• Title/Summary/Keyword: arc-discharge

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Preparation of Low-Oxygen Ingot by Repetitive Melting and Mo Metal Powder by Hydrogen Reduction from $MoO_3$ Powder (삼산화 몰리브덴 분말로부터 수소 환원에 의한 금속 분말 및 반복 용해에 의한 저산소 잉곳 제조)

  • Lee, Back-Kyu;Oh, Jung-Min;Kim, Hyung-Seok;Lim, Jae-Won
    • Particle and aerosol research
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    • v.9 no.1
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    • pp.31-36
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    • 2013
  • In this study, Mo metal powder was prepared by hydrogen reduction of Mo trioxides with different purity of 2N and 3N grades. We have obtained Mo metal powder with oxygen content of 1450 ppm by hydrogen reduction and subsequent heat treatment for degassing. Using the Mo metal powder, a low-oxygen Mo ingot was prepared by repetitive vacuum arc melting. The oxygen content of the obtained Mo ingot was less than 70 ppm after vacuum arc melting for 30 min. The purity of the Mo metal powder and the ingot was evaluated using glow discharge mass spectrometry. The purity of the respective Mo ingots was increased to 3N and 4N grades from the Mo powder of 2N and 3N grades after the repetitive vacuum arc melting. The low oxygen Mo ingot thus can be used as a raw material for sputtering targets.

Surface Modification of WC-Co and SCM415 by the Ion Bombardment Process of Filtered Vacuum Arc Plasma (자장 여과 아크 이온빔 식각 공정을 이용한 WC-Co 및 SCM415 금속 소재 표면 구조 제어 연구)

  • Lee, Seung-Hun;Yoon, Sung-Hwan;Kim, Do-Geun;Kwon, Jung-Dae;Kim, Jong-Kuk
    • Journal of the Korean institute of surface engineering
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    • v.43 no.2
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    • pp.80-85
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    • 2010
  • The surfaces of WC-Co and SCM415 were etched to form a micro size protrusion for oil based ultra low friction applications using an ion bombardment process in a filtered vacuum arc plasma. WC-Co species showed that a self-patterned surface was available by the ion bombarding process due to the difference of sputtering yield of WC and Co. And the increasing rate of roughness was 0.6 nm/min at -600 V substrate bias voltage. The increasing rate of roughness of SCM415 species was 1.5 nm/min at -800 V, but the selfpatterning effect as shown in WC-Co was not appeared. When the SCM415 species pretreated by electrical discharge machining is etched, the increasing rate of roughness increased from 1.5 nm/min to 40 nm/min at -800 V substrate bias voltage and the uniform surface treatment was available.

A Study of New Energy Storage System for PV System (PV 시스템 적용을 위한 새로운 에너지 저장 시스템 고찰)

  • Yu, Gwon-Jong;Jung, Young-Seok;Jung, Myung-Woong;Park, Yong-Sung;Choi, Jae-Ho;Choe, Ju-Yeop
    • Proceedings of the KIEE Conference
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    • 2002.07b
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    • pp.1391-1393
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    • 2002
  • There arc some problems on storage batteries which are called Secondary Battery, such as long charging time, limited cycle life, low coulomb efficiency and inaccurate residual power meter. To solve those problems, a complex system of capacitors and Super Capacitors of increased energy density. Though the capacitors alone arc not capable of delivering stable output, the accompanied circuits compensate the various characteristics all through the charge-and discharge-cycle. This paper deals with Energy Storage System with Super Capacitor for PV System Discussed in this paper are, explains the accompanied circuits of Super Capacitor which is compared with the Second Batteries.

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A study on the synthesis and mechanical properties of WC/C multilayered films (WC/C 다층박막의 합성 및 기계적 특성에 관한 연구)

  • 명현식;한전건
    • Journal of the Korean institute of surface engineering
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    • v.35 no.3
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    • pp.121-126
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    • 2002
  • WC/C multilayered films were deposited by arc ion plating and magnetron sputter hybrid system with various $C_2$H$_2$ flow rates and bias voltages. The coatings have been characterized with respect to their chemical composition (Glow Discharge Optical Emission Spectroscopy), hardness(Knoop micro-hardness), residual stress(Laser beam bending) and friction coefficient(Ball on disc type wear test). Deposition rate, microhardness and residual stress of WC/C films were observed to increase with increasing the $C_2$$H_2$ flow rates. The highest hardness and residual stress were measured to be 26.5 GPa and 1.1GPa for, WC/C film deposited at substrate bias of -100V. WC/C multilayered film was obtained very low friction coefficient(~0.1).

Electrical and Discharge Charcteristics Analysis of Ceramic Metal Halide Lamp with Operating Method (구동방법에 따른 세라믹 메탈 할라이드 램프의 전기적 및 방전특성 분석)

  • Jang, Hyeok-Jin;Yang, Jong-Kyung;Kim, Nam-Gon;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1623_1624
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    • 2009
  • The use of arc tubes made of ceramic material further enhanced some of the metal halide lamp’s properties. These properties translate into higher efficacy with better color rendering, stable color through lamp long life. Recently, due to an increase in the application of the ceramic metal-halide lamp, the study for the property etc. according to Ballast's driving scheme and the study for arc tube material, optimization of gas and so on are being proceeded to improve the property of the lamp. Especially, to control ceramic metal-halide lamp, the vigorous study and practical use with respect to Electronic Ballast, which has been improved in the disadvantages of the conventional Magnetic Ballast are made. In this paper, Electrical characteristics and gas insulation destroy time are analyzed by comparing magnetic ballast with electronic ballast.

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A Study on the High-frequency Operation Characteristics of the High-pressure Sodium Lamps (고압 나트륨램프의 고주파 방전특성 연구)

  • Chee, Chol-Kon;Kim, Hoon
    • The Transactions of the Korean Institute of Electrical Engineers
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    • v.35 no.11
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    • pp.495-502
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    • 1986
  • The change of the discharge characteristics of the high-pressure sodium (HPS) lamps is investigated over a power source frequency range of 60 Hz to 30, 000 Hz. As the frequency increases, the light and electrical characteristics of the HPS lamps are improved since the re-ignition is not needed due to the constant electron density, and the cathode fall is reduced. But at the certain frequency range, the arc instability called acoustic resonance occurs, and the arc tube is damaged. Regarding these characteristics and the kind of the illuminating system, a proper frequency is selected to operate the HPS lamps. And a new measuring system using a computer and the storage-scope is developed to avoid the error of the ordinary gauges at high frequency power.

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The Ignitor Development for Momentary Restarting of Metal Halide Lamps (메탈 핼라이드 램프의 순시 재점등을 위한 점화기 개발)

  • Park, Chong-Yeun;Bae, Su-Ho
    • Journal of Industrial Technology
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    • v.20 no.B
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    • pp.169-174
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    • 2000
  • The most of metalhalide lamps is what the momentary restarting cannot be realized when the arc tube is in the hot condition. The discharge starting voltage of arc tube in the hot condition is much higher than in the cold condition in proportion to the gaseous pressure. Therefore it takes about ten minutes to restart the metal Halide lamps, that is to say, it is possible to start when the pressure and the temperature are decreased. But, if the lamp is restarted in the hot condition, we must supply the high voltage pulse with 15kV between the both electrodes of lamp. The proposed ignitor has two ignitors. If we connect each ignitor at the both sides, the high voltages of two different frequencies are generated. If so, when the one of the ignitor generates the highest voltage and the other applied to elecrodes of the lamp. In this way, we can restart the lamp with the voltage 15kV, even if the lamp is in the hot condition.

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Carbonization Behavior due to Surface Tracking (연면 트래킹에 의한 탄화 거동)

  • Jung, Yeon-Ha;Jang, Tae-Jun;Shong, Kil-Mok;Roh, Young-Su;Kwak, Hee-Ro
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.21 no.2
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    • pp.28-33
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    • 2007
  • In this paper, we are studied on the direction and formation of carbonized conductive path according to surface leakage current between electrodes. The characteristics of the tracking as surface is broken down between exposed live parts. Using the HSIS(high speed imaging system. 100,000[fps], redlake ltd., USA), it took photographs by arc growth mechanism occurred in on/off surge, ground fault and discharge between electrodes. Then the results was analyzed. Hereafter, it expected effects that application of energy utility technology through the arc control.

The Development of Electric Ballast for a Instant Restart of Metalhalide Lamp (메탈헬라이드램프용 순시재점등 전자식안정기 개발)

  • 김수경;장우진
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2003.11a
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    • pp.185-190
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    • 2003
  • The most shortcoming of metalhalide lamps is what the instant restarting cannot be realized when the arc tube is in the hot condition. The discharge starting voltage of arc tube in the hot condition is much higher than in the cold condition. Therefore it takes about five minutes to restart the metalhalide lamps, that is to say, it is possible to start when the pressure and the temperature are decreased. But, if the lamp is restarted in the hot condition, we must supply the high voltage pulse with 20kV at the both sides of lamp. The proposed electronic ballast is consist of a electromagnetic interference (EMI) filter, a power factor correction (PFC) circuit, a flyback converter, a half-bridge inverter, and a high voltage igniter circuit. By this composition we can restart the lamp with the voltage 20kV, even if the lamp is in the hot condition.

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A study on the high rate deposition of compound coatings by magnetron sputtering (마그네트론 스퍼터링법을 이용한 화합물 박막의 고속 증착에 관한 연구)

  • 남경훈;한전건
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 1998.11a
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    • pp.57-57
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    • 1998
  • 최근 건식도금 분야에 있어서 경제성의 확보를 위해 고속 증착에 관한 연구가 활발히 진행 중에 있다. 이러한 고속 증착의 방법으로서는 high current arc, laser arc, hollow cathode discharge 및 magnetron sputtering법 등이 대두되고 있다. 특히 이중 magnetron sputtering 법은 고밀도의 박막을 고속으로 증착활 수 있는 장점으로 인해 고속 증착의 효과적인 방법으로 크게 대두되고 있다. 이러한 magnetron sputtering 법을 이용한 고속 증착에 관한 연구는 Cu, Ag와 같은 순수 금속 박막의 경우 $1~3\mu\textrm{m}/min$의 증착율까지 확보한 연구결과가 이미 발표되 고 있다. 그러나 이러한 고속 증착에 관한 연구들은 순금속 박막의 증착에 한정되어 있고 화합물 박막의 고속 증착에 관한 연구결과는 거의 전무한 결과이다. 따라서 본 연구에서는 magnetron sputtering 법을 이용하여 Ti계와 Cr계의 화합물 박막을 고속으로 증착하였다. 포한 박막의 증착율 및 특성 분석을 위혜 a-step, XRD 및 SEM을 이용하였다. 본 연구의 결과 $0.25~0.38\mu\textrm{m}/min$. 증착율을 확보하였으며 XRD 분석을 통하여 화합물 박막의 합성여부를 확인하였고, 박막의 미소 경도값도 2300~2500HK의 값을 얻었다.

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