}m$) and the channel width (from $0.9\;{\mu}m$ to $1.2\;{\mu}m$), and investigated the static characteristics as blocking voltages, threshold voltages, on-resistances. We have shown that silicon carbide JFET structures of highly intensified blocking voltages with optimized figures of merit can thus be achieved by adjusting the epi layer thickness and channel width.

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A Study On Implementation of GaAs Optoelectronic Integrated Circuits (GaAs 광전집적 회로에 대한 연구)

  • 권영세;홍창희;유회준
    • Proceedings of the Optical Society of Korea Conference
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    • 1990.07a
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    • pp.6-12
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    • 1990
  • GaAs 광전집적회로의 구현을 위해 MBE와 MOCVD system을 이용하여 수직 구조에 알맞는 광소자 및 전자소자를 개발하였으며 이 소자들의 집적화를 시도하였다. 발광소자로서는 Bcllcorc와 공동으로 MBE를 이용하여 표면 방출형 레이저 다이오드 및 array 구조의 연구가 시도 되었고 수직형 전자소자로서는 sclcctive MOCVD를 이용하여 W이 매몰된 VFET 구현하였다. VFET 위에 LED를 집적시켜 출력단의 수직 광전집적회로를 제안하고 제작하였으며 수신단 광전집적회로에서는 PIN 다이오드와 VJFET를 집적화한 광전집적회로가 현재 연구중에 있다.

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