• Journal of Welding and Joining
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• v.34 no.1
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• pp.35-40
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• 2016

Recent developments of Laser metal 3D deposition with wire feeding are reviewed which provide an alternative to powder feeding method. The wire feeding direction, angle and position as well as laser power, wire feeding rate, and deposition speed are found to be key parameters to make quality deposition with high throughput. When compared with the powder feed, the wire feed shows higher material efficiency, higher deposition rate, and smoother surface. Large elongated columnar grains which have epitaxial growth across deposit layers are observed in deposit cross sections. The growth direction is parallel to the thermal gradient during the deposit process. Tensile properties are found to be dependent on the direction due to the anisotropic deposit property. A real-time feedback control is demonstrated to be effective to improve the deposition stability.

• Journal of the Korean Electrochemical Society
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• v.14 no.2
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• pp.61-70
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• 2011

Thin film solar cells with chalcopyrite $CuInSe_2/Cu(In,Ga)Se_2$ absorber materials, commonly known as "CIS/CIGS solar cells" have recently attracted significant research interest as a potential alternative energy-harvesting system for the next generation. Among the different deposition techniques available for the CIGS absorber layer, electrodeposition is an effective and low cost alternative to vacuum based deposition methods. This article reviews progress in the area of CIGS solar cells with an emphasis on electrodeposited absorber layer. Existing challenges in fabrication of stoichiometric absorber layer are highlighted.

• Journal of Environmental Health Sciences
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• v.31 no.4 s.85
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• pp.260-265
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• 2005

Indoor air quality might be affected by source strength of indoor pollutants, ventilation rate, decay rate, outdoor level, and so on. Although technologies measuring these factors exist directly, direct measurements of all factors are not always practical in most field studies. The purpose of this study was to develop an alternative method to estimate the source strength and deposition constant by application of multiple measurements. For the total duration of 60 days, indoor and outdoor $NO_2$ concentrations every 3 days were measured in 30 houses in Seoul, Asan and Daegu. Using a compartment model by mass balance and linear regression analysis, penetration factor (ventilation divided by sum of air exchange rate and deposition constant) and source strength factor (emission rate divided by sum of air exchange rate and deposition constant) were calculated. Subsequently, the source strength and deposition constant were estimated. Natural ventilation was $1.80{\pm}0.42\;ACH,\;1.11{\pm}0.50\;ACH,\;0.92{\pm}0.26\;ACH$ in Seoul, Asan and Daegu, respectively. Calculated deposition constant(K) and source strength of $NO_2,$ in this study were $0.98{\pm}0.28\;hr^{1}\;and\;16.28{\pm}7.47\;ppb/h,$ respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.291-291
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• 2010

Organic solar cells have attracted much interest due to the potential advantage of the lightness, simple solution processing and flexibility. Until recently, the focus of organic solar cells research has been on optimization of material processing to improve the power conversion efficiency. However, area scaling is an important position for alternative to the market dominating solar cells. Spray deposition technologies have advantage of less material wastage and possibility of large scale photoactive area coating when compared with spin coating process. We investigated the performance of organic solar cells as a function of active area using two types of deposition process. The commonly used process is spin coating which can be fabricated organic materials deposition for devices. Spray deposition process compare with spin coating for large-area organic solar cells. The spray deposition organic layer shows excellent performance up to the active area of $4\;cm^2$ with the PCE of ~3.0 % under AM.1.5 simulated illumination with an intensity of $100mW/cm^2$. This indicates that the spray deposition process can be used as a mass production process for evaluating large-area organic solar cells.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.421.1-421.1
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• 2016

We studied indium-doped zinc oxide (IZO) film grown by atomic layer deposition (ALD) as transparent conductive oxide (TCO). A variety of TCO layer, such as ZnO:Al (AZO), InSnO2(ITO), Zn (O,S) etc, has been grown by various method, such as ALD, chemical vapor deposition (CVD), sputtering, laser ablation, sol-gel technique, etc. Among many deposition methods, ALD has various advantages such as uniformity of film thickness, film composition, conformality, and low temperature deposition, as compared with other techniques. In this study, we deposited indium-doped zinc oxide thin films using diethyl[bis(trimethylsilyl)amido]indium [Et2InN(TMS)2] as indium precursor, DEZn as zinc precursor and H2O as oxidant for ALD and investigated the optical and electrical properties of IZO films. As an alternative, this liquid In precursor would has several advantages in indium oxide thin-film processes by ALD, especially for low resistance indium oxide thin film and high deposition rate as compared to InCp, InCl3, TMIn precursors etc. We found out that Indium oxide films grown by Et2InN(TMS)2 and H2O precursor show ALD growth mode and ALD growth window. We also found out the different growth rate of Indium oxide as the substrate and investigated the effect of the substrate on Indium oxide growth.

• Journal of the Korean Magnetics Society
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• v.21 no.5
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• pp.185-192
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• 2011

The technique of producing thin film plays a crucial role in modern science and technology as well as in industrial purposes. Numerous efforts have been made to get high quality thin film through surface treatment of materials. PVD (Physical Vapor Deposition) and CVD (Chemical Vapor Deposition) are two of the most popular deposition techniques used in both scientific study and industrial use. It is well known that the film deposited by PVD and CVD commonly possesses a columnar microstructure which affects many film properties. In recent years, various types of deposition sources which feature high material uses and excellent film properties have been developed. Electromagnetic levitation source appeared as an alternative deposition source to realize high deposition rate for industrial use. Complex film structures such as nano multilayer and multi-components have been prepared to achieve better film properties. Glancing angle deposition (GLAD) has also been developed as a technique to engineer the columnar structure of thin films on the micro- and nanoscale. In this paper, the trends and major issues of thin film technology based on PVD and CVD have been discussed together with the prospect of thin film technology.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.166.2-166.2
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• 2014

In this work, we demonstrated a facile and effective method for deposition of metal tetraphenylporphyrin (MTPP) thin film by a combined a thermal evaporation (TE) and atomic layer deposition (ALD). For the deposition of Zn-TPP thin film, Tetraphenylporphyrin (TPP) and diethyl zinc (DEZ) were used as organic and inorganic materials, respectively. Optimum conditions for the deposition of Zn-TPP thin film were established systematically: (1) the exposure time of DEZ as inorganic precursor and (2) the substrate temperature were adjusted, respectively. As a result, we verified that the surface reaction between organic semiconductor (TPP) and metal atom (Zn) was ALD process. In addition, we calculated activation energy by using Arrhenius equation for the substrate temperature versus area change rate of pyrrolic nitrogen. The surface and interface reactions between TPP with Zn were investigated by X-ray photoelectron spectroscopy, Raman spectroscopy, UV-vis spectroscopy, and scanning electron microscopy. These results show a facile and well-controllable fabrication technique for the metal-organic thin film for future electronic applications.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2004.04a
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• pp.482-486
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• 2004

The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper presents that the recent development and our research goals in FIB nano machining technology are given. The emphasis will be on direct milling, or chemical vapor deposition techniques (CVD), and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling or deposition techniques for making various high-quality devices and high-precision components at the micro/nano meter scale are examined and discussed. Finally, conclusions are presented to summarize the recent work and to suggest the areas for improving the FIB milling technology and for studying our future research.

• Korean Journal of Materials Research
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• v.12 no.1
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• pp.82-88
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• 2002

Chromium carbide films were deposited on high speed steels using a Cr_3C_2$ target by magnetron sputtering. Effects of the deposition parameters (power, Ar pressure and substrate temperature) on deposition rates and surface roughnesses of the films were investigated. The morphologies of those films were characterized by scanning electron microscopy and atomic force microscopy. The grain size of the samples deposited using dc-power is larger than that using equivalent rf-power. The hardness of the sample increases with increasing rf-power, whereas the elastic modulus nearly does not change with rf-power. The optimum sputter deposition conditions for chromium carbide on high speed steels in the corrosion resistance aspect were found to be the rf-power with small roughness.

• Journal of Electrochemical Science and Technology
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• v.7 no.1
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• pp.33-40
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• 2016

Sr_0.92Y_0.08TiO_3-δ (SYT) was investigated as an alternative anode in humidified CH₄ fuel for SOFCs at low temperatures (650 ℃-750 ℃) and compared with the conventional Ni/yttria-stabilized zirconia (Ni/YSZ) anode. The goal of the study was to directly use a hydrocarbon fuel in a SOFC without a reforming process. The cell performance of the SYT anode was relatively low compared with that of the Ni/YSZ anode because of the poor electrochemical catalytic activity of SYT. In the presence of CH₄ fuel, however, the cell performance with the SYT anode decreased by 20%, in contrast to the 58% decrease in the case of the Ni/YSZ anode. The severe degradation of cell performance observed with the Ni/YSZ anode was caused by carbon deposition that resulted from methane thermal cracking. Carbon was much less detected in the SYT anode due to the catalytic oxidation. Otherwise, a significant amount of bulk carbon was detected in the Ni/YSZ anode.